Dr. Zheng graduated from the Shandong Med Univ, Jinan, Shandong, China (242 46 Prior 1 1 71) in 1983. He works in Sacramento, CA and 1 other location and specializes in Family Medicine and Acupuncturist. Dr. Zheng is affiliated with Sutter Auburn Faith Hospital and Sutter Medical Center Sacramento.
Litecrown Consulting - Greater Los Angeles Area since Jun 2011
Owner
SiFotonics Technologies, Inc Oct 2009 - Jun 2011
Director of product development
Kotura, Inc. Jan 2001 - Jan 2010
Group leader and Principal device engineer
lightcross 2001 - 2004
senior process integration engineer
Intel Jan 2000 - Jan 2001
Senior process engineer
Education:
University of California, Los Angeles 1995 - 1999
Ph.D, Electronic materials
Fudan University 1986 - 1990
Bachelor of Science, Microelectronics Engineering
Skills:
Research Project Management Supervisory Skills Device Physics Afm Sem Auger Sims Semiconductors Cmos Characterization Electronics Failure Analysis Manufacturing Photonics
Wei Qian - Torrance CA, US Dazeng Feng - Arcadia CA, US Dawei Zheng - Los Angeles CA, US Joan Yiqiong Fong - San Marino CA, US Zhian Shao - Torrance CA, US Xiaoming Yin - Pasadena CA, US
Assignee:
Kotura, Inc. - Monterey Park CA
International Classification:
B29D011/00
US Classification:
216 24
Abstract:
A method of forming an optical component includes forming a first mask on an optical component precursor. The first mask is formed with a plurality of waveguide portions extending from a common portion. Each waveguide portion is positioned so as to protect a waveguide region of the optical component precursor where a waveguide is to be formed. The method also includes forming a second mask between waveguide portions of the first mask. The resistance of the second mask to etching varies along at least one dimension of the second mask.
Controlled Selectivity Etch For Use With Optical Component Fabrication
Joan Fong - San Marino CA, US Wei Qian - Torrance CA, US Dawei Zheng - San Gabriel CA, US Zhian Shao - Torrance CA, US Xiaoming Yin - Irvine CA, US
Assignee:
Kotusa, Inc. - Monterey Park CA
International Classification:
G03F 7/26
US Classification:
430321, 430323, 216 24, 216 72
Abstract:
A method of fabricating an optical component includes forming a mask on an optical component precursor. The method also includes etching through at least a portion of the mask so as to etch an underlying medium concurrently with remaining mask and transfer a feature of an upper surface of the mask onto an upper surface of the underlying medium. The etch can be configured such that a ratio of the underlying medium etch rate to the mask etch rate is less than about 1. 5:1. In some instances, the underlying medium is silicon and the mask is a photoresist.
Dawei Zheng - Alhambra CA, US Dazeng Feng - Arcadia CA, US Anthony Kewitsch - Santa Monica CA, US George Rakuljic - Santa Monica CA, US
Assignee:
Kotura, Inc. - Monterey Park CA
International Classification:
G02F 1/035 G02B 6/26 G02B 6/42
US Classification:
385 3, 385 2, 385 40
Abstract:
An optical device includes a phase modulator having a waveguide on a substrate. The phase modulator also includes an n-type region having a proximity to a p-type region that causes formation of a depletion region when a bias is not applied to the modulator. The depletion region is at least partially positioned in the light signal carrying region of the waveguide. The phase modulator is tuned by applying a reverse bias to the phase modulator. The reverse bias changes the size of the depletion region.
Dazeng Feng - Arcadia CA, US Dawei Zheng - Alhambra CA, US Anthony Kewitsch - Santa Monica CA, US George Rakuljic - Santa Monica CA, US
Assignee:
Kotura, Inc. - Monterey Park CA
International Classification:
G02F 1/035 G02B 6/26 G02B 6/42
US Classification:
385 3, 385 2, 385 40
Abstract:
An optical device includes a phase modulator positioned along a branch waveguide of a mach-zehnder interferometer. The phase modulator includes an n-type region having a proximity to a p-type region that causes a depletion region to form when a bias is not applied to the modulator. The depletion region is at least partially positioned in a light signal carrying region of the waveguide.
Dawei Zheng - Alhambra CA, US Dazeng Feng - Arcadia CA, US Anthony Kewitsch - Santa Monica CA, US George Rakuljic - Santa Monica CA, US
Assignee:
Kotura, Inc. - Monterey Park CA
International Classification:
G02F 1/35 G02B 6/26 G02B 6/42
US Classification:
385 3, 385 2, 385 40
Abstract:
An optical device includes a phase modulator having a waveguide on a substrate. The phase modulator also includes an n-type region having a proximity to a p-type region that causes formation of a depletion region when a bias is not applied to the modulator. The depletion region is at least partially positioned in the light signal carrying region of the waveguide. The phase modulator is tuned by applying a reverse bias to the phase modulator. The reverse bias changes the size of the depletion region.
System Having Reduced Distance Between Scintillator And Light Sensor Array
Dawei Zheng - Arcadia CA, US Xavier Clairardin - Naperville IL, US Arlon Martin - Santa Barbara CA, US
Assignee:
Kotura, Inc. - Monterey Park CA
International Classification:
G01T 1/20
US Classification:
25037011
Abstract:
A sensor includes a carrier carrying a light sensor array. The light sensor array has pixels that are each configured to generate an electrical output in response to receiving a light photon. The light sensor array can be included in or on a wafer or can be built in or on a wafer. The sensor also includes electrical conductors through which the pixels electrically communicate with electronics on the carrier. Each of the electrical conductors is at least partially positioned in a recess that extends into the wafer.
Mehdi Asghari - San Marino CA, US Dawei Zheng - Arcadia CA, US
Assignee:
Kotura, Inc. - Monterey Park CA
International Classification:
G01T 1/17
US Classification:
2502521
Abstract:
A method of forming a light sensor array includes tuning a resistance level of a plurality of resistors. The resistors are included in a light sensor array for use with a positron emissision tomography (PET) scanner system. The light sensor array includes detection circuits that each includes one of the resistors connected in series with an avalanche photodiode.
Optical Device Having Light Sensor Employing Horizontal Electrical Field
Shirong Liao - Mira Loma CA, US Dawei Zheng - Arcadia CA, US Cheng-Chih Kung - Pasadena CA, US Mehdi Asghari - Pasadena CA, US
Assignee:
Kotusa, Inc. - Monterey Park CA
International Classification:
H01L 21/02
US Classification:
438 38, 438 41, 438 48, 438 52, 257E31042
Abstract:
The device includes an optical waveguide on a base. The waveguide is configured to guide a light signal through a light-transmitting medium. A light sensor is also positioned on the base. The light sensor including a ridge extending from slab regions. The slab regions are positioned on opposing sides of the ridge. A light-absorbing medium is positioned to receive at least a portion of the light signal from the light-transmitting medium included in the waveguide. The light-absorbing medium is included in the ridge and also in the slab regions. The light-absorbing medium includes doped regions positioned such that an application of a reverse bias across the doped regions forms an electrical field in the light-absorbing medium included in the ridge.