Ren Wei Yang

US Patent:

7421159, Sep 2, 2008

Filed:

Dec 8, 2006

Appl. No.:

11/635944

Inventors:

Ren Yang - Corona CA, US
Steven Soper - Baton Rouge LA, US
Wanjun Wang - Baton Rouge LA, US

Assignee:

Board of Supervisor of Louisiana State University and Agricultural and Mechanical College - Baton Rouge LA

International Classification:

G02B 6/34

US Classification:

385 33, 385137

Abstract:

An accurate and inexpensive integral micro-optical system for coupling and aligning optical fibers with other optical components, such as other optical fibers, diffusers, beam shapers, beam splitters, mirrors, or lenses is disclosed. The micro-optical coupler disclosed comprises one or more fiberport collimators and one or more microlens arrays, optically aligned during fabrication so that an optical fiber, or other source of light, was coupled to another optical fiber, or other light receiver, by simple inserting the optical source in one side of the micro-coupler and inserting the optical receiver in the other side of the micro-coupler. Often the fabrication process for this system can be done in a single lithography procedure. Since the optical axis of each component was aligned during the fabrication step, no subsequent alignment was required.

US Patent:

20090068596, Mar 12, 2009

Filed:

Aug 4, 2008

Appl. No.:

12/185455

Inventors:

Ren Yang - Corona CA, US
Steven A. Soper - Baton Rouge LA, US
Wanjun Wang - Baton Rouge LA, US

International Classification:

G03F 7/20
C08F 2/46
B32B 37/12

US Classification:

430296, 430325, 522 1, 1562755

Abstract:

UV photoresist materials are disclosed, based on EPON 154 or EPON 165. Preferred embodiments, based on a composite of EPON 154 and EPON 165, spread evenly into a flat, uniform layer, even without spin-coating. The preferred embodiments bond strongly to all substrates, and are resistant to cracking and debonding following exposure and development. The preferred embodiments have high UV transmittance, which promotes uniform photopolymerization throughout a thick layer. Structures may be produced by UV lithography that have a sidewall quality that has previously been attainable only by photolithography with a collimated x-ray source.