Gautam Banerjee - Chandler AZ, US Timothy Frederick Compton - Casa Grande AZ, US Junaid Ahmed Siddiqui - Richmond VA, US Ajoy Zutshi - Chandler AZ, US
Assignee:
DuPont Air Products NanoMaterials LLC - Tempe AZ
International Classification:
H01L 21/302 H01L 21/461
US Classification:
438692, 438691, 438693, 252 792, 252 794
Abstract:
A composition and associated method for chemical mechanical planarization (or other polishing) are described. The composition contains an abrasive, benzenesulfonic acid compound, a per-compound oxidizing agent, and water. The composition affords tunability of removal rates for metal, barrier layer materials, and dielectric layer materials in metal CMP processes. The composition is particularly useful in conjunction with the associated method for metal CMP applications (e. g. , step 2 copper CMP processes).
Chemical-Mechanical Planarization Composition Having Benzenesulfonic Acid And Per-Compound Oxidizing Agents, And Associated Method For Use
Gautam Banerjee - Chandler AZ, US Timothy Frederick Compton - Casa Grande AZ, US Junaid Ahmed Siddiqui - Richmond VA, US Ajoy Zutshi - Chandler AZ, US
International Classification:
C09K 13/00
US Classification:
252 791
Abstract:
A composition and associated method for chemical mechanical planarization (or other polishing) are described. The composition contains an abrasive, benzenesulfonic acid compound, a per-compound oxidizing agent, and water. The composition affords tunability of removal rates for metal, barrier layer materials, and dielectric layer materials in metal CMP processes. The composition is particularly useful in conjunction with the associated method for metal CMP applications (e.g., step 2 copper CMP processes).
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