William E Roach

US Patent:

6368674, Apr 9, 2002

Filed:

Jun 24, 1999

Appl. No.:

09/339790

Inventors:

Zvi Gerald Loewy - Fair Lawn NJ
William Ronald Roach - Rocky Hill NJ
Bawa Singh - Vorhees NJ

Assignee:

Sarnoff Corporation - Princeton NJ

International Classification:

B05D 106

US Classification:

427469, 427475, 427485

Abstract:

Provided is a method of fabricating a solid support with two or more separated regions of a first solid layer of a non-volatile compound deposited thereon, the non-volatile compound required to maintain a chemical proces conducted in a first solution. The method comprises (1) creating an electromagnetic force for attracting charged, solid particles to a surface of the solid support, (2) contacting the surface with the charged particles of non-volatile compound, and depositing the charged particles in an amount effective to provide the non-volatile compound in an amount effective maintain the chemical process.

US Patent:

60457538, Apr 4, 2000

Filed:

Oct 23, 1997

Appl. No.:

8/956737

Inventors:

Zvi Gerald Loewy - Fair Lawn NJ
William Ronald Roach - Rocky Hill NJ
Bawa Singh - Vorhees NJ

Assignee:

Sarnoff Corporation - Princeton NJ

International Classification:

G01N 3348

US Classification:

422 57

Abstract:

Provided is a solid support having dry deposited thereon a first solid layer comprising at least a first compound, the compound for use in a chemical process conducted in a first solution. The invention allows stable forms where the first compound is not stable either (i) for storage in the first solution or (ii) in solution with one or more other compounds of the first layer. Also provided is a tray or kit of wells adapted for conducting a chemical process, each well having a deposited thereon a first solid layer comprising one or more compounds for supporting a chemical process conducted in a first solution, wherein addition of the first liquid to each of the wells dissolves said one or more compounds. Fabrication methods, time-release compositions, and methods of conducting chemical processes are further provided.