Jeffrey T Cross

US Patent:

20160107289, Apr 21, 2016

Filed:

Oct 21, 2015

Appl. No.:

14/919404

Inventors:

- Aurora IL, US
Steven Kraft - Naperville IL, US
Andrew Wolff - Darien IL, US
Phillip W. Carter - Round Lake IL, US
Elise Sikma - Bartlett IL, US
Jeffrey Cross - Batavia IL, US

International Classification:

B24B 37/24
C23F 11/00
C23F 1/14
C09G 1/02

Abstract:

The invention provides methods of inhibiting corrosion of a substrate containing metal. The substrate can be in any suitable form. In some embodiments, the metal is cobalt. The methods can be used with semiconductor wafers in some embodiments. The invention also provides chemical-mechanical polishing compositions and methods of polishing a substrate. A corrosion inhibitor can be used in the methods and compositions disclosed herein. The inhibitor comprises an amphoteric surfactant, a sulfonate, a phosphonate, a carboxylate, an amino acid derivative, a phosphate ester, an isethionate, a sulfate, a sulfosuccinate, a sulfocinnimate, or any combination thereof.

US Patent:

20160108286, Apr 21, 2016

Filed:

Oct 21, 2015

Appl. No.:

14/919526

Inventors:

- Aurora IL, US
Witold Paw - Aurora IL, US
Benjamin Petro - Aurora IL, US
Jeffrey Cross - Batavia IL, US
Glenn Whitener - Batavia IL, US

International Classification:

C09G 1/02
C23F 1/30
B24B 37/04
C23F 11/04

Abstract:

The invention provides a chemical-mechanical polishing composition including (a) an abrasive comprising alumina particles, silica particles, or a combination thereof, (b) a rate accelerator comprising a phosphonic acid, an N-heterocyclic compound, or a combination thereof, (c) a corrosion inhibitor comprising an amphoteric surfactant, a sulfonate, a phosphonate, a carboxylate, a fatty acid amino acid, an amine, an amide, or a combination thereof, (d) an oxidizing agent, and (e) an aqueous carrier. The invention also provides a method of polishing a substrate, especially a substrate comprising a cobalt layer, with the polishing composition.