Robert Joseph Kane

US Patent:

20120231023, Sep 13, 2012

Filed:

Mar 8, 2012

Appl. No.:

13/415564

Inventors:

Gerard Zurawski - Midlothian TX, US
Jacques F. Banchereau - Montclair NJ, US
Anne-Laure Flamar - Dallas TX, US
Robert R. Kane - Waco TX, US

Assignee:

BAYLOR RESEARCH INSTITUTE - Dallas TX

International Classification:

A61K 39/44
A61K 35/12
A61P 31/12
C12N 5/0784
A61P 31/10
A61P 33/00
A61P 33/02
A61P 37/08
A61P 35/00
A61P 31/04

US Classification:

4241781, 424 937, 435375

Abstract:

The present invention includes compositions and methods for enhancing an immune response with an adjuvant composition comprising: an anti-dendritic cell (DC)-specific antibody or fragment thereof conjugated to at least a portion of Toll-Like Receptor (TLR) agonist, more specifically a TLR7 ligand (TLR7L), and a pharmaceutically acceptable carrier, wherein the conjugate and agonist are each comprised in an amount such that, in combination with the other, are effective to produce the immune response in a human or animal subject in need of immunostimulation.

US Patent:

20190284689, Sep 19, 2019

Filed:

Jun 3, 2019

Appl. No.:

16/429850

Inventors:

- San Jose CA, US
Robert Kane - Wakefield MA, US
Michael Sershen - Cambridge MA, US

International Classification:

C23C 16/44
C23C 16/52
C23C 16/50
C23C 16/455
H01J 37/32

Abstract:

An improved Plasma Enhanced Atomic Layer Deposition (PEALD) system and related operating methods are disclosed. A vacuum reaction chamber includes a vacuum system that separates a first outflow from the reaction chamber, comprising unreacted first precursor, from a second outflow from the reaction chamber, comprising second precursor and any reaction by products from the reaction of the second precursor with the coating surfaces. A trap, including trap material surfaces, is provided to remove first precursor from the first outflow when the first precursor reacts with the trap material surfaces. When the second precursor includes a plasma generated material, the second precursor is not passed through the trap. An alternate second precursor source injects a suitable second precursor into the trap to complete a material deposition layer onto the trap surfaces thereby preparing the trap material surfaces to react with the first precursor on the next material deposition cycle.

US Patent:

20160281223, Sep 29, 2016

Filed:

Nov 21, 2014

Appl. No.:

15/033071

Inventors:

- San Jose CA, US
Robert Kane - Wakefield MA, US
Michael Sershen - Cambridge MA, US

Assignee:

Ultratech, Inc. - San Jose CA

International Classification:

C23C 16/44
C23C 16/52
C23C 16/50
C23C 16/455

Abstract:

An improved Plasma Enhanced Atomic Layer Deposition (PEALD) system and related operating methods are disclosed. A vacuum reaction chamber includes a vacuum system that separates a first outflow from the reaction chamber, comprising unreacted first precursor, from a second outflow from the reaction chamber, comprising second precursor and any reaction by products from the reaction of the second precursor with the coating surfaces. A trap, including trap material surfaces, is provided to remove first precursor from the first outflow when the first precursor reacts with the trap material surfaces. When the second precursor includes a plasma generated material, the second precursor is not passed through the trap. An alternate second precursor source injects a suitable second precursor into the trap to complete a material deposition layer onto the trap surfaces thereby preparing the trap material surfaces to react with the first precursor on the next material deposition cycle.