John F Wolfe

Address:

1 Wolfe Run Rd, Charleston, WV 25304

Phone:

(304)9259034

VIN:

1GNFK130X8J203707

Make:

CHEVROLET

Model:

TAHOE

Year:

2008

US Patent:

6372391, Apr 16, 2002

Filed:

Sep 25, 2000

Appl. No.:

09/669288

Inventors:

John Charles Wolfe - Houston TX
Paul Ruchhoeft - The Woodlands TX

Assignee:

The University of Houston - Houston TX

International Classification:

G03F 900

US Classification:

430 5, 430296, 430396, 430942

Abstract:

For lithographic patterning a plurality of identical structures ( ) onto a target substrate ( ), a template mask ( ) is produced which bears a template structure pattern comprising a plurality of identical template structures each consisting of a set of at least one structure element (C) of circular shape. Starting from a primary mask ( ) bearing a primary structure pattern consisting of at least one structure element having a circular shape, the production of the template mask is done in at least one lithographic mask structuring step (b, c) wherein in each mask structuring step by means of a broad beam ( ) of energetic radiation the mask is illuminated and a structure pattern on the mask ( ) is imaged onto an intermediate substrate ( ); in these mask structuring steps the pattern image imaged from the structure pattern is moved over the intermediate substrate to a number of different locations. From the intermediate substrate ( ) thus patterned another mask ( ) having a structure pattern corresponding to the pattern image is produced, respectively. The mask produced from the last of said mask structuring steps is the template mask ( ).

US Patent:

6624429, Sep 23, 2003

Filed:

Sep 14, 2000

Appl. No.:

09/662182

Inventors:

John Charles Wolfe - Houston TX
Paul Ruchhoeft - The Woodlands TX

Assignee:

University of Houston - Houston TX

International Classification:

H01J 37302

US Classification:

25049222, 2524922, 252398

Abstract:

For producing an exposure pattern on a curved, in particular concave substrate field of a substrate which comprises a layer of resist material sensitive to exposure to an energetic radiation, in a pattern transfer system a wide, substantially parallel beam of said energetic radiation is produced, and by means of said beam a planar mask having a structure pattern, namely, a set of transparent windows to form a structured beam, is illuminated and the structure pattern is imaged onto the substrate by means of the structured beam, producing a pattern image, namely, a spatial distribution of irradiation over the substrate. The direction of incidence of said beam onto the mask is varied through a sequence of inclinations with respect to the normal axis to the mask, the sequence of inclinations being adapted to merge those exposure pattern components which result from neighboring windows of the structure pattern, the exposure with respect to the sequence of inclinations superposing into a spatial distribution of exposure dose on the substrate, said distribution exceeding the specific minimum exposure dose of said resist material within only one or more regions of the substrate field, said region(s) forming the exposure pattern. The center of curvature of the substrate field is positioned to align with the pattern center on the mask. The windows of the structure pattern are arranged in a manner that along each radius from the pattern center, the radial spacing of said windows decreases with increasing radius from the pattern center; preferably, the windows have uniform area.

US Patent:

7504619, Mar 17, 2009

Filed:

May 19, 2003

Appl. No.:

10/515041

Inventors:

John C. Wolfe - Houston TX, US
Paul Ruchhoeft - Houston TX, US

Assignee:

The University of Houston System - Houston TX

International Classification:

H01S 1/00

US Classification:

250251, 25049221

Abstract:

An energetic neutral particle lithographic apparatus is disclosed for replicating sub-micron and nanoscale patterns including a source producing a beam of energetic neutral particles, comprising atoms or molecules, by charge transfer scattering of energetic ions from the molecules of a gas, a mask member having open stencil windows in a supporting membrane, an energetic neutral particle protective layer on the membrane, and a reproduction member consisting of an energetic neutral particle-sensitive layer between a substrate and the mask for absorbing energetic neutral particles in a pattern created by the mask.

US Patent:

7883831, Feb 8, 2011

Filed:

Feb 5, 2008

Appl. No.:

12/026445

Inventors:

John C. Wolfe - Houston TX, US
Barry Craver - San Jose CA, US

Assignee:

University of Houston - Houston TX

International Classification:

G03C 5/00
H01J 37/30

US Classification:

430296, 430942, 2504923

Abstract:

The present inventors have developed an accurate method for forming a plurality of images on a substrate. The present method provides an improved pattern replication technique that provides submicron resolution, for example 20 nm or less, especially 10 nm or less. The method may involve moving a structured beam of energetic radiation across a target substrate. The motion of an image of the template mask on the substrate is achieved by tilting a mask and substrate assembly relative to the axis of the incident beam. The technique does not require high precision motion of the template mask relative to the target substrate. The energetic radiation may comprise energetic particles. The technique is insensitive to particle energy and can be applied to uncharged, neutral particles.

US Patent:

7960708, Jun 14, 2011

Filed:

Sep 17, 2007

Appl. No.:

11/856615

Inventors:

John C. Wolfe - Houston TX, US
Paul Ruchhoeft - Missouri City TX, US

Assignee:

University of Houston - Houston TX

International Classification:

G21K 5/02
G21K 5/08

US Classification:

2504921, 2504911, 2504923, 430 4, 430 5, 430269, 4302701, 216 56

Abstract:

Various embodiments disclose devices and methods for fabricating microporous particulate filters with regularly space pores wherein sheet membrane substrates are exposed to energetic particle radiation through a mask and the damaged regions removed in a suitable developer. The required depth of field is achieved by using energetic particles to minimize diffraction and an energetic particle source with suitably small diameter.

US Patent:

20070228008, Oct 4, 2007

Filed:

Dec 6, 2005

Appl. No.:

11/295273

Inventors:

John Wolfe - Houston TX, US
Aseem Srivastava - Andover MA, US
Ivan Berry - Ellicott MD, US

Assignee:

University of Houston - Houston TX

International Classification:

C23F 1/00

US Classification:

216067000, 216063000, 315111210

Abstract:

A system and method for removing photoresist or other organic compounds from semiconductor wafers is provided. Non-fluorinated reactant gases (O, H, HO, Netc.) are activated in a quartz tube by a medium pressure surface wave discharge. As the plasma jet impinges on a substrate, volatile reaction products (HO, CO, or low molecular weight hydrocarbons) selectively remove the photoresist from the surface. The medium pressure also enables high gas temperatures that provide an effective source of heat in the reactive zone on the wafer that enhances etch rates and provides a practical means of removing ion implanted photoresist.

US Patent:

20100147693, Jun 17, 2010

Filed:

Mar 13, 2008

Appl. No.:

12/530978

Inventors:

John C. Wolfe - Houston TX, US
Paul Ruchhoeft - Houston TX, US

Assignee:

The University of Houston - Houston TX

International Classification:

B01D 69/02
G03B 27/42
G03F 7/20

US Classification:

204627, 355 53, 430323

Abstract:

Various embodiments disclose devices and methods for fabricating microporous particulate filters with regularly spaced pores wherein sheet membrane substrates are exposed to energetic particle radiation through a mask and the damaged regions removed in a suitable developer. The required depth of field is achieved by using energetic particles to minimize diffraction and an energetic particle source with suitably small diameter.

US Patent:

20110208031, Aug 25, 2011

Filed:

Feb 22, 2011

Appl. No.:

13/032152

Inventors:

John C. Wolfe - Houston TX, US
Wei-Chuan Shih - Houston TX, US

Assignee:

University of Houston - Houston TX

International Classification:

A61B 5/0478
G03F 7/20

US Classification:

600378, 430320

Abstract:

A neural probe includes a probe, wherein a tip of the probe is tapered; an insulating layer covering the probe, and one or more metallic traces, wherein the metallic traces are provide along the length of the probe. The probe also includes one or more contacts provided on the tip of the probe, wherein each of the one or more metallic traces terminates at the one or more contacts, and the one or more contacts provide an array of nanosized metallic pillars. The neural probe may also incorporate a lightguide. The lightguide may include an insulating layer providing a first cladding layer on the probe, a core layer provided on top of the first cladding layer, wherein the metallic traces and contacts are provided in the core layer with a core material, and a second cladding layer provided on top of the core layer.