Shahri Naghshineh

US Patent:

7923423, Apr 12, 2011

Filed:

Jan 27, 2005

Appl. No.:

11/046262

Inventors:

Elizabeth Walker - Nazareth PA, US
Shahri Naghshineh - Allentown PA, US
Jeff Barnes - Bath PA, US
Ewa Oldak - Bethlehem PA, US

Assignee:

Advanced Technology Materials, Inc. - Danbury CT

International Classification:

C11D 7/50

US Classification:

510175, 510176, 134 13

Abstract:

Compositions useful in semiconductor manufacturing for surface preparation and/or cleaning of wafer substrates such as semiconductor device precursor structures. The compositions can be employed for processing of wafers that have, or are intended to be further processed to include, copper metallization, e. g. , in operations such as surface preparation, pre-plating cleaning, post-etching cleaning, and post-chemical mechanical polishing cleaning of semiconductor wafers. The compositions contain (i) alkanolamine, (ii) quaternary ammonium hydroxide and (iii) a complexing agent, and are storage-stable, as well as non-darkening and degradation-resistant in exposure to oxygen.

US Patent:

20100056409, Mar 4, 2010

Filed:

Jan 26, 2006

Appl. No.:

11/814714

Inventors:

Elizabeth Walker - Stockertown PA, US
Shahri Naghshineh - Allentown PA, US
Jeffrey A. Barnes - Bath PA, US
Ewa Oldak - Bethlehem PA, US
Darryl W. Peters - Stewartsvill NJ, US
Kevin P. Yanders - Germansville PA, US

International Classification:

C11D 7/32

US Classification:

510175

Abstract:

Compositions useful in microelectronic device manufacturing for surface preparation and/or cleaning of wafer substrates such as microelectronic device precursor structures. The compositions can be employed for processing of wafers that have, or are intended to be further processed to include, copper metallization, e.g., in operations such as surface preparation, pre-plating cleaning, post-etching cleaning, and post-chemical mechanical polishing cleaning of microelectronic device wafers. The compositions contain (i) alkanolamine, (ii) quaternary ammonium hydroxide and (iii) a complexing agent, and are storage-stable, as well as non-darkening and degradation-resistant in exposure to oxygen.