Ke Yang

US Patent:

20220197143, Jun 23, 2022

Filed:

Dec 18, 2020

Appl. No.:

17/127434

Inventors:

- Marlborough MA, US
Ke Yang - Westborough MA, US
Keren Zhang - Kirkland WA, US
Li Cui - Westborough MA, US
James F. Cameron - Brookline MA, US
Dan B. Millward - Ukiah CA, US
Shintaro Yamada - Shrewsbury MA, US

International Classification:

G03F 7/11
C09D 171/00
C08G 65/40

Abstract:

A photoresist underlayer composition comprising a poly(arylene ether); an additive of formula (14):a solvent, wherein, in formula (14), D is a substituted or unsubstituted Corganic group, optionally wherein D is an organic acid salt of the substituted or unsubstituted Corganic group; each Lis independently a single bond or a divalent linking group, when Lis a single bond, D may be a substituted or unsubstituted Ccycloalkyl or substituted or unsubstituted Cheterocycloalkyl that is optionally fused with Ar, each Ar is independently a monocyclic or polycyclic Caromatic group, each X is independently —OR, —SR, or —NRR, m is an integer of 1 to 6, each n is independently an integer of 0 to 5, provided that a sum of all n is 2 or greater, and Rto Rare as provided herein.

US Patent:

20230104679, Apr 6, 2023

Filed:

Sep 30, 2021

Appl. No.:

17/490974

Inventors:

- Marlborough MA, US
Joshua Kaitz - Shrewsbury MA, US
Ke Yang - Cupertino CA, US
Mingqi Li - Shrewsbury MA, US
Charlotte Cutler - Hopkinton MA, US

International Classification:

G03F 7/039
G03F 7/004
G03F 7/038
C08F 220/28
C08F 220/18

Abstract:

A photoresist composition, comprising: a polymer comprising: a first repeating unit derived from a first monomer comprising a substituted lactone, wherein the first repeating unit comprises a lactone ring derived from the substituted lactone, and wherein a carbon atom of the lactone ring forms a part of a backbone of the polymer, and a second repeating unit derived from a second monomer comprising an acetal group; a photoacid generator; and a solvent.

US Patent:

20200348592, Nov 5, 2020

Filed:

Aug 2, 2019

Appl. No.:

16/530273

Inventors:

- Marlborough MA, US
Ke Yang - Natick MA, US
Keren Zhang - Shrewsbury MA, US
James F. Cameron - Brookline MA, US
Li Cui - Westborough MA, US
Emad Aqad - Northborough MA, US
Shintaro Yamada - Shrewsbury MA, US
Paul J. LaBeaume - Auburn MA, US

International Classification:

G03F 7/075
G03F 7/09
C08L 25/18

Abstract:

A resist underlayer composition including a polyarylene ether, an additive polymer that is different from the polyarylene ether, and a solvent, wherein the additive polymer includes an aromatic or heteroaromatic group having at least one protected or free functional group selected from hydroxy, thiol, and amino.

US Patent:

20190204743, Jul 4, 2019

Filed:

Dec 31, 2018

Appl. No.:

16/236725

Inventors:

- Marlborough MA, US
Tomas Marangoni - Marlborough MA, US
Emad Aqad - Nothborough MA, US
Amy M. Kwok - Shrewsbury MA, US
Mingqi Li - Shrewsbury MA, US
Thomas Cardolaccia - Natick MA, US
Ke Yang - Natick MA, US
Cong Liu - Shrewsbury MA, US

International Classification:

G03F 7/11
G03F 7/004
G03F 7/038
G03F 7/039
C09D 133/16
G03F 7/16
G03F 7/20
G03F 7/38
G03F 7/32
C08F 220/28
C08F 220/24

Abstract:

New photoresist and topcoat compositions are provided that are useful in a variety of applications. In one aspect, new photoresist compositions are provided that comprise: (a) a first matrix polymer; (b) one or more acid generators; and (c) one or more additive compounds of Formulae (I) and/or (II).