Angus Kingon - Cary NC, US Gregory J. Dunn - Arlington Heights IL, US Stephen Streiffer - Oak Park IL, US Kevin Cheek - Raleigh NC, US Jon-Paul Maria - Raleigh NC, US Jovica Savic - Downers Grove IL, US
Assignee:
Motorola, Inc. - Schaumburg IL
International Classification:
H01G 1300 H01G 400 H01G 500 H01G 700 H01G 900
US Classification:
216 6, 29 2503
Abstract:
A dielectric film is formed on a free-standing conductive metal layer to form a multi-layer foil comprising a conductive metal layer, a barrier layer and a dielectric oxide layer. Such multi-layer foils are mechanically flexible, and useful for the manufacture of capacitors. Examples of barrier layers include Ni—P or Ni—Cr alloys. After a second layer of conductive metal is deposited on a dielectric oxide surface opposing the first conductive metal layer, the resulting capacitor foil is processed into a capacitor. The resulting capacitor is a surface mounted capacitor or is formed as a integrated or embedded capacitor within a circuit board.
Angus Kingon - Cary NC Gregory J. Dunn - Arlington Heights IL Stephen Streiffer - Oak Park IL Kevin Cheek - Raleigh NC Jon-Paul Maria - Raleigh NC Jovica Savic - Downers Grove IL
Assignee:
Motorola, Inc. - Schaumburg IL
International Classification:
B32B 900
US Classification:
428701, 428702, 428699, 338226
Abstract:
A dielectric film is formed on a free-standing conductive metal layer to form a multi-layer foil comprising a conductive metal layer, a barrier layer and a dielectric oxide layer. Such multi-layer foils are mechanically flexible, and useful for the manufacture of capacitors. Examples of barrier layers include NiâP or NiâCr alloys. After a second layer of conductive metal is deposited on a dielectric oxide surface opposing the first conductive metal layer, the resulting capacitor foil is processed into a capacitor. The resulting capacitor is a surface mounted capacitor or is formed as a integrated or embedded capacitor within a circuit board.
Product Development Director, Dell Networking Group at Dell
Location:
San Jose, California
Industry:
Telecommunications
Work:
Dell - 350 Holger Way, San Jose, California since Sep 2012
Product Development Director, Dell Networking Group
Ericsson - San Francisco Bay Area Jan 2011 - Sep 2012
Sr. Director Engineering
Ericsson Oct 2006 - Dec 2011
VP of Engineering
Reconnex 2004 - 2006
VP - Product Management
Redback Networks Sep 1999 - Jun 2004
VP - Engineering & Customer Support