Kai S Wu

US Patent:

6503737, Jan 7, 2003

Filed:

Oct 1, 1999

Appl. No.:

09/410551

Inventors:

Christopher Reeves - Orinda CA
Daniel Chu - Santa Clara CA
Chaitan Khosla - Palo Alto CA
Daniel Santi - San Francisco CA
Kai Wu - Foster City CA

Assignee:

Kosan Biosciences, Inc. - Hayward CA

International Classification:

C12P 1962

US Classification:

435 76, 4353201, 4352523, 43525235, 536 231, 536 232

Abstract:

Host cells comprising recombinant vectors encoding the FK-520 polyketide synthase and FK-520 modification enzymes can be used to produce the FK-520 polyketide. Recombinant DNA constructs comprising one or more FK-520 polyketide synthase domains, modules, open reading frames, and variants thereof can be used to produce recombinant polyketide synthases and a variety of different polyketides with application as pharmaceutical and veterinary products.

US Patent:

6660862, Dec 9, 2003

Filed:

Apr 3, 2001

Appl. No.:

09/825621

Inventors:

Christopher Reeves - Orinda CA
Daniel Chu - Santa Clara CA
Chaitan Khosla - Palo Alto CA
Daniel Santi - San Francisco CA
Kai Wu - Foster City CA

Assignee:

Kosan Biosciences, Inc. - Hayward CA

International Classification:

C07D51500

US Classification:

546 92

Abstract:

Polyketide compounds of the formula but not including FK-506, FK-520, 18-hydroxy-FK520 and 18-hydroxy-FK-506.

US Patent:

6759536, Jul 6, 2004

Filed:

Aug 27, 2001

Appl. No.:

09/940316

Inventors:

Christopher Reeves - Orinda CA
Daniel Chu - Santa Clara CA
Chaitan Khosla - Palo Alto CA
Daniel Santi - San Francisco CA
Kai Wu - Foster City CA

Assignee:

Kosan Biosciences, Inc. - Hayward CA

International Classification:

C07D22118

US Classification:

546 71

Abstract:

Host cells comprising recombinant vectors encoding the FK-520 polyketide synthase and FK-520 modification enzymes can be used to produce the FK-520 polyketide. Recombinant DNA constructs comprising one or more FK-520 polyketide synthase domains, modules, open reading frames, and variants thereof can be used to produce recombinant polyketide synthases and a variety of different polyketides with application as pharmaceutical and veterinary products.

US Patent:

RE39762, Aug 7, 2007

Filed:

Dec 9, 2005

Appl. No.:

11/299244

Inventors:

Christopher Reeves - Orinda CA, US
Daniel Chu - Santa Clara CA, US
Chaitan Khosla - Palo Alto CA, US
Daniel Santi - San Francisco CA, US
Kai Wu - Foster City CA, US

Assignee:

Kosan Biosciences, Inc. - Hayward CA

International Classification:

C07D 515/00
C07D 498/00

US Classification:

546 92, 546 90

Abstract:

Polyketide compounds of the formula but not including FK-506, FK-520, 18-hydroxy-FK520 and 18-hydroxy-FK-506.

US Patent:

7714118, May 11, 2010

Filed:

Jul 6, 2004

Appl. No.:

10/885305

Inventors:

Christopher Reeves - Orinda CA, US
Kai Wu - Foster City CA, US

Assignee:

Kosan Biosciences Incorporated - Hayward CA

International Classification:

C12P 19/62
C12P 17/18
C12P 19/00
C12P 19/32
C12N 15/31
C12N 15/52
C12N 15/60
C12N 15/79

US Classification:

536 232, 435 76, 435232, 4352523, 43525235, 4353201, 536 231, 536 237

Abstract:

Host cells comprising recombinant vectors encoding the FK-520 polyketide synthase and FK-520 modification enzymes can be used to produce the FK-520 polyketide. Recombinant DNA constructs comprising one or more FK-520 polyketide synthase domains, modules, open reading frames, and variants thereof can be used to produce recombinant polyketide synthases and a variety of different polyketides with application as pharmaceutical and veterinary products.

US Patent:

7732327, Jun 8, 2010

Filed:

Sep 26, 2008

Appl. No.:

12/239046

Inventors:

Avgerinos V. Gelatos - Redwood City CA, US
Kai Wu - Palo Alto CA, US
Amit Khandelwal - Santa Clara CA, US
Ross Marshall - Sunnyvale CA, US
Emily Renuart - Santa Clara CA, US
Wing-Cheong Gilbert Lai - Santa Clara CA, US
Jing Lin - Mountain View CA, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

H01L 21/4763

US Classification:

438649, 438683, 427255392, 257E21165

Abstract:

Embodiments of the invention provide an improved process for depositing tungsten-containing materials. The process utilizes soak processes and vapor deposition processes to provide tungsten films having significantly improved surface uniformity while increasing the production level throughput. In one embodiment, a method is provided which includes depositing a tungsten silicide layer on the substrate by exposing the substrate to a continuous flow of a silicon precursor while also exposing the substrate to intermittent pulses of a tungsten precursor. The method further provides that the substrate is exposed to the silicon and tungsten precursors which have a silicon/tungsten precursor flow rate ratio of greater than 1, for example, about 2, about 3, or greater. Subsequently, the method provides depositing a tungsten nitride layer on the tungsten suicide layer, depositing a tungsten nucleation layer on the tungsten nitride layer, and depositing a tungsten bulk layer on the tungsten nucleation layer.

US Patent:

8071478, Dec 6, 2011

Filed:

Dec 15, 2009

Appl. No.:

12/637864

Inventors:

Kai Wu - Palo Alto CA, US
Amit Khandelwal - Cupertino CA, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

H01L 21/44

US Classification:

438685, 438643, 438680, 257E21476

Abstract:

A method of controlling the resistivity and morphology of a tungsten film is provided, comprising depositing a first film of a bulk tungsten layer on a substrate during a first deposition stage by (i) introducing a continuous flow of a reducing gas and a pulsed flow of a tungsten-containing compound to a process chamber to deposit tungsten on a surface of the substrate, (ii) flowing the reducing gas without flowing the tungsten-containing compound into the chamber to purge the chamber, and repeating steps (i) through (ii) until the first film fills vias in the substrate surface, increasing the pressure in the process chamber, and during a second deposition stage after the first deposition stage, depositing a second film of the bulk tungsten layer by providing a flow of reducing gas and tungsten-containing compound to the process chamber until a second desired thickness is deposited.

US Patent:

8409877, Apr 2, 2013

Filed:

Dec 29, 2006

Appl. No.:

11/647565

Inventors:

David J. Liu - Fremont CA, US
Kai Wu - Mountain View CA, US
Xing Su - Cupertino CA, US

Assignee:

Intel Corporation - Santa Clara CA

International Classification:

G01N 33/553
C12Q 1/00

US Classification:

436526, 436518, 436538, 436800, 436172, 435 4, 435 71, 435 72, 435 79, 435 794, 435 793, 435 792, 210695, 210660, 210222

Abstract:

An embodiment of the invention relates to a device for detecting an analyte in a sample. The device comprises a fluidic network and an integrated circuitry component. The fluidic network comprises a sample zone, a cleaning zone and a detection zone. The fluidic network contains a magnetic particle and/or a signal particle. A sample containing an analyte is introduced, and the analyte interacts with the magnetic particle and/or the signal particle through affinity agents. A microcoil array or a mechanically movable permanent magnet is functionally coupled to the fluidic network, which are activatable to generate a magnetic field within a portion of the fluidic network, and move the magnetic particle from the sample zone to the detection zone. A detection element is present which detects optical or electrical signals from the signal particle, thus indicating the presence of the analyte.