Darlene G. Hamilton - San Jose CA Yider Wu - Campbell CA Michael Han - San Jose CA
Assignee:
Advanced Micro Devices - Sunnyvale CA
International Classification:
G11C 1604
US Classification:
36518505, 36518511, 257316
Abstract:
Dummy wordlines are provided between gaps of blocks of memory cells to compensate for higher charge loss at higher stress temperatures exhibited at edge wordlines of blocks of memory cells having large gaps. The dummy wordlines minimize the gap between the blocks. The dummy wordlines can be positioned between the blocks. Alternatively, the wordline width for the last block or sector wordline can be changed or different nitride used with less conductance in high temperatures. The dummy wordlines are typically ignored in normal operations on the memory.
Method Of Utilizing Fast Chip Erase To Screen Endurance Rejects
Edward Hsia - Saratoga CA Phuong K. Banh - Sunnyvale CA Darlene Hamilton - San Jose CA
Assignee:
Advanced Micro Devices, Inc. - Sunnyvale CA
International Classification:
G01N 3700
US Classification:
702 82, 36518511
Abstract:
A method of utilizing Fast Chip Erase to screen endurance rejects. Multiple sectors in a device are selected and a time necessary to program all cells in the sectors is monitored and if the monitored time exceeds a first time, the device fails. A time necessary to erase all the cells without any overerased cells is monitored and if the time exceeds a second time, the device fails. A time necessary to correct overerased cells is monitored and if the time exceeds a third time, the device fails. The total time from erase until overerase correction is achieved is monitored and if the total time exceeds a fourth time, the device fails. The total time to determine erasability is monitored and if this time exceeds a fifth time, the device fails.
I/O Partitioning System And Methodology To Reduce Band-To-Band Tunneling Current During Erase
Kazuhiro Kurihara - Sunnyvale CA Feng Pan - Richmond CA Weng Fook Lee - Santa Clara CA Ravi Sunkavalli - Milpitas CA Darlene Hamilton - San Jose CA
Assignee:
Advanced Micro Devices, Inc. - Sunnyvale CA Fujitsu Limited - Kanagawa
International Classification:
G11C 1604
US Classification:
36518529, 36518511, 36518519
Abstract:
A system is provided for reducing band-to-band tunneling current during Flash memory erase operations. The system includes a memory sector divided into (N) I/O subsectors, N being an integer, and a drain pump to generate power for associated erase operations within the N I/O subsectors. An erase sequencing subsystem generates N pulses to enable the erase operations within each of the N I/O subsectors in order to reduce band-to-band tunneling current provided by the drain pump.
Photoresist Spacer Process Simplification To Eliminate The Standard Polysilicon Or Oxide Spacer Process For Flash Memory Circuits
Darlene Hamilton - San Jose CA Len Toyoshiba - San Jose CA Michael Fliesler - Santa Cruz CA
Assignee:
Advanced Micro Devices, Inc. - Sunnyvale CA
International Classification:
H01L 218238
US Classification:
438232, 438258, 438275, 438279, 438307
Abstract:
A method of manufacturing a flash memory semiconductor device that eliminates the step of forming sidewall spacers on n-channel and p-channel transistor gate structures. Resist spacers having a dimension of G +2S are formed on n-channel transistor gate structures and an N implant is performed to form N implant is performed to form N regions in the n-channel substrate region. Resist spacers having a dimension of G +2S are formed on p-channel transistor gate structures and a P implant is performed to form P regions in the p-channel substrate region.
Tailored Erase Method Using Higher Program Vt And Higher Negative Gate Erase
A method and system for programming and erasing the normal bits of a memory array of dual bit memory cells is accomplished by programming at a substantially high delta VT and an erase pulse that provides a substantially high electric field to each I/O in a sector one at a time. After the first erase pulse, the erase verify routine is performed on all the IOs together. The substantially higher VT assures that the memory array will maintain programmed data and erase data consistently after higher temperature stresses and/or customer operation over substantial periods of time. This erase pulse that provides a substantially high electric field is selected to erase band to band currents for the entire array that are larger than can be supplied by drain pumps.
Higher Program Vt And Faster Programming Rates Based On Improved Erase Methods
Darlene G. Hamilton - San Jose CA Narbeh Derhacobian - Belmont CA Janet S.Y. Wang - San Francisco CA Kulachet K.T. Tanpairoj - Palo Alto CA
Assignee:
Advanced Micro Devices, Inc. - Sunnyvale CA
International Classification:
G11C 1134
US Classification:
36518522, 36518518
Abstract:
A method and system for programming of the normal bits of a memory array of dual bit memory cells is accomplished by programming at a substantially high delta VT. The substantially higher VT assures that the memory array will maintain programmed data and erase data consistently after higher temperature stresses and/or customer operation over substantial periods of time. Furthermore, by utilizing substantially high gate and drain voltages during programming, programming times are kept short without degrading charge loss. A methodology is provided that determines the charge loss for single bit operation during program and erase cycles. The charge losses over cycling and stress are then utilized to determine an appropriate delta VT to be programmed into a command logic and state machine.
Darlene G. Hamilton - San Jose CA Kulachet Tanpairoj - Palo Alto CA Ravi Sunkavalli - Santa Clara CA Narbeh Derhacobian - Belmont CA Michael A. Van Buskirk - Saratoga CA
Assignee:
Advanced Micro Devices, Inc. - Sunnyvale CA
International Classification:
G11C 1604
US Classification:
36518511, 36518533, 36518505
Abstract:
Dummy columns of memory cells formed during fabrication outside edge columns are connected to the actual used memory cells of sectors or the like. The columns of dummy memory cells are compensated by floating the dummy memory cells during normal programming and erase cycles, or alternatively, by programming and erasing the dummy memory cells along with the actual used memory cells in the sector. By treating the dummy memory cells similar to the actual used cells, charge that leaks into the dummy cells during fabrication and normal operation that has deleterious effects at higher stress temperatures and/or due to the longevity of customer operation is substantially eliminated.
Soft Program And Soft Program Verify Of The Core Cells In Flash Memory Array
Santosh K. Yachareni - Santa Clara CA Darlene G. Hamilton - San Jose CA Binh Q. Le - San Jose CA Kazuhiro Kurihara - Sunnyvale CA
Assignee:
Advanced Micro Devices, Inc. - Sunnyvale CA Fujitsu Limited - Kanagawa
International Classification:
G11C 1134
US Classification:
36518522, 36518524
Abstract:
A method and system are disclosed for memory cell soft program and soft program verify, to adjust, or correct the threshold voltage between a target minimum and maximum, which may be employed in association with a dual bit memory cell architecture. The method includes applying one reference voltage signal to the over erased core cell, and a different reference voltage signal to the reference cell, comparing the two currents produced by each, selectively verifying proper soft programming of one or more bits of the cell, determining that the dual bit memory cell is properly soft programmed. The method may also comprise selectively re-verifying proper soft programming of the cells after selectively soft programming at least one or more bits of the cell.