Adam Reed Thomas

US Patent:

8029336, Oct 4, 2011

Filed:

Apr 10, 2008

Appl. No.:

12/082308

Inventors:

Keith Thomas - Lafayette CA, US
Richard Evans - Arroyo Grande CA, US
Cody Thomas - Walnut Creek CA, US
Adam Thomas - Camarillo CA, US

Assignee:

The Redd Group, LLC - Lafayette CA

International Classification:

B24B 7/24

US Classification:

451 41, 451 57

Abstract:

A glass grinding method starts with an assessment of the scratch or surface defect to be removed. A series of abrasive pads with different diameters and different grits from 60, 120, 180, 220, and 400 grit are selected according to the depth of the scratches or defects on the glass, and is installed on a handheld circular grinder. The work area is restricted to an imaginary area around the scratch that is two times the length of the scratch squared. The area is worked and feathered out with successively finer and finer dry abrasive pads applied flat on the surface of the glass. During this process, the glass surface temperatures are monitored and not allowed to exceed 150 F. Any glass powders that stick and build up on the abrasive disk faces are knocked off by slapping them with wire brushes or rasps. They are not brushed off. In a final pre-polishing stage, the powders are allowed to build to gradually reduce the cutting action and produce a finer surface.

US Patent:

20190153581, May 23, 2019

Filed:

Nov 16, 2018

Appl. No.:

16/193616

Inventors:

- Sunnyvale CA, US
Joseph E. MCDERMOTT - Sunnyvale CA, US
Adam G. THOMAS - Sunnyvale CA, US
Daniel E. BULLARD - Sunnyvale CA, US
Martin JANOUSEK - Sunnyvale CA, US

International Classification:

C23C 10/26
C23C 10/20
C22C 38/14
C22C 38/12
C22C 38/04
C22C 38/02
C21D 1/26

Abstract:

The present disclosure provides systems and methods for depositing a metal layer adjacent to or on a substrate. Substrates may comprise, for example, one or more of iron, chromium, nickel, silicon, vanadium, titanium, boron, tungsten, aluminum, molybdenum, cobalt, manganese, zirconium, and niobium, oxides thereof, nitrides thereof, sulfides thereof, or any combination thereof. A substrate may be a steel substrate. A metal layer may be deposited via, for example, roll coating, vapor deposition, slurry deposition, or electrochemical deposition.

US Patent:

20190062856, Feb 28, 2019

Filed:

Sep 4, 2018

Appl. No.:

16/121280

Inventors:

- Sunnyvale CA, US
Adam G. Thomas - Sunnyvale CA, US
Zachary M. Detweiler - Sunnyvale CA, US

International Classification:

C21D 1/26
B05D 1/28
B05D 3/00

Abstract:

The present disclosure provides methods for forming a metal layer adjacent to a substrate, comprising providing a substrate comprising carbon at a concentration of at least about 0.001 wt % and one or more of silicon, manganese, titanium, vanadium, aluminum and nitrogen, and depositing a first layer comprising a metal adjacent to the substrate. Next, the first layer and the substrate may be subjected to annealing under conditions that are sufficient to generate a second layer from the first layer adjacent to the substrate. The second layer may comprise the carbon and the metal as a metal carbide.

US Patent:

20180023180, Jan 25, 2018

Filed:

Aug 9, 2017

Appl. No.:

15/673107

Inventors:

- Sunnyvale CA, US
Adam G. Thomas - Sunnyvale CA, US
Zachary M. Detweiler - Sunnyvale CA, US

International Classification:

C23C 10/20

Abstract:

The present disclosure provides systems and methods that employ slurries to form layers adjacent to substrates. Such layers can include, for example, one or more of iron, chromium, nickel, silicon, vanadium, titanium, boron, tungsten, aluminum, molybdenum, cobalt, manganese, zirconium, and niobium, oxides thereof, nitrides thereof, sulfides thereof, or combinations thereof. In some examples, such layers are stainless steel layers.

US Patent:

20160230284, Aug 11, 2016

Filed:

Feb 9, 2016

Appl. No.:

15/019887

Inventors:

- Sunnyvale CA, US
Adam G. Thomas - Sunnyvale CA, US
Zachary M. Detweiler - Sunnyvale CA, US

International Classification:

C23C 16/56

Abstract:

The present disclosure provides systems and methods that employ slurries to form layers adjacent to substrates. Such layers can include, for example, one or more of iron, chromium, nickel, silicon, vanadium, titanium, boron, tungsten, aluminum, molybdenum, cobalt, manganese, zirconium, and niobium, oxides thereof, nitrides thereof, sulfides thereof, or combinations thereof. In some examples, such layers are stainless steel layers.

US Patent:

20150167131, Jun 18, 2015

Filed:

Dec 9, 2014

Appl. No.:

14/565216

Inventors:

- Sunnyvale CA, US
Joseph E. McDermott - Sunnyvale CA, US
Adam Thomas - Sunnyvale CA, US

International Classification:

C22C 38/18
B23K 20/02
C22C 38/00

Abstract:

The disclosure provides a material that includes a stainless steel layer with a consistent composition diffusion bonded to a carbon steel substrate. The material can have the corrosion resistance associated with the explosively welded stainless steel and the deep diffusion bonding observed typical of chromizing applications.