Jeffrey W Hurst

US Patent:

8153987, Apr 10, 2012

Filed:

May 22, 2009

Appl. No.:

12/454837

Inventors:

Jeffrey B. Hurst - Cedar Park TX, US
Matthew Weldon - Austin TX, US
Phillip Walsh - Austin TX, US
Cristian Rivas - Katy TX, US
Dale A. Harrison - Austin TX, US

Assignee:

Jordan Valley Semiconductors Ltd. - Migdal Ha'Emek

International Classification:

G12B 13/00

US Classification:

250372, 2502521, 356433, 356455, 356448

Abstract:

A calibration pad having multiple calibration sites is provided. A particular calibration site may be utilized until that particular site has been determined to have become unacceptable for further use, for example from contamination, in which case the calibration processes may then move to use a different calibration site(s) on the calibration pad(s). A variety of techniques may be utilized to provide the determination that a site is no longer acceptable for use. Movement may thus occur over time from site to site for use in a calibration process. A variety of criteria may be established to determine when to move to another site. Though the designation of a site as “bad” may be based upon measured reflectance data, other criteria may also be used. For example, the number of times a site has been exposed to light may be the criteria for designating a site as bad. Alternatively the cumulative exposure of a site may be the criteria.

US Patent:

20120182542, Jul 19, 2012

Filed:

Jan 15, 2012

Appl. No.:

13/350780

Inventors:

Phillip Walsh - Austin TX, US
Jeffrey B. Hurst - Cedar Park TX, US
Dale A. Harrison - Austin TX, US

Assignee:

Jordan Valley Semiconductors Ltd. - Migdal HaEmek

International Classification:

G01N 21/95

US Classification:

356 51, 356612, 356369

Abstract:

An optical metrology apparatus for measuring nanoimprint structures using Vacuum Ultra-Violet (VUV) light is described.