Sasa C. Bajt - Livermore CA Mark A. Wall - Stockton CA
Assignee:
The Regents of the University of California - Oakland CA
International Classification:
B32B 1500
US Classification:
428635
Abstract:
High reflectance, low intrinsic roughness and low stress multilayer systems for extreme ultraviolet (EUV) lithography comprise amorphous layers MoRu and crystalline Be layers. Reflectance greater than 70% has been demonstrated for MoRu/Be multilayers with 50 bilayer pairs. Optical throughput of MoRu/Be multilayers can be 30-40% higher than that of Mo/Be multilayer coatings. The throughput can be improved using a diffusion barrier to make sharper interfaces. A capping layer on the top surface of the multilayer improves the long-term reflectance and EUV radiation stability of the multilayer by forming a very thin native oxide that is water resistant.
San Joaquin Delta College
Adjunct Assistant Professor
Lawrence Berkeley National Laboratory Aug 1981 - Aug 1983
Technologist
Lawrence Livermore National Laboratory Aug 1981 - Aug 1983
Staff Associate
Skills:
Materials Science Spectroscopy Science Characterization Research Data Analysis Nanomaterials R&D Nanotechnology Matlab Statistics Research and Development