Kathleen A O'Connell

US Patent:

57026114, Dec 30, 1997

Filed:

Jan 14, 1997

Appl. No.:

8/783131

Inventors:

Dana A. Gronbeck - Holliston MA
Kathleen M. O'Connell - Cumberland RI
William Andrew Burke - Bass River MA
Michael N. Gaudet - Fitchburg MA
Stefan J. Caporale - Summit NJ

Assignee:

Shipley Company, L.L.C. - Marlborough MA

International Classification:

B01D 1504

US Classification:

210686

Abstract:

The invention is for a process of removing dissolved heavy metal cation contaminants from an organic solution. The process of the invention involves providing a mixture of a chelating ion exchange resin modified by removal of sodium ions therefrom and an anion exchange resin and contacting said organic solution with said exchange resins for a time sufficient to remove ionic metal impurities and acids. The invention is useful for removal of ionic contaminants from organic solutions requiring high purity.

US Patent:

20170362459, Dec 21, 2017

Filed:

Dec 7, 2015

Appl. No.:

15/534094

Inventors:

- Marlborough MA, US
- Midland MI, US
Shih-Wei Chang - Natick MA, US
John W. Lyons - Midland MI, US
Kathleen M. O'Connell - Cumberland RI, US
Weijun Zhou - Sugar Land TX, US

International Classification:

C09D 139/08
C08K 5/095
C08K 5/00
C08K 5/06
G02F 1/13363
C09D 133/12

Abstract:

A polymeric material having a negative photoelastic constant. The polymeric material comprises: (a) a polymer comprising polymerized units of 2-vinylpyridine, 4-vinylpyridine, methyl methacrylate or a combination thereof; (b) a C-Caliphatic polycyclic compound; and (c) an organic compound having a boiling point of at least 200 C.

US Patent:

20160133864, May 12, 2016

Filed:

Oct 14, 2015

Appl. No.:

14/882992

Inventors:

- Marlborough MA, US
- Chungcheongnam-do, KR
Christopher D. Gilmore - Watertown MA, US
Deyan Wang - Hudson MA, US
Kathleen M. O'Connell - Cumberland RI, US
Moo-Young Lee - Seongnam-si, KR

International Classification:

H01L 51/00
H01L 27/32
H01L 51/56

Abstract:

A method of manufacturing a display device is provided which uses a sacrificial layer interposed between a carrier and a display device substrate.

US Patent:

20150210793, Jul 30, 2015

Filed:

Dec 31, 2014

Appl. No.:

14/588385

Inventors:

- Marlborough MA, US
- Midland MI, US
Christopher D. GILMORE - Watertown MA, US
Jieqian ZHANG - Southborough MA, US
Phillip D. HUSTAD - Natick MA, US
Peter TREFONAS, III - Medway US, US
Kathleen M. O'Connell - Cumberland RI, US

International Classification:

C08F 212/08
C08F 212/12
C09D 133/10
C09D 133/12
C09D 125/16
C08F 220/18
C09D 125/14

Abstract:

A crosslinkable polymer comprising: a first unit of the following general formula (I-A) or (I-B):wherein: P is a polymerizable functional group; L is a single bond or an m+1-valent linking group; Xis a monovalent electron donating group; Xis a divalent electron donating group; Arand Arare trivalent and divalent aryl groups, respectively, and carbon atoms of the cyclobutene ring are bonded to adjacent carbon atoms on the same aromatic ring of Aror Ar; m and n are each an integer of 1 or more; and each Ris independently a monovalent group; and a second unit chosen from general formulae (III) and (IV):wherein Ris chosen from hydrogen, fluorine, C-Calkyl and C-Cfluoroalkyl, Ris chosen from optionally substituted Cto Calkyl, and Aris an optionally substituted aryl group. Underlayer compositions comprise the crosslinkable polymer and a solvent. The crosslinkable polymers and underlayer compositions find particular applicability in the manufacture of semiconductor devices or data storage devices for the formation of high resolution patterns.

US Patent:

20150024522, Jan 22, 2015

Filed:

Jul 22, 2013

Appl. No.:

13/947128

Inventors:

- Marlborough MA, US
Peter TREFONAS, III - Medway MA, US
Kathleen M. O'CONNELL - Cumberland RI, US
Dominic C. YANG - Gangnam-gu, KR

International Classification:

H01L 51/52

US Classification:

438 26, 524174, 10628719

Abstract:

Coating compositions are used to deposit films on electronic device substrates, which films are subjected to conditions that form an oxymetal precursor material layer on a matrix precursor material layer, and then such layers are cured to form a cured oxymetal layer disposed on a cured matrix layer.

US Patent:

20140290979, Oct 2, 2014

Filed:

Apr 1, 2013

Appl. No.:

13/854292

Inventors:

- Marlborough MA, US
Jerome Claracq - Oostakker, BE
Sylvie Vervoort - Gent, BE
Mubasher Bashir - Terneuzen, NL
Peter Trefonas - Medway MA, US
Garo Khanarian - Princeton NJ, US
Kathleen O'Connell - Cumberland RI, US

International Classification:

H05K 1/02
H05K 3/06

US Classification:

174250, 216 13

Abstract:

Method of manufacturing patterned conductor is provided, comprising: providing a conductivised substrate, wherein the conductivised substrate comprises a substrate and an electrically conductive layer; providing an electrically conductive layer etchant; providing a spinning material; providing a masking fiber solvent; forming a plurality of masking fibers and depositing the plurality of masking fibers onto the electrically conductive layer; exposing the electrically conductive layer to the electrically conductive layer etchant, wherein the electrically conductive layer that is uncovered by the plurality of masking fibers is removed from the substrate, leaving an interconnected conductive network on the substrate covered by the plurality of masking fibers; and, exposing the plurality of masking fibers to the masking fiber solvent, wherein the plurality of masking fibers are removed to uncover the interconnected conductive network on the substrate.

US Patent:

20140206201, Jul 24, 2014

Filed:

Jan 19, 2013

Appl. No.:

13/745753

Inventors:

- Marlborough MA, US
Peter TREFONAS, III - Medway MA, US
Shintaro YAMADA - Shrewsbury MA, US
Kathleen M. O'Connell - Cumberland RI, US

Assignee:

ROHM AND HAAS ELECTRONIC MATERIALS LLC - Marlborough MA

International Classification:

H01L 21/033

US Classification:

438758, 524368

Abstract:

Compositions suitable for forming oxymetal hardmask layers are provided. Methods of forming oxymetal hardmask layers using such compositions are also provided, where the surface of the oxymetal hardmask layer formed has a water contact angle substantially matched to that of subsequently applied organic coatings.

US Patent:

20140179582, Jun 26, 2014

Filed:

Mar 6, 2013

Appl. No.:

13/786834

Inventors:

- Malborough MA, US
Martin W. Bayes - Hopkinton MA, US
Peter Trefonas - Medway MA, US
Kathleen M. O'connell - Cumberland RI, US

Assignee:

Rohm and Haas Electronic Materials LLC - Marlborough MA

International Classification:

C11D 3/04
C11D 7/10

US Classification:

510175

Abstract:

The invention provides a process for removing a film from a substrate, said process comprising applying a composition to the film, andThe invention also provides a composition comprising at least the following: