Thomas M Newman

US Patent:

6830708, Dec 14, 2004

Filed:

Aug 2, 2001

Appl. No.:

09/921126

Inventors:

Marie Angelopoulos - Briarcliff Manor NY
Jeffrey Donald Gelorme - Plainville CT
Thomas Harold Newman - Mount Kisco NY
Niranjan Mohanlal Patel - Wappingers Falls NY
David Earle Seeger - Congers NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

H01B 112

US Classification:

252500

Abstract:

Disclosed is a novel composition of matter comprising a polyacid and a polymer containing repeating units which contain one or more basic atoms. The complex is water-soluble and electrically conductive. The complex is useful in providing organic discharge layers for use in electronic applications and fabrications.

US Patent:

7166241, Jan 23, 2007

Filed:

Jun 7, 1995

Appl. No.:

08/478469

Inventors:

Marie Angelopoulos - Briarcliff Manor NY, US
Jeffrey Donald Gelorme - Plainville CT, US
Thomas Harold Newman - Mount Kisco NY, US
Niranjan Mohanlal Patel - Wappingers Falls NY, US
David Earle Seeger - Congers NY, US

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

H01B 1/12

US Classification:

252500, 428922

Abstract:

Disclosed is a novel composition of matter comprising a polyacid and a polymer containing repeating units which contain one or more basic atoms. The complex is water-soluble and electrically conductive. The complex is useful in providing organic discharge layers for use in electronic applications and fabrications.

US Patent:

60646667, May 16, 2000

Filed:

Nov 15, 1996

Appl. No.:

8/751091

Inventors:

Barry E. Willner - Briarcliff Manor NY
Marc A. Block - Fairfield CT
Stephen Brady - White Plains NY
Davis Foulger - Wappingers Falls NY
Alan G. Ganek - Chappaqua NY
Colin G. Harrison - Brookfield CT
Barry Marks - Parsippany NJ
Thomas E. Newman - High Bridge NJ
Gopalaswamy Soora - Cary NC
Edith H. Stern - Boca Raton FL
Asser N. Tantawi - Somers NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

H04L 1266
H04L 1228
H04J 316
H04M 342

US Classification:

370352

Abstract:

An apparatus and means enabling a user to operate across multiple service domains using a single IDENTIFIER, ID. A Cross Service Association Domain mapping system is used to allow the desired IDENTIFIER and common user integration. A user is able to employ a single appropriate ID to access any of a plurality of services. The apparatus associates and relates all the IDENTIFIERs associated with each common user by maintaining an image of all the IDENTIFIERs for each user for all that user's applications which bridge the service and/or domain boundaries. Once a user is identified with any of the associated user IDENTIFIERs, the means allows the connection and/or routing to and from even otherwise disparate services. Included are a method, apparatus, and architecture which satisfies the above requirements while providing domain service interrelation and a common user image for the resulting interrelation. It provides for real time collaboration for cooperative, shared, and adaptive service network entities.

US Patent:

57596379, Jun 2, 1998

Filed:

Jun 7, 1995

Appl. No.:

8/478467

Inventors:

Marie Angelopoulos - Briarcliff NY
Jeffrey Donald Gelorme - Plainville CT
Thomas Harold Newman - Mount Kisco NY
Niranjan Mohanlal Patel - Wappingers Falls NY
David Earle Seeger - Congers NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

B05D 306

US Classification:

427504

Abstract:

Disclosed is a novel composition of matter comprising a polyacid and a polymer containing repeating units which contain one or more basic atoms. The complex is water-soluble and electrically conductive. The complex is useful in providing organic discharge layers for use in electronic applications and fabrications.

US Patent:

53708253, Dec 6, 1994

Filed:

Mar 3, 1993

Appl. No.:

8/025490

Inventors:

Marie Angelopoulos - Briarcliff Manor NY
Jeffrey D. Gelorme - Plainville CT
Thomas H. Newman - Mount Kisco NY
Niranjan M. Patel - Wappingers Falls NY
David E. Seeger - Congers NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

H01B 100

US Classification:

252500

Abstract:

Disclosed is a novel composition of matter comprising a polyacid and a polymer containing repeating units which contain one or more basic atoms. The complex is water-soluble and electrically conductive. The complex is useful in providing organic discharge layers for use in electronic applications and fabrications.

US Patent:

6010645, Jan 4, 2000

Filed:

Sep 15, 1994

Appl. No.:

8/306654

Inventors:

Marie Angelopoulos - Briarcliff Manor NY
Jeffrey Donald Gelorme - Plainville CT
Thomas Harold Newman - Mount Kisco NY
Niranjan Mohanlal Patel - Wappingers Falls NY
David Earle Seeger - Congers NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

H01B 112
H01B 120

US Classification:

252500

Abstract:

Disclosed is a novel composition of matter comprising a polyacid and a polymer containing repeating units which contain one or more basic atoms. The complex is water-soluble and electrically conductive. The complex is useful in providing organic discharge layers for use in electronic applications and fabrications.

US Patent:

61031453, Aug 15, 2000

Filed:

Jun 7, 1995

Appl. No.:

8/478468

Inventors:

Marie Angelopoulos - Briarcliff Manor NY
Jeffrey Donald Gelorme - Plainville CT
Thomas Harold Newman - Mount Kisco NY
Niranjan Mohanlal Patel - Wappingers Falls NY
David Earle Seeger - Congers NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

H01B 112

US Classification:

252500

Abstract:

Disclosed is a novel composition of matter comprising a polyacid and a polymer containing repeating units which contain one or more basic atoms. The complex is water-soluble and electrically conductive. The complex is useful in providing organic discharge layers for use in electronic applications and fabrications.