Dung V Le

US Patent:

20110274836, Nov 10, 2011

Filed:

May 5, 2010

Appl. No.:

12/774318

Inventors:

Dung Huu Le - San Jose CA, US
James L'Heureux - Santa Clara CA, US
Jeffrey S. Sullivan - Castro Valley CA, US
Xiaoxiong Yuan - San Jose CA, US

Assignee:

APPLIED MATERIALS, INC. - Santa Clara CA

International Classification:

C23C 16/44
B05C 11/00
B01J 19/00

US Classification:

4272481, 422177, 422173

Abstract:

Embodiments of the present invention relate to apparatus and methods of preventing build-up of explosive material in vacuum forelines of deposition systems. A cleaning gas such as nitrogen trifluoride (NF) may be introduced into a particulate collection device including a catchpot having a configuration comprising a sloped interior surface area that maximizes the amount of reactive silicon-containing particles that are exposed to and react with the cleaning gas stream to form silicon tetrafluoride (SiF) and other non-reactive by-products. The degree of slope of the interior surface area may be based upon the angle of repose of the silicon-containing particles. The gaseous silicon tetrafluoride (SiF) and other non-reactive by-products can flow out of the catchpot and into the exhaust stream towards a vacuum pump. The apparatus and method may also avoid accumulation of highly reactive and highly explosive particulates in catchpots.

US Patent:

20140273460, Sep 18, 2014

Filed:

Feb 20, 2014

Appl. No.:

14/185579

Inventors:

- Santa Clara CA, US
Dung Huu LE - San Jose CA, US
Saravjeet SINGH - Santa Clara CA, US
Madhava Rao YALAMANCHILI - Morgan Hill CA, US

Assignee:

APPLIED MATERIALS, INC. - Santa Clara CA

International Classification:

H01L 21/311
H01L 21/768
H01L 21/687
H01L 21/67

US Classification:

438694, 1563453, 15634529

Abstract:

Embodiments of the present disclosure generally provide apparatus and methods for improving process result near the edge region of a substrate being processed. One embodiment of the present disclosure provides a cover ring for improving process uniformity. The cover ring includes a ring shaped body, and an extended lip extending radially inwards from the ring shaped body. An inner edge of the extended lip forms a central opening to expose a processing region on a substrate being processed, and a width of the extended lip is between about 15% to about 20% of a radius of the central opening.