Hui Zheng - Edison NJ Ping Jiang - Trenton NJ Su Qian - Sayreville NJ Leonardus H. T. Van Der Ploeg - Scotch Plains NJ Philip Chun-Ying Wong - Timonium MD Sangram S. Sisodia - Chicago IL
Assignee:
Merck Co., Inc. - Rahway NJ Johns Hopkins University - Baltimore NJ
International Classification:
A01K 6700
US Classification:
800 12, 3 18, 3 22, 3 25, 435 29, 435354
Abstract:
The present invention relates to a transgenic non-human animal embryo lacking native presenilin 1 and a transgenic non-human animal having only a non-native presenilin 1. The transgenic animals and cells derived therefrom can be used in the study of the expression pattern, activity and modulators of presenilin 1, in the study of the role of presenilin 1 in Alzheimers Disease and in the study of disorders of the central nervous system.
Composition And Method For Removing Ion-Implanted Photoresist
Renjie Zhou - Plainsboro NJ, US Emanuel Cooper - Scarsdale NY, US Michael B. Korzenski - Danbury CT, US Ping Jiang - Danbury CT, US
Assignee:
ADVANCED TECHNOLOGY MATERIALS, INC. - Danbury CT
International Classification:
G03F 7/42
US Classification:
510176
Abstract:
A method and mineral acid-containing compositions for removing bulk and/or hardened photoresist material from microelectronic devices have been developed. The mineral acid-containing composition includes at least one mineral acid, at least one sulfur-containing oxidizing agent, and optionally at least one metal ion-containing catalyst. The mineral acid-containing compositions effectively remove the hardened photoresist material while not damaging the underlying silicon-containing layer(s).