- San Jose CA, US Julie Casperson Brewer - Hoboken NJ, US Wayne Kinney - Emmett ID, US Rene Meyer - Fremont CA, US
International Classification:
G11C 13/00 G11C 11/56 H01L 27/24 H01L 45/00
Abstract:
A memory cell including a memory element comprising an electrolytic insulator in contact with a conductive metal oxide (CMO) is disclosed. The CMO includes a crystalline structure and can comprise a pyrochlore oxide, a conductive binary oxide, a multiple B-site perovskite, and a Ruddlesden-Popper structure. The CMO includes mobile ions that can be transported to/from the electrolytic insulator in response to an electric field of appropriate magnitude and direction generated by a write voltage applied across the electrolytic insulator and CMO. The memory cell can include a non-ohmic device (NOD) that is electrically in series with the memory element. The memory cell can be positioned between a cross-point of conductive array lines in a two-terminal cross-point memory array in a single layer of memory or multiple vertically stacked layers of memory that are fabricated over a substrate that includes active circuitry for data operations on the array layer(s).
Conductive Metal Oxide Structures In Non-Volatile Re-Writable Memory Devices
- Sunnyvale CA, US Julie Casperson Brewer - Hoboken NJ, US Wayne Kinney - Emmett ID, US Rene Meyer - Fremont CA, US
International Classification:
G11C 13/00 G11C 11/56 H01L 27/24 H01L 45/00
Abstract:
A memory cell including a memory element comprising an electrolytic insulator in contact with a conductive metal oxide (CMO) is disclosed. The CMO includes a crystalline structure and can comprise a pyrochlore oxide, a conductive binary oxide, a multiple B-site perovskite, and a Ruddlesden-Popper structure. The CMO includes mobile ions that can be transported to/from the electrolytic insulator in response to an electric field of appropriate magnitude and direction generated by a write voltage applied across the electrolytic insulator and CMO. The memory cell can include a non-ohmic device (NOD) that is electrically in series with the memory element. The memory cell can be positioned between a cross-point of conductive array lines in a two-terminal cross-point memory array in a single layer of memory or multiple vertically stacked layers of memory that are fabricated over a substrate that includes active circuitry for data operations on the array layer(s).
Conductive Metal Oxide Structures In Non-Volatile Re-Writable Memory Devices
- Sunnyvale CA, US Julie Casperson Brewer - Hoboken NJ, US Wayne Kinney - Emmett ID, US Rene Meyer - Fremont CA, US
International Classification:
G11C 13/00 H01L 45/00 G11C 11/56 H01L 27/24
Abstract:
A memory cell including a memory element comprising an electrolytic insulator in contact with a conductive metal oxide (CMO) is disclosed. The CMO includes a crystalline structure and can comprise a pyrochlore oxide, a conductive binary oxide, a multiple B-site perovskite, and a Ruddlesden-Popper structure. The CMO includes mobile ions that can be transported to/from the electrolytic insulator in response to an electric field of appropriate magnitude and direction generated by a write voltage applied across the electrolytic insulator and CMO. The memory cell can include a non-ohmic device (NOD) that is electrically in series with the memory element. The memory cell can be positioned between a cross-point of conductive array lines in a two-terminal cross-point memory array in a single layer of memory or multiple vertically stacked layers of memory that are fabricated over a substrate that includes active circuitry for data operations on the array layer(s).
Conductive Metal Oxide Structures In Non-Volatile Re-Writable Memory Devices
- Sunnyvale CA, US Julie Casperson Brewer - Hoboken NJ, US Wayne Kinney - Emmett ID, US Rene Meyer - Fremont CA, US
International Classification:
G11C 13/00 H01L 45/00 H01L 27/24
Abstract:
A memory cell including a memory element comprising an electrolytic insulator in contact with a conductive metal oxide (CMO) is disclosed. The CMO includes a crystalline structure and can comprise a pyrochlore oxide, a conductive binary oxide, a multiple B-site perovskite, and a Ruddlesden-Popper structure. The CMO includes mobile ions that can be transported to/from the electrolytic insulator in response to an electric field of appropriate magnitude and direction generated by a write voltage applied across the electrolytic insulator and CMO. The memory cell can include a non-ohmic device (NOD) that is electrically in series with the memory element. The memory cell can be positioned between a cross-point of conductive array lines in a two-terminal cross-point memory array in a single layer of memory or multiple vertically stacked layers of memory that are fabricated over a substrate that includes active circuitry for data operations on the array layer(s).
Conductive Metal Oxide Structures In Non Volatile Re Writable Memory Devices
- Sunnyvale CA, US Julie Casperson Brewer - Hoboken NJ, US Wayne Kinney - Emmett ID, US Rene Meyer - Atherton CA, US
Assignee:
Unity Semiconductor Corporation - Sunnyvale CA
International Classification:
H01L 45/00 H01L 27/24
US Classification:
257 2
Abstract:
A memory cell including a memory element comprising an electrolytic insulator in contact with a conductive metal oxide (CMO) is disclosed. The CMO includes a crystalline structure and can comprise a pyrochlore oxide, a conductive binary oxide, a multiple B-site perovskite, and a Ruddlesden-Popper structure. The CMO includes mobile ions that can be transported to/from the electrolytic insulator in response to an electric field of appropriate magnitude and direction generated by a write voltage applied across the electrolytic insulator and CMO. The memory cell can include a non-ohmic device (NOD) that is electrically in series with the memory element. The memory cell can be positioned between a cross-point of conductive array lines in a two-terminal cross-point memory array in a single layer of memory or multiple vertically stacked layers of memory that are fabricated over a substrate that includes active circuitry for data operations on the array layer(s).