John P Cheng

US Patent:

55019269, Mar 26, 1996

Filed:

Jan 31, 1995

Appl. No.:

8/383553

Inventors:

John C. Cheng - San Jose CA
Timothy M. Reith - Morgan Hill CA
James S. Wong - San Jose CA

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G11B 726
G03F 900

US Classification:

430 5

Abstract:

A method of manufacturing a photomask for the production of dual depth features on substrates, and the photomask so manufactured, wherein the method of manufacturing the photomask is comprised of the steps of: (1) coating a substrate which transmits at least two selected wavelengths with: a) an optical filter material which prevents the transmission of at least one of the wavelengths, b) an opaque masking material, and c) a dual tone photoresist; (2) using a single mastering tool to selectively expose areas of the coated substrate to one of the wavelengths; (3) developing the photoresist; (4) etching the exposed masking material and optical filter material; (5) exposing the remaining coated substrate; (6) developing the remaining photoresist; (7) etching the exposed surface; and (8) stripping away the remaining photoresist.

US Patent:

54320470, Jul 11, 1995

Filed:

Jun 12, 1992

Appl. No.:

7/897626

Inventors:

John C. Cheng - San Jose CA
William D. Hinsberg - Fremont CA
Robert T. Lynch - San Jose CA
Scott A. MacDonald - San Jose CA
Lester A. Pederson - Clovis CA
James S. Wong - San Jose CA

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G11B 726

US Classification:

430321

Abstract:

An optical data storage device having a substrate has guide ridges, or reverse grooves, in a concentric or spiral shape formed thereon, and disposed in a plane parallel to and disposed from the substrate surface. The device further has pits formed approximately midway between the guide ridges and disposed in the substrate and having bottoms below the plane of the substrate surface. A method for manufacturing the optical data storage device having both address pits and guide ridges is disclosed. A dual tone photosensitive material is applied to a substrate, exposed with a laser light source comprising two distinct wavelengths, and developed to provide a desired bipolar geometry thereon.

US Patent:

20230017318, Jan 19, 2023

Filed:

Sep 30, 2022

Appl. No.:

17/956963

Inventors:

- Dulles VA, US
John Cheng - Sunnyvale CA, US
Yi Mao - Sunnyvale CA, US
Herve Marcellini - Menlo Park CA, US

International Classification:

H04L 67/50
H04L 67/306
G06F 9/54
H04L 67/53

Abstract:

The present teaching relates to tracking an event at a plurality of distributed servers. In one example, an event to be tracked is determined. A user associated with the event is identified. A script is generated to be embedded in a web page. The script triggers an event message when the user performs an online behavior related to the web page in accordance with the event. The event message triggered by the script is received. A tracing flag is determined from the event message. An instruction is provided to the plurality of distributed servers for executing one or more applications based on the event and the tracing flag.

US Patent:

20170171326, Jun 15, 2017

Filed:

Dec 15, 2015

Appl. No.:

14/969558

Inventors:

- Sunnyvale CA, US
John Cheng - Sunnyvale CA, US
Yi Mao - Sunnyvale CA, US
Herve Marcellini - Menlo Park CA, US

International Classification:

H04L 29/08

Abstract:

The present teaching relates to tracking an event at a plurality of distributed servers. In one example, an event to be tracked is determined. A user associated with the event is identified. A script is generated to be embedded in a web page. The script triggers an event message when the user performs an online behavior related to the web page in accordance with the event. The event message triggered by the script is received. A tracing flag is determined from the event message. An instruction is provided to the plurality of distributed servers for executing one or more applications based on the event and the tracing flag.