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Dawei D Zheng

age ~55

from Irvine, CA

Also known as:
  • Dauki Zheng
  • Da Wei Zheng
  • Zheng Da Wei

Dawei Zheng Phones & Addresses

  • Irvine, CA
  • Los Angeles, CA
  • Arcadia, CA
  • 116 Huntington Dr, Alhambra, CA 91801 • (626)9439431
  • 9100 Duarte Rd, San Gabriel, CA 91775 • (626)2915508
  • Arlington Heights, IL
  • Orange, CA
  • Sunnyvale, CA

Work

  • Position:
    Sales Occupations

Education

  • Degree:
    Graduate or professional degree
Name / Title
Company / Classification
Phones & Addresses
Dawei Zheng
Minhsen International, LLC
Business Services at Non-Commercial Site
66 Homeland, Irvine, CA 92618

Medicine Doctors

Dawei Zheng Photo 1

Dawei Zheng

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Specialties:
Family Medicine, Acupuncturist
Work:
Dawei Zheng MD
4635 Freeport Blvd STE D, Sacramento, CA 95822
(916)4579879 (phone), (916)4574945 (fax)

Dawei Zheng MD
8701 Ctr Pkwy STE 170, Sacramento, CA 95823
(916)8961682 (phone), (916)4574945 (fax)
Education:
Medical School
Shandong Med Univ, Jinan, Shandong, China (242 46 Prior 1 1 71)
Graduated: 1983
Procedures:
Acupuncture
Allergen Immunotherapy
Arthrocentesis
Continuous EKG
Destruction of Benign/Premalignant Skin Lesions
Electrocardiogram (EKG or ECG)
Hearing Evaluation
Inner Ear Tests
Nutrition Therapy
Pulmonary Function Tests
Skin Tags Removal
Vaccine Administration
Conditions:
Abdominal Hernia
Abnormal Vaginal Bleeding
Acne
Acute Bronchitis
Acute Conjunctivitis
Languages:
Chinese
English
Russian
Spanish
Description:
Dr. Zheng graduated from the Shandong Med Univ, Jinan, Shandong, China (242 46 Prior 1 1 71) in 1983. He works in Sacramento, CA and 1 other location and specializes in Family Medicine and Acupuncturist. Dr. Zheng is affiliated with Sutter Auburn Faith Hospital and Sutter Medical Center Sacramento.

Resumes

Dawei Zheng Photo 2

At Sifotonics Technologies, Inc

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Location:
Greater Los Angeles Area
Industry:
Semiconductors
Dawei Zheng Photo 3

Vice President Of Silicon Photonics

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Location:
116 Cutlass, Irvine, CA
Industry:
Semiconductors
Work:
Litecrown Consulting - Greater Los Angeles Area since Jun 2011
Owner

SiFotonics Technologies, Inc Oct 2009 - Jun 2011
Director of product development

Kotura, Inc. Jan 2001 - Jan 2010
Group leader and Principal device engineer

lightcross 2001 - 2004
senior process integration engineer

Intel Jan 2000 - Jan 2001
Senior process engineer
Education:
University of California, Los Angeles 1995 - 1999
Ph.D, Electronic materials
Fudan University 1986 - 1990
Bachelor of Science, Microelectronics Engineering
Skills:
Research Project Management
Supervisory Skills
Device Physics
Afm
Sem
Auger
Sims
Semiconductors
Cmos
Characterization
Electronics
Failure Analysis
Manufacturing
Photonics
Interests:
Qigong and Internal Medicine
Chinese Kungfu
Languages:
English
Mandarin
Dawei Zheng Photo 4

Software Development Engineer

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Location:
Los Angeles, CA
Work:

Software Development Engineer
Dawei Zheng Photo 5

Software Development Engineer

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Location:
Irvine, CA
Work:

Software Development Engineer
Education:
Uc Irvine 2015 - 2017
Masters
Uc Irvine 2011 - 2016
Skills:
Java
C/C++
Python
Matlab
Linux/Unix
Hadoop
Android Studio
Dawei Zheng Photo 6

Principal Device Engineer At Kotura, Inc.

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Location:
Greater Los Angeles Area
Industry:
Telecommunications

Us Patents

  • Optical Component Having Waveguides Extending From A Common Region

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  • US Patent:
    6921490, Jul 26, 2005
  • Filed:
    Sep 6, 2002
  • Appl. No.:
    10/236505
  • Inventors:
    Wei Qian - Torrance CA, US
    Dazeng Feng - Arcadia CA, US
    Dawei Zheng - Los Angeles CA, US
    Joan Yiqiong Fong - San Marino CA, US
    Zhian Shao - Torrance CA, US
    Xiaoming Yin - Pasadena CA, US
  • Assignee:
    Kotura, Inc. - Monterey Park CA
  • International Classification:
    B29D011/00
  • US Classification:
    216 24
  • Abstract:
    A method of forming an optical component includes forming a first mask on an optical component precursor. The first mask is formed with a plurality of waveguide portions extending from a common portion. Each waveguide portion is positioned so as to protect a waveguide region of the optical component precursor where a waveguide is to be formed. The method also includes forming a second mask between waveguide portions of the first mask. The resistance of the second mask to etching varies along at least one dimension of the second mask.
  • Controlled Selectivity Etch For Use With Optical Component Fabrication

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  • US Patent:
    7005247, Feb 28, 2006
  • Filed:
    Jan 15, 2003
  • Appl. No.:
    10/345709
  • Inventors:
    Joan Fong - San Marino CA, US
    Wei Qian - Torrance CA, US
    Dawei Zheng - San Gabriel CA, US
    Zhian Shao - Torrance CA, US
    Xiaoming Yin - Irvine CA, US
  • Assignee:
    Kotusa, Inc. - Monterey Park CA
  • International Classification:
    G03F 7/26
  • US Classification:
    430321, 430323, 216 24, 216 72
  • Abstract:
    A method of fabricating an optical component includes forming a mask on an optical component precursor. The method also includes etching through at least a portion of the mask so as to etch an underlying medium concurrently with remaining mask and transfer a feature of an upper surface of the mask onto an upper surface of the underlying medium. The etch can be configured such that a ratio of the underlying medium etch rate to the mask etch rate is less than about 1. 5:1. In some instances, the underlying medium is silicon and the mask is a photoresist.
  • High Speed Optical Phase Modulator

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  • US Patent:
    7394948, Jul 1, 2008
  • Filed:
    Jun 7, 2005
  • Appl. No.:
    11/146898
  • Inventors:
    Dawei Zheng - Alhambra CA, US
    Dazeng Feng - Arcadia CA, US
    Anthony Kewitsch - Santa Monica CA, US
    George Rakuljic - Santa Monica CA, US
  • Assignee:
    Kotura, Inc. - Monterey Park CA
  • International Classification:
    G02F 1/035
    G02B 6/26
    G02B 6/42
  • US Classification:
    385 3, 385 2, 385 40
  • Abstract:
    An optical device includes a phase modulator having a waveguide on a substrate. The phase modulator also includes an n-type region having a proximity to a p-type region that causes formation of a depletion region when a bias is not applied to the modulator. The depletion region is at least partially positioned in the light signal carrying region of the waveguide. The phase modulator is tuned by applying a reverse bias to the phase modulator. The reverse bias changes the size of the depletion region.
  • High Speed Optical Intensity Modulator

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  • US Patent:
    7394949, Jul 1, 2008
  • Filed:
    Jun 7, 2005
  • Appl. No.:
    11/147403
  • Inventors:
    Dazeng Feng - Arcadia CA, US
    Dawei Zheng - Alhambra CA, US
    Anthony Kewitsch - Santa Monica CA, US
    George Rakuljic - Santa Monica CA, US
  • Assignee:
    Kotura, Inc. - Monterey Park CA
  • International Classification:
    G02F 1/035
    G02B 6/26
    G02B 6/42
  • US Classification:
    385 3, 385 2, 385 40
  • Abstract:
    An optical device includes a phase modulator positioned along a branch waveguide of a mach-zehnder interferometer. The phase modulator includes an n-type region having a proximity to a p-type region that causes a depletion region to form when a bias is not applied to the modulator. The depletion region is at least partially positioned in a light signal carrying region of the waveguide.
  • High Speed Optical Phase Modulator

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  • US Patent:
    7542630, Jun 2, 2009
  • Filed:
    May 21, 2008
  • Appl. No.:
    12/154435
  • Inventors:
    Dawei Zheng - Alhambra CA, US
    Dazeng Feng - Arcadia CA, US
    Anthony Kewitsch - Santa Monica CA, US
    George Rakuljic - Santa Monica CA, US
  • Assignee:
    Kotura, Inc. - Monterey Park CA
  • International Classification:
    G02F 1/35
    G02B 6/26
    G02B 6/42
  • US Classification:
    385 3, 385 2, 385 40
  • Abstract:
    An optical device includes a phase modulator having a waveguide on a substrate. The phase modulator also includes an n-type region having a proximity to a p-type region that causes formation of a depletion region when a bias is not applied to the modulator. The depletion region is at least partially positioned in the light signal carrying region of the waveguide. The phase modulator is tuned by applying a reverse bias to the phase modulator. The reverse bias changes the size of the depletion region.
  • System Having Reduced Distance Between Scintillator And Light Sensor Array

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  • US Patent:
    7659519, Feb 9, 2010
  • Filed:
    Jun 4, 2008
  • Appl. No.:
    12/156784
  • Inventors:
    Dawei Zheng - Arcadia CA, US
    Xavier Clairardin - Naperville IL, US
    Arlon Martin - Santa Barbara CA, US
  • Assignee:
    Kotura, Inc. - Monterey Park CA
  • International Classification:
    G01T 1/20
  • US Classification:
    25037011
  • Abstract:
    A sensor includes a carrier carrying a light sensor array. The light sensor array has pixels that are each configured to generate an electrical output in response to receiving a light photon. The light sensor array can be included in or on a wafer or can be built in or on a wafer. The sensor also includes electrical conductors through which the pixels electrically communicate with electronics on the carrier. Each of the electrical conductors is at least partially positioned in a recess that extends into the wafer.
  • Detector Having Tuned Resistors

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  • US Patent:
    8053722, Nov 8, 2011
  • Filed:
    Sep 5, 2007
  • Appl. No.:
    11/899402
  • Inventors:
    Mehdi Asghari - San Marino CA, US
    Dawei Zheng - Arcadia CA, US
  • Assignee:
    Kotura, Inc. - Monterey Park CA
  • International Classification:
    G01T 1/17
  • US Classification:
    2502521
  • Abstract:
    A method of forming a light sensor array includes tuning a resistance level of a plurality of resistors. The resistors are included in a light sensor array for use with a positron emissision tomography (PET) scanner system. The light sensor array includes detection circuits that each includes one of the resistors connected in series with an avalanche photodiode.
  • Optical Device Having Light Sensor Employing Horizontal Electrical Field

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  • US Patent:
    8093080, Jan 10, 2012
  • Filed:
    Sep 4, 2009
  • Appl. No.:
    12/584476
  • Inventors:
    Shirong Liao - Mira Loma CA, US
    Dawei Zheng - Arcadia CA, US
    Cheng-Chih Kung - Pasadena CA, US
    Mehdi Asghari - Pasadena CA, US
  • Assignee:
    Kotusa, Inc. - Monterey Park CA
  • International Classification:
    H01L 21/02
  • US Classification:
    438 38, 438 41, 438 48, 438 52, 257E31042
  • Abstract:
    The device includes an optical waveguide on a base. The waveguide is configured to guide a light signal through a light-transmitting medium. A light sensor is also positioned on the base. The light sensor including a ridge extending from slab regions. The slab regions are positioned on opposing sides of the ridge. A light-absorbing medium is positioned to receive at least a portion of the light signal from the light-transmitting medium included in the waveguide. The light-absorbing medium is included in the ridge and also in the slab regions. The light-absorbing medium includes doped regions positioned such that an application of a reverse bias across the doped regions forms an electrical field in the light-absorbing medium included in the ridge.

Facebook

Dawei Zheng Photo 7

Dawei Zheng

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Friends:
Huazhang Shen, Dan Yang, Jian Xiong, Wendy Ren, Jason Zheng, Wenjie Chen
Dawei Zheng Photo 8

Dawei Zheng

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Friends:
Sarah Curran, Neo Zang, Ling Jun Pan, Catriona Mc Hugh, Sean Duffy
Dawei Zheng Photo 9

Carian Nama Dawei Zheng

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Youtube

Dawei ZHENG [Promotion 2015]

Dawei ZHENG major de la Majeure Business Intelligence tmoigne de son p...

  • Duration:
    3m 16s

This Is Youth! ( Chinese Drama Cast Real Age ...

Hello Guys Welcome to My Channel Latest Drama News If U Are New On My ...

  • Duration:
    1m 43s

@Austin SXSW 2020

  • Duration:
    51s

Hey Jude @Boston 2019

  • Duration:
    3m 29s

@Boston 2019

  • Duration:
    2m 34s

Jiang Dawei - Where the Peach Bloosoms are i...

  • Duration:
    3m 3s

Googleplus

Dawei Zheng Photo 10

Dawei Zheng

Dawei Zheng Photo 11

Dawei Zheng

Dawei Zheng Photo 12

Dawei Zheng


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