Chenglong L Yang

US Patent:

20050256653, Nov 17, 2005

Filed:

May 11, 2005

Appl. No.:

11/126471

Inventors:

William Conner - Natick MA, US
Craig Garvin - Somerville NY, US
Steven Lakeman - Newbury Park CA, US
Igor Tepermeister - Waban MA, US
Chenglong Yang - San Jose CA, US

Assignee:

Inficon, Inc. - East Syracuse NY

International Classification:

G06F019/00

US Classification:

702033000

Abstract:

A method of monitoring a microelectronic manufacturing process includes the implementation of a process monitor that is configured to operate in an inter-process mode.

US Patent:

20090014644, Jan 15, 2009

Filed:

Jul 10, 2008

Appl. No.:

12/170810

Inventors:

Chenglong Yang - Fremont CA, US
Jeffrey P. Merrill - San Jose CA, US
Louis C. Frees - Manlius NY, US
Steven J. Lakeman - Newbury Park CA, US

Assignee:

Inficon, Inc. - East Syracuse NY

International Classification:

B01D 59/44

US Classification:

250288

Abstract:

An ion source apparatus for partial pressure analyzers and in-situ cleaning method thereof based on inducing a hollow cathode discharge (HCD) inside the ion source. The HCD is formed by applying a high negative voltage to one or more parts of the ion source, including the anode electrode, the lens focus plate and at least one other lens or other form of plate, such as a total pressure collector plate.

US Patent:

20170097273, Apr 6, 2017

Filed:

Oct 5, 2016

Appl. No.:

15/285627

Inventors:

- East Syracuse NY, US
Chenglong Yang - Santa Clara CA, US

International Classification:

G01M 3/16
H01L 21/66
H01L 21/67
G01M 3/38

Abstract:

Systems and methods for in-situ leak detection and endpoint detection of wafer dry etch or chamber clean in chambers, e.g., vacuum chambers used in semiconductor processing. A mini environment is created and a sensor, such as an SPOES sensor, can be used in the mini-environment to perform leak detection.

US Patent:

20140157863, Jun 12, 2014

Filed:

Dec 4, 2013

Appl. No.:

14/096900

Inventors:

- East Syracuse NY, US
Chenglong Yang - Fremont CA, US

Assignee:

INFICON, Inc. - East Syracuse NY

International Classification:

G01N 33/00

US Classification:

73 232

Abstract:

A method of measuring an atmosphere in a guest vacuum chamber of a vacuum tool includes measuring a first composition of the atmosphere in the host vacuum chamber using a residual gas analyzer (RGA). The host and guest vacuum chambers are not coupled during the measuring of the first composition. The host vacuum chamber is coupled to the guest vacuum chamber, so the atmospheres in each can mix in the host vacuum chamber. A second composition of the atmosphere in the host vacuum chamber is measured using the RGA after the chambers are coupled. Using a processor, a composition of the guest atmosphere is automatically determined using the measured first and second compositions. A vacuum tool can include the host and guest chambers, the valve, the RGA, and a processor configured to control the valve to carry out this or other methods.