Walter William Glenn

US Patent:

20030235961, Dec 25, 2003

Filed:

Apr 4, 2003

Appl. No.:

10/406833

Inventors:

Craig Metzner - Fremont CA, US
Walter Glenn - Pacifica CA, US

Assignee:

APPLIED MATERIALS, INC.

International Classification:

H01L021/31
H01L021/336
H01L021/469

US Classification:

438/287000, 438/785000

Abstract:

The present invention is directed to depositing multicomponent films with a cyclical sequential deposition (CSD) process. The CSD process deposits a film of a material on a surface by repeating a cycle of process steps comprising sequentially exposing the surface to at least two reactants. The reactants contain precursors that supply the elements that form the multicomponent material. The reactant components that are not precursors may react with the at least one precursor to form a film of the material, or may react with the surface onto which the film of material is to be deposited to prepare the surface for deposition. Each CSD cycle produces a discrete layer of a multicomponent material. The CSD cycle is repeated, depositing one layer each cycle, until the film of multicomponent material reaches the desired thickness.