Jeffrey M. Calvert - Alexandria VA Pehr E. Pehrsson - Alexandria VA Martin C. Peckerar - Silver Spring MD
Assignee:
The United States of America as represented by the Secretary of the Navy - Washington DC
International Classification:
B05D 100
US Classification:
427539, 427113, 427123, 427304
Abstract:
The present invention concerns a process for modifying oxidizable surfaces, including diamond surfaces, including methods for metallizing these surfaces, where these methods include oxidation of these surfaces. The present invention also relates to the products of these methods. In this process, a surface is first plasma oxidized, usually under an RF O plasma. Chemical functional groups are then attached to the surface. If the surface is to be metallized, the chemical functional groups are selected to be catalyzable, the surface is then catalyzed for electroless metallization, and the surface is finally treated with an electroless plating solution to metallize the surface. If modified surface is to be patterned, the modified surface is exposed through a mask to pattern the surface after the attachment of the chemical functional groups.
Methods And Materials For Selective Modification Of Photopatterned Polymer Films
Susan L. Brandow - Springdale MD Jeffrey M. Calvert - Alexandria VA Walter M. Dressick - Fort Washington MD Charles S. Dulcey - Washington DC
Assignee:
The United States of America as represented by the Secretary of the Navy - Washington DC
International Classification:
G03F 700
US Classification:
430324, 430296, 430325, 427304
Abstract:
An aspect of the present invention is a process for modifying a substrate in areas that are exposed to actinic radiation, having the steps: (a) providing on the substrate functional groups adapted for conversion to oxygen-containing photoproducts upon exposure to actinic radiation; (b) exposing at least a portion of the substrate to the actinic radiation, converting the functional groups in an exposed region of the substrate to the photoproducts; (c) contacting the photoproducts with a primary or secondary amine in the presence of hydrogen ions, forming imine groups; and (d) contacting the imine groups with a reducing agent, forming amine groups on the substrate in the exposed region. Another aspect of the present invention is a process for modifying a substrate in areas that are unexposed to actinic radiation, having the steps: (a) providing on the substrate aryl functional groups adapted for conversion to oxygen-containing photoproducts upon exposure to actinic radiation; (b) exposing a portion of the substrate to the actinic radiation, converting the aryl functional groups in an exposed region of the substrate to the photoproducts, and not converting the aryl functional groups in an unexposed region of the substrate to the photoproducts; (c) contacting the aryl functional groups in the unexposed region of the substrate with a compound adapted for physisorption to the aryl functional groups, preferentially physisorbing the compound onto the substrate in the unexposed regions.
Processes And Compositions For Electroless Metallization
Jeffrey M. Calvert - Burke VA Walter J. Dressick - Fort Washington MD Gary S. Calabrese - North Andover MA Michael Gulla - Millis MA
Assignee:
Rohm & Haas Company - Philadelphia PA
International Classification:
G03C 558 G03F 7038
US Classification:
430 16
Abstract:
Methods and compositions for electroless metallization. In one aspect, the invention is characterized by the use of chemical groups capable of ligating with an electroless metallization catalyst, including use of ligating groups that are chemically bound to the substrate. In a preferred aspect, the invention provides a means for selective metallization without the use of a conventional photoresist patterning sequence, enabling fabrication of high resolution metal patterns in a direct and convenient manner.
Joel M. Schnur - Burke VA Paul E. Schoen - Alexandria VA Martin C. Peckerar - Silver Spring MD Christie R. K. Marrian - Alexandria VA Jeffrey M. Calvert - Burke VA Jacque H. Georger - Springfield VA
International Classification:
H01L 2712 B05D 512
US Classification:
357 4
Abstract:
A process for producing metal plated paths on a solid substrate of the kind which has polar functional groups at its surface, utilizing a self-assembling film that is chemically absorbed on the substrate's surface. The solid substrate may, for example, be an insulator of the kind used for substrates in printed circuitry or may, as another example, be a semiconductor of the kind used in semiconductor microcircuitry. The chemical reactivity in regions of the ultra-thin film is altered to produce a desired pattern in the film. A catalytic precursor which adheres only to those regions of the film having enough reactivity to bind the catalyst is applied to the film's surface. The catalyst coated structure is then immersed in an electroless plating bath where metal plates onto the regions activated by the catalyst.
Patterned Conducting Polymer Surfaces And Process For Preparing The Same And Devices Containing The Same
Jeffrey M. Calvert - Alexandria VA Terrence G. Vargo - Fairfax Station VA Ranganathan Shashidhar - Springfield VA
Assignee:
The United States of America as represented by the Secretary of the Navy - Washington DC Geo-Centers, Inc. - Newton Centre MA
International Classification:
H01B 702
US Classification:
156 51
Abstract:
Patterned conducting polymer surfaces exhibiting excellent properties may be prepared by: (a) forming a surface of a conducting polymer on a surface of a substrate; (b) forming a surface of a blocking material on said surface of said conducting polymer in a pattern-wise fashion, to obtain a first patterned surface containing regions of exposed conducting polymer and regions of blocking material; (c) treating said first patterned surface with an agent which: (i) removes said conducting polymer from said regions of exposed conducting polymer; (ii) decreases the conductivity of said conducting polymer in said regions of exposed conducting polymer; or (iii) increases the conductivity of said conducting polymer in said regions of exposed conducting polymer; and (d) removing said blocking material to obtain a second patterned surface containing an exposed pattern of conducting polymer.
Ranganathan Shashidhar - Springfield VA Brian Peek - Annandale VA Banahalli R. Ratna - Springfield VA Jeffrey M. Calvert - Alexandria VA Joel M. Schnur - Burke VA Renate J. Crawford - Alexandria VA
Assignee:
Geo-Centers, Inc. - Newton Centre MA The United States of America as represented by the Secretary of the Navy - Washington DC
International Classification:
G02F 11337 B32B 2700
US Classification:
428 1
Abstract:
A surface for the alignment of liquid crystals containing directionally-linked groups.
Joel M. Schnur - Burke VA Paul E. Schoen - Alexandria VA Paul Yager - Washington DC Jeffrey M. Calvert - Burke VA Jacque H. Georger - Springfield VA Ronald Price - Graysonville MD
International Classification:
C23C 1830 B32B 1508 B32B 1501 H01B 100
US Classification:
42840224
Abstract:
Tubular, spheroidal, and helical lipid microstructures are individually clad with a metal coat deposited on the microstructures by an electroless plating bath. In metal cladding the microstructures, the surfaces of the lipid microstructures are sensitized by adsorption thereon of a catalytic precursor which enables metal from the electroless plating bath to deposit upon and adhere to the sensitized surface. The metal plate is electrically conductive and may also be magnetic. A composite material is produced by embedding the metal clad microstructures in a matrix of a polymer such as an epoxy or a polyurethane.
Selective Attachment Of Nucleic Acid Molecules To Patterned Self-Assembled Surfaces
Linda A. Chrisey - Bowie MD Walter J. Dressick - Ft. Washington MD Jeffrey M. Calvert - Alexandria VA
Assignee:
The United States of America as represented by the Secretary of the Navy - Washington DC
International Classification:
C12Q 168 C12Q 170 C12P 1934 C07H 2104
US Classification:
435 6
Abstract:
Patterns of pre-formed hybridizable nucleic acid oligomers are formed upon a substrate. The substrate is coated with molecules, such as aminosilanes, whose reactivity with nucleic acid molecules can be transformed by irradiation. The coated substrate exposed to patterned irradiation then contacted with pre-formed nucleic acid oligomers. The binding of the preformed nucleic acid oligomers to the coating molecules may be covalent or non-covalent (for example, ionic bonding or hydrogen bonding). If desired, a heterobifunctional crosslinker may be employed, before or after irradiation, with the coating to promote covalent binding of the nucleic acid oligomers to the coating molecules. Also, the irradiation step may be performed with the assistance of a positive-tone or negative-tone photoresist.