Harold S. Crafts - Fort Collins CO Mark Q. Scaggs - Fort Collins CO
Assignee:
NCR Corporation - Dayton OH
International Classification:
H01I 506 H01L 2702
US Classification:
361311
Abstract:
A high frequency integrated circuit channel capacitor structure comprised of interdigitated field effect transistor gate electrodes and source/drain regions of minimum dimension and respective common connection. The multiplicity of parallel connected capacitive regions between the polysilicon gate electrode and a channel region in the substrate provide precisely controlled capacitors with exceptionally low resistance. Metallization contacts to the gate polysilicon and source/drain regions at each interleaved pattern, together with minimum channel length dimensions, minimizes the capacitive resistance. A CMOS configuration is also feasible.