Shuo Liu

US Patent:

20160343080, Nov 24, 2016

Filed:

May 21, 2015

Appl. No.:

14/718670

Inventors:

- Chicago IL, US
Nataliya Frost - Chicago IL, US
Shuo Liu - Chicago IL, US
Panagiotis Xythalis - Chicago IL, US
Lingrui Xiang - Chicago IL, US
Xianqing Zou - Chicago IL, US
Hariharan Kesavarao - Chennai, IN
Jie Zhu - Livingston NJ, US
Abhinaw Prakash - Jharkhand, IN

International Classification:

G06Q 40/06
G06F 17/30

Abstract:

Datasets may be characterized by patterns. The patterns may be caused or otherwise influenced by external factors, such as temporal, meteorological, and/or system factors. The external factors, as well as the patterns which result in the data values of the dataset because of the external factors, may provide for techniques used to account for missing data elements, outlier data elements and/or otherwise cleanse the dataset. New elements may be generated to provide for the missing data elements, and derivative datasets may be generated based on one or more cleansed datasets.