Yue Zhao

US Patent:

20120083133, Apr 5, 2012

Filed:

Sep 8, 2011

Appl. No.:

13/227589

Inventors:

Earl Osman Solis - San Jose CA, US
Lili Ji - San Jose CA, US
Yue Zhao - Mountain View CA, US
Abhijit Basu Mallick - Palo Alto CA, US
Nitin K. Ingle - San Jose CA, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

H01L 21/31

US Classification:

438761, 257E2124

Abstract:

Methods of forming dielectric layers are described. The methods may include forming a silicon-nitrogen-and-hydrogen-containing layer on a substrate. The methods include ozone curing the silicon-nitrogen-and-hydrogen-containing layer to turn the silicon-nitrogen-and-hydrogen-containing layer into a silicon-and-oxygen-containing layer. Following ozone curing, the layer is exposed to an amine-water combination at low temperature before an anneal. The presence of the amine cure allows the conversion to silicon-and-oxygen-containing layer to occur more rapidly and completely at a lower temperature during the anneal. The amine cure also enables the anneal to use a less oxidative environment to effect the conversion to the silicon-and-oxygen-containing layer.

US Patent:

20120309904, Dec 6, 2012

Filed:

Oct 18, 2010

Appl. No.:

13/502362

Inventors:

Ting Xu - Berkeley CA, US
Yue Zhao - Mountain View CA, US
Kari Thorkelsson - Berkeley CA, US

Assignee:

The Regents of the University of California - Oakland CA

International Classification:

C08F 271/02
B82Y 40/00
B82Y 25/00
B82Y 30/00

US Classification:

525279, 977774, 977762, 977773, 977783, 977882, 977838, 977932

Abstract:

The present invention provides hierarchical assemblies of a block copolymer, a bifunctional linking compound and a nanoparticle. The block copolymers form one micro-domain and the nanoparticles another micro-domain.

US Patent:

20110159213, Jun 30, 2011

Filed:

Oct 15, 2010

Appl. No.:

12/905582

Inventors:

Xiuyu Cai - Sunnyvale CA, US
Yue Zhao - Mountain View CA, US
Abhijit Basu Mallick - Palo Alto CA, US
Nitin K. Ingle - San Jose CA, US
Shankar Venkataraman - San Jose CA, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

C23C 16/40
C23C 16/56
C23C 16/455
C23C 16/50

US Classification:

427579, 427578

Abstract:

A method of forming a silicon oxide layer is described. The method may include the steps of mixing a carbon-free silicon-containing precursor with a radical-nitrogen precursor, and depositing a silicon-and-nitrogen-containing layer on a substrate. The radical-nitrogen precursor is formed in a plasma by flowing ammonia and nitrogen (N) and/or hydrogen (H) into the plasma in order to allow adjustment of the nitrogen/hydrogen ratio. The silicon-and-nitrogen-containing layer may be converted to a silicon-and-oxygen-containing layer by curing and annealing the film.

US Patent:

20230050467, Feb 16, 2023

Filed:

Aug 11, 2021

Appl. No.:

17/399599

Inventors:

- San Francisco CA, US
Yue Zhao - Mountain View CA, US

International Classification:

G06T 5/00
G06T 5/50
G01S 13/89
G06N 3/02

Abstract:

The disclosed technology provides solutions provides solutions for improving sensor data accuracy and in particular, for improving radar data by de-noising radar elevation measurements using a height-map. In some aspects, a process of the disclosed technology can include steps for receiving camera data corresponding with a first location, receiving radar data comprising a plurality of radar points, and processing the radar data to generate height-corrected radar data. In some aspects, the process can further include steps for projecting the height-corrected radar data into an image space to generate radar-image data. Systems and machine-readable media are also provided.

US Patent:

20230005169, Jan 5, 2023

Filed:

Sep 12, 2022

Appl. No.:

17/942825

Inventors:

- San Francisco CA, US
Yue Zhao - Sunnyvale CA, US

International Classification:

G06T 7/521
G06T 7/10
G06N 3/08
G06N 3/04

Abstract:

The subject disclosure relates to techniques for selecting points of an image for processing with LiDAR data. A process of the disclosed technology can include steps for receiving an image comprising a first image object and a second image object, processing the image to place a bounding box around the first image object and the second image object, and processing an image area within the bounding box to identify a first image mask corresponding with a first pixel region of the first image object and a second image mask corresponding with a second pixel region of the second image object. Systems and machine-readable media are also provided.

US Patent:

20210287387, Sep 16, 2021

Filed:

Mar 11, 2020

Appl. No.:

16/815123

Inventors:

- San Francisco CA, US
Yue Zhao - Sunnyvale CA, US

International Classification:

G06T 7/521
G06T 7/10
G06N 3/08
G06N 3/04

Abstract:

The subject disclosure relates to techniques for selecting points of an image for processing with LiDAR data. A process of the disclosed technology can include steps for receiving an image comprising a first image object and a second image object, processing the image to place a bounding box around the first image object and the second image object, and processing an image area within the bounding box to identify a first image mask corresponding with a first pixel region of the first image object and a second image mask corresponding with a second pixel region of the second image object. Systems and machine-readable media are also provided.

US Patent:

20210147570, May 20, 2021

Filed:

Apr 12, 2019

Appl. No.:

17/044753

Inventors:

- Princeton NJ, US
Jennifer R. POSTELNEK - Aberdeen NJ, US
Yue ZHAO - Newtown PA, US
Edward J. HILT - Yardley PA, US
Kinjal SANGHAVI - Princeton NJ, US
Raymond P. PEREZ - Pennington NJ, US

International Classification:

C07K 16/28
A61P 35/00
G01N 33/68

Abstract:

Provided herein are methods for treating cancer, comprising administering to a subject having cancer a therapeutically effective amount of a CD73 antagonistic antibody alone or in combination with a PD-1/PD-L1 axis antagonist antibody.

US Patent:

20200382452, Dec 3, 2020

Filed:

Aug 17, 2020

Appl. No.:

16/995629

Inventors:

- San Francisco CA, US
Yue Zhao - Orinda CA, US
Weikang Wan - Foster City CA, US
Togan Adrien Olczak - San Francisco CA, US
Marcus Bertilson - San Francisco CA, US
Benjamin Robert Anderson - San Francisco CA, US

International Classification:

H04L 12/58
G06F 40/186
G06Q 10/06
H04L 29/08
G06Q 30/02

Abstract:

A server automatically generates a response on behalf of a first user to a request received from a second user. The server receives configuration information for configuring automatic response generation for the first user, including information identifying the first user, information specifying a type of service provided by the first user including a plurality of parameters that define details for the service, and information providing an availability of the first user to provide the specified type of service. A request is received from the second user. The first user is selected from multiple users to respond to the request. A response is automatically generated using at least some of the received configuration information. The response is automatically transmitted to the second user on behalf of the first user.