Ronald E Kelley

US Patent:

20150330877, Nov 19, 2015

Filed:

Dec 30, 2013

Appl. No.:

14/758150

Inventors:

- Hillsboro OR, US
Jeffrey Blackwood - Portland OR, US
Stacey Stone - Brno, CZ
Sang Hoon Lee - Forest Grove OR, US
Ronald Kelley - Portland OR, US
Trevan Landin - Hillsboro OR, US

Assignee:

FEI Company - Hilsboro OR

International Classification:

G01N 1/32
H01L 21/3065

Abstract:

A method and apparatus is provided for preparing samples for observation in a charged particle beam system in a manner that reduces or prevents artifacts. An ion beam mills exposes a cross section of the work piece using a bulk mill process. A deposition precursor gas is directed to the sample surface while a small amount of material is removed from the exposed cross section face, the deposition precursor producing a more uniform cross section. Embodiments are useful for preparing cross sections for SEM observation of samples having layers of materials of different hardnesses. Embodiments are useful for preparation of thin TEM samples.

US Patent:

20140190934, Jul 10, 2014

Filed:

Dec 31, 2013

Appl. No.:

14/144902

Inventors:

- Hillsboro OR, US
Jeffrey Blackwood - Portland OR, US
Stacey Stone - Beaverton OR, US
Sang Hoon Lee - Hillsboro OR, US
Ronald Kelley - Portland OR, US

International Classification:

G01N 1/32

US Classification:

216 37, 15634524

Abstract:

A method and apparatus is provided for preparing samples for observation in a charged particle beam system in a manner that reduces or prevents artifacts. Material is deposited onto the sample using charged particle beam deposition just before or during the final milling, which results in an artifact-free surface. Embodiments are useful for preparing cross sections for SEM observation of samples having layers of materials of different hardnesses. Embodiments are useful for preparation of thin TEM samples.

US Patent:

20140138350, May 22, 2014

Filed:

Nov 15, 2013

Appl. No.:

14/081947

Inventors:

- Hillsboro OR, US
Ronald Kelley - Portland OR, US

International Classification:

B05D 3/04

US Classification:

216 37, 15634524

Abstract:

A method and apparatus is provided for preparing samples for observation in a charged particle beam system in a manner that reduces or prevents artifacts. Material is deposited onto the sample using charged particle beam deposition just before or during the final milling, which results in an artifact-free surface. Embodiments are useful for preparing cross sections for SEM observation of samples having layers of materials of different hardnesses. Embodiments are useful for preparation of thin TEM samples.