Tuan Hong Ngo

Address:

2643 Senter Rd STE B, San Jose, CA 95111

Phone:

(408)2277205

VIN:

5FNYF28537B033776

Make:

HONDA

Model:

PILOT

Year:

2007

US Patent:

6361645, Mar 26, 2002

Filed:

Oct 8, 1998

Appl. No.:

09/169017

Inventors:

Alan M. Schoepp - Ben Lomond CA
Robert E. Knop - Fremont CA
Christopher H. Olson - El Dorado CA
Michael S. Barnes - San Ramon CA
Tuan M. Ngo - Milpitas CA

Assignee:

Lam Research Corporation - Fremont CA

International Classification:

H02N 1300

US Classification:

156345, 118723 E, 118728, 118500, 20429803, 20429808, 20429832, 20429834, 361234, 323234, 323304, 323318, 324109

Abstract:

Disclosed is a method and device for compensating a bias voltage on a wafer disposed over an electrostatic chuck in a processing chamber of a plasma processing system. The plasma processing system includes an electrostatic and RF power supplies that are coupled to the electrostatic chuck. The bias compensation device includes a voltage converter, a storage unit, and a voltage adjusting circuitry. The voltage converter is coupled to the electrostatic chuck for detecting a voltage Vpp of the electrostatic chuck. The voltage converter converts the detected voltage to a lower voltage Vref. The storage unit stores a predetermined slope and a predetermined offset of a calibration curve, which is derived by fitting a plurality of wafer bias voltages as a function of electrostatic chuck voltages.

US Patent:

6526355, Feb 25, 2003

Filed:

Mar 30, 2000

Appl. No.:

09/539312

Inventors:

Tuqiang Ni - Fremont CA
Tuan Ngo - Milpitas CA
Chung-Ho Huang - Fremont CA
Andrew Lui - Fremont CA
Farro Kaveh - Palo Alto CA

Assignee:

Lam Research Corporation - Fremont CA

International Classification:

G06F 1900

US Classification:

702 32, 702 31, 31511121

Abstract:

A process chamber with a computer system that controls the process chamber is connected to one or more spectrometers. The spectrometers may be part of an interferometer or may be an optical emission spectrometer. The spectrometers may be CCD or photodiode arrays of 2,048 elements. An input board forms part of the computer system and is directly connected to the spectrometers. The input board provides data from the spectrometers to dual port memory, which is directly accessible to the CPU of the computer system. The use of a state machine and adder on the input board allows computation and placement of the data from the spectrometers on to the dual port memory, so that the CPU is not needed for such placement.

US Patent:

6622286, Sep 16, 2003

Filed:

Jun 30, 2000

Appl. No.:

09/608599

Inventors:

Tuan Ngo - Milpitas CA
Farro Kaveh - Palo Alto CA
Connie Lam - Los Altos CA
Chung-Ho Huang - Fremont CA
Tuqiang Ni - Fremont CA
Anthony T. Le - San Jose CA
Steven Salkow - Pleasanton CA

Assignee:

Lam Research Corporation - Fremont CA

International Classification:

G06F 1750

US Classification:

716 1, 716 19, 700121

Abstract:

A central controller for use in a semiconductor manufacturing equipment integrates a plurality of controllers with an open architecture allowing real-time communication between the various control loops. The central controller includes at least one central processing unit (CPU) executing high level input output (i/o) and control algorithms and at least one integrated i/o controller providing integrated interface to sensors and control hardware. The integrated i/o controller performs basic i/o and low level control functions and communicates with the CPU through a bus to perform or enable controls of various subsystems of the semiconductor manufacturing equipment.

US Patent:

45070784, Mar 26, 1985

Filed:

Mar 28, 1983

Appl. No.:

6/479197

Inventors:

Johann Tam - Saratoga CA
Jalal Ashjaee - Mountain View CA
Nobuo B. Kuwaki - San Jose CA
Tuan M. Ngo - Milpitas CA
Susan W. Kung - Oakland CA

Assignee:

Silicon Valley Group, Inc. - San Jose CA

International Classification:

F27D 300
F27B 914
B65G 4300
B65G 1500

US Classification:

432 11

Abstract:

A wafer handling method and apparatus insures proper centering of a wafer at a work station and controls the heat transferred to the wafer in a baking operation. The amount of heat transferred and the rate at which the heat is transferred to the wafer are regulated by controlling the distance between the wafer and a hot plate. The hot plate is maintained at a constant temperature higher than the bake out or equilibrium temperature to which the wafer is to be heated.