Kenneth L Bell

Address:

682 Tantalus Ct, Las Vegas, NV 89183

Phone:

(702)7396312

VIN:

5NMSH13E47H123583

Make:

HYUNDAI

Model:

SANTA FE

Year:

2007

Address:

8210 Lk Isle Ct, Las Vegas, NV 89145

VIN:

1N4AL21E27N441052

Make:

NISSAN

Model:

ALTIMA

Year:

2007

US Patent:

50949349, Mar 10, 1992

Filed:

Aug 7, 1990

Appl. No.:

7/564665

Inventors:

Richard M. Lazarus - Mission Viejo CA
Kenneth L. Bell - Irvine CA
Carla M. Bauer - LaVerne CA

Assignee:

Morton International, Inc. - Chicago IL

International Classification:

G03C 524
G03C 534

US Classification:

430309

Abstract:

Compositions and methods for developing quinone diazide positive-working photoresists. The compositions consist essentially of an aqueous solution of a tetraalkylammonium hydroxide and an adjunct having a structure selected from: ##STR1## wherein n is 0 or 1; m is 1 or 2; and each R. sup. 1 and R. sup. 2 is independently selected from hydrogen, methyl, or ethyl, but in Structure I the two R. sup. 2 's are not both ethyl. The methods involve use of this composition to develop the indicated photoresists. The addition of an adjunct of the indicated type prevents the formation of irregular deposits on the edges of unexposed portions of the photoresist lines when the photoresist is developed. Selection of these adjuncts also increases the uniformity of line widths of photoresist lines developed according to the present invention, and increases the process latitude of the developer.

US Patent:

51262304, Jun 30, 1992

Filed:

Sep 21, 1990

Appl. No.:

7/587320

Inventors:

Richard M. Lazarus - Mission Viejo CA
Kenneth L. Bell - Irvine CA
Carla M. Bauer - LaVerne CA

Assignee:

Morton International, Inc. - Chicago IL

International Classification:

G03C 524
G03C 534

US Classification:

430309

Abstract:

Compositions and methods for developing quinone diazide positive-working photoresists. The compositions consist essentially of an aqueous solution of a tetraalkylammonium hydroxide and an adjunct having a structure selected from: ##STR1## wherein n is 0 or 1; m is 1 or 2; and each R. sup. 1 and R. sup. 2 is independently selected from hydrogen, methyl, or ethyl, but in Structure I the two R. sup. 2 's are not both ethyl. The methods involve use of this composition to develop the indicated photoresists. The addition of an adjunct of the indicated type prevents the formation of irregular deposits on the edges of unexposed portions of the photoresist lines when the photoresist is developed. Selection of these adjuncts also increases the uniformity of line widths of photoresist lines developed according to the present invention, and increases the process latitude of the developer.

US Patent:

48085138, Feb 28, 1989

Filed:

Apr 6, 1987

Appl. No.:

7/035413

Inventors:

Richard M. Lazarus - Mission Viejo CA
Kenneth L. Bell - Irvine CA
Carla M. Bauer - LaVerne CA

Assignee:

Morton Thiokol, Inc. - Chicago IL

International Classification:

G03C 518

US Classification:

430331

Abstract:

Compositions and methods for developing quinone diazide positive-working photoresists. The compositions consist essentially of an aqueous solution of a tetraalkylammonium hydroxide primary alkali and an alkanolamine having the following structure: ##STR1## wherein n is zero or 1, and each R is independently selected from hydrogen, methyl, or ethyl. The methods involve use of this composition to develop the indicated photoresists. The addition of an alkanolamine of the indicated type prevents the formation of irregular deposits on the edges of unexposed portions of the photoresist lines when the photoresist is developed. Selection of these alkanolamines also increases the uniformity of line widths of photoresist lines developed according to the present invention, and increases the process latitude of the developer.