John B Greene

US Patent:

RE37740, Jun 11, 2002

Filed:

Jan 17, 1995

Appl. No.:

08/373084

Inventors:

Curt H. Chadwick - Los Gatos CA
Robert R. Sholes - Ben Lomond CA
John D. Greene - Santa Cruz CA
Michael E. Fein - Mountain View CA
P. C. Jann - Mountain View CA
David J. Harvey - Campbell CA
William Bell - San Jose CA

Assignee:

KLA-Tencor Corporation - San Jose CA

International Classification:

G01B 1130

US Classification:

356394, 356636, 356446

Abstract:

Substrate inspection apparatus and methods, and illumination apparatus. The inspection apparatus and method includes memory for storing the desired features of the surface of the substrate, focussed illuminator for substantially uniformly illuminating a region of the surface of the substrate to be inspected. Additionally there is a sensor for imaging the region of the substrate illuminated by the illuminator, and a comparator responsive to the memory and sensor for comparing the imaged region of the substrate with the stored desired features of the substrate. The illumination apparatus is designed to provide substantially uniform focussed illumination along a narrow linear region. This apparatus includes first, second and third reflectors elliptically cylindrical in shape, each with its long axis substantially parallel to the long axes of each of the others. Fourth and fifth reflectors are also included with each being flat and mounted parallel to each other and at opposite ends of each of said first, second and third reflectors, and first, second and third linear light sources each mounted parallel to a corresponding one of said first, second and third reflectors with each of the light sources mounted so that it is at the first focus of the corresponding reflector and the illuminated linear region is at the second focus of each of the first, second and third reflectors. The questions raised in reexamination request No.

US Patent:

6450704, Sep 17, 2002

Filed:

Sep 13, 2001

Appl. No.:

09/951646

Inventors:

Gary OConnor - Bolingbrook IL
Randy Wickman - Cadott WI
John Greene - Chippewa Falls WI
Daniel Mansur - Chippewa Falls WI
Dave Barneson - Eleva WI
Bryan Gregory - Glen Ellyn IL

Assignee:

Corona Optical Systems, Inc. - Lombard IL

International Classification:

G02B 642

US Classification:

385 92, 385 52, 385 88

Abstract:

A method and apparatus are provided for providing an electro-optic signal processing device. The method includes the steps of providing an optically transparent substrate having first and second planar elements with an abutting common edge, the planar elements lying at differing angles with respect to each other about the common edge and a plurality of alignment apertures formed in the substrate. A plurality of optical devices of an optical array are disposed on the first planar element of the substrate, with transmission paths of the optical devices passing directly through the substrate. A signal processor is also disposed on the first planar element of the substrate. An optical fiber holder comprising a plurality of respective optical fibers and guide pin apertures disposed on a first surface of the optical fiber holder is aligned to the optical array using the guide pins and guide pin apertures. Optical signals of the optical devices of the optical array are coupled to respective optical fibers of the aligned optical fiber holder. A printed circuit board having a first surface is attached to a mating surface of the substrates second planar element.

US Patent:

6729776, May 4, 2004

Filed:

Aug 15, 2002

Appl. No.:

10/219749

Inventors:

Gary OConnor - Bolingbrook IL
Randy Wickman - Cadott WI
John Greene - Chippewa Falls WI
Daniel Mansur - Chippewa Falls WI
Dave Barneson - Eleva WI
Bryan Gregory - Glen Ellyn IL

Assignee:

Corona Optical Systems, Inc. - Lombard IL

International Classification:

G02B 636

US Classification:

385 92, 385 88

Abstract:

A method and apparatus are provided for providing an electro-optic signal processing assembly. The method includes the steps of providing an optically transparent substrate with a plurality of alignment apertures formed in the substrate, disposing a guide pin in each of the plurality of alignment apertures, providing an optical device with a transmission path of the optical device passing directly through the body of the optically transparent substrate, aligning an optical fiber holder to the optical device using the guide pins and guide pin apertures, and coupling an optical signal of the optical device of the optical array to a respective optical fiber of the aligned optical fiber holder.

US Patent:

6833913, Dec 21, 2004

Filed:

Jun 24, 2002

Appl. No.:

10/180807

Inventors:

Ralph C. Wolf - Palo Alto CA
Eva L. Benitez - Sunnyvale CA
Dongsheng Don Chen - Union City CA
John D. Greene - Santa Cruz CA
Jamie M. Sullivan - Sunnyvale CA
Eric N. Vella - Mountain View CA
Khiem D. Vo - Milpitas CA

Assignee:

KLA-Tencor Technologies Corporation - Milpitas CA

International Classification:

G01N 2188

US Classification:

3562372, 250214 AG

Abstract:

Disclosed are methods and apparatus for detecting a relatively wide dynamic range of intensity values from a beam (e. g. , scattered light, reflected light, or secondary electrons) originating from a sample, such as a semiconductor wafer. In other words, the inspection system provides detected output signals having wide dynamic ranges. The detected output signals may then be analyzed to determine whether defects are present on the sample. For example, the intensity values from a target die are compared to the intensity values from a corresponding portion of a reference die, where a significant intensity difference may be defined as a defect. In a specific embodiment, an inspection system for detecting defects on a sample is disclosed. The system includes a beam generator for directing an incident beam towards a sample surface and a detector positioned to detect a detected beam originating from the sample surface in response to the incident beam. The detector has a sensor for detecting the detected beam and generating a detected signal based on the detected beam and a non-linear component coupled to the sensor.

US Patent:

6843608, Jan 18, 2005

Filed:

Apr 27, 2004

Appl. No.:

10/832726

Inventors:

Gary O'Connor - Bolingbrook IL, US
Randy Wickman - Cadott WI, US
John Greene - Chippewa Falls WI, US
Daniel Mansur - Chippewa Falls WI, US
Dave Barneson - Eleva WI, US
Bryan Gregory - Glen Ellyn IL, US

Assignee:

Corona Optical Systems, Inc. - Lombard IL

International Classification:

G02B 636

US Classification:

385 92, 385 91

Abstract:

A method and apparatus are provided for providing an electro-optic signal processing device. The method includes the steps of providing an optically trasparent substrate having first and second planar elements with an abutting common edge, the planar elements lying at differing angles with respect to each other about the common edge and a plurality of alignment apertures formed in the substrate. A plurality of optical devices of an optical array are disposed on the first planar element of the substrate, with transmission paths of the optical devices passing directly through the substrate. A signal processor is also disposed on the first planar element of the substrate. An optical fiber holder comprising a plurality of respective optical fibers and guide pin apertures disposed on a first surface of the optical fiber holder is aligned to the optical array using the guide pins and guide pin apertures. Optical signals of the optical devices of the optical array are coupled to respective optical fibers of the aligned optical fiber holder. A printed circuit board having a first surface is attached to a mating surface of the substrate's second planar element.

US Patent:

7012683, Mar 14, 2006

Filed:

Nov 18, 2004

Appl. No.:

10/993473

Inventors:

Ralph C. Wolf - Palo Alto CA, US
Eva L. Benitez - Sunnyvale CA, US
Dongsheng (Don) Chen - Union City CA, US
John D. Greene - Santa Cruz CA, US
Jamie M. Sullivan - Sunnyvale CA, US
Eric N. Vella - Mountain View CA, US
Khiem D. Vo - Milpitas CA, US

Assignee:

KLA-Tencor Technologies Corporation - Milpitas CA

International Classification:

G01N 21/88

US Classification:

3562372

Abstract:

Disclosed are methods and apparatus for detecting a relatively wide dynamic range of intensity values from a beam (e. g. , scattered light, reflected light, or secondary electrons) originating from a sample, such as a semiconductor wafer. In other words, the inspection system provides detected output signals having wide dynamic ranges. The detected output signals may then be analyzed to determine whether defects are present on the sample. For example, the intensity values from a target die are compared to the intensity values from a corresponding portion of a reference die, where a significant intensity difference may be defined as a defect. In a specific embodiment, an inspection system for detecting defects on a sample is disclosed. The system includes a beam generator for directing an incident beam towards a sample surface and a detector positioned to detect a detected beam originating from the sample surface in response to the incident beam. The detector has a sensor for detecting the detected beam and generating a detected signal based on the detected beam and a non-linear component coupled to the sensor.

US Patent:

7253410, Aug 7, 2007

Filed:

Sep 13, 2005

Appl. No.:

11/225917

Inventors:

Kirk J. Bertsche - San Jose CA, US
John Greene - Santa Cruz CA, US

Assignee:

KLA-Tencor Technologies Corporation - Milpitas CA

International Classification:

H01J 37/244

US Classification:

250310, 250396 R, 250397, 250307, 438 18, 438 14, 324751, 324750

Abstract:

One embodiment described relates to a method of electron beam imaging of a target area of a substrate. An electron beam column is configured for charge-control pre-scanning using a primary electron beam. A pre-scan is performed over the target area. The electron beam column is re-configured for imaging using the primary electron beam. An imaging scan is then performed over the target area. Other embodiments are also described.

US Patent:

8196732, Jun 12, 2012

Filed:

Aug 2, 2010

Appl. No.:

12/848442

Inventors:

Roumen Iliev Deyanov - Freemont CA, US
Kevin Tzou - San Jose CA, US
Pablo Gonzalez - Oakland CA, US
Robert Carlson - Milpitas CA, US
John Brooks Greene - Pleasanton CA, US

Assignee:

Muratec Automation Co., Ltd. - Kyoto

International Classification:

B65G 49/06
B66B 17/04
H01L 21/677

US Classification:

1983463, 1983462, 41422207, 414281

Abstract:

A transport mechanism is configured to transport a work piece carrier within a buffer in fabrication facility, comprising: a transporter configured to travel on two rails, wherein the transporter comprises (i) a flat belt hoist mechanism configured to lift and to lower one or more work piece carriers, and (ii) a gripper mechanism configured to capture and to release the one or more work piece carriers.