Woo Kyung Lee

US Patent:

20210208501, Jul 8, 2021

Filed:

Dec 8, 2020

Appl. No.:

17/115572

Inventors:

- Arlington VA, US
Woo K. Lee - Vienna VA, US

Assignee:

The Government of the United States of America, as represented by the Secretary of the Navy - Arlington VA

International Classification:

G03F 7/00
G03F 7/34
C08J 7/14
B29C 71/02
C01B 32/194

Abstract:

A method of graphene-enabled block copolymer lithography transfer to an arbitrary substrate comprising the steps of applying graphene on a surface, adding block copolymers to the graphene on the surface, phase-separating the block copolymers, forming nanopatterned phase separated block copolymers, delaminating the graphene, and transferring the graphene and nanopatterned phase separated block copolymers to a second surface. A layer of nanopatterned phase separated block copolymers on an arbitrary surface comprising a first arbitrary substrate absent of chemical preparation, a layer of graphene on the first arbitrary substrate, and a layer of phase-separated block copolymers on the layer of graphene, wherein the layer of phase-separated block copolymers on the layer of graphene was formed on a second substrate and delaminated via water liftoff and wherein the nanopatterned phase separated block copolymers are utilized as a shadow mask for lithography on the first arbitrary substrate.

US Patent:

20190271910, Sep 5, 2019

Filed:

May 22, 2019

Appl. No.:

16/419273

Inventors:

- Arlington VA, US
Woo K. Lee - Vienna VA, US
Paul E. Sheehan - Springfield VA, US
Adrian Podpirka - Philadelphia PA, US

International Classification:

G03F 7/00

Abstract:

The present invention provides a method for creating patterns, with features down to the nanometer scale, in phase change materials using a heated probe. The heated probe contacts the phase change material thereby inducing a local phase change, resulting in a dramatic contrast in property—including electrical resistance, optical reflectance, and volume—relative to the uncontacted regions of the phase change material. The phase change material can be converted back to its original phase (i.e. the patterns can be erased) by appropriate thermal cycling.

US Patent:

20170259554, Sep 14, 2017

Filed:

Feb 22, 2017

Appl. No.:

15/438957

Inventors:

- Arlington VA, US
Woo K. Lee - Washington DC, US
Jeremy T. Robinson - Washington DC, US
Nabil D. Bassim - Hamilton, CA
Rhonda Michele Stroud - Washington DC, US
Paul E. Sheehan - Springfield VA, US

Assignee:

The Government of the United States of America, as represented by the Secretary of the Navy - Arlington VA

International Classification:

B32B 43/00
B32B 37/06
B32B 38/10

Abstract:

A method of transferring functionalized graphene comprising the steps of providing graphene on a first substrate, functionalizing the graphene and forming functionalized graphene on the first substrate, delaminating the functionalized graphene from the first substrate, and applying the functionalized graphene to a second substrate.

US Patent:

20170242053, Aug 24, 2017

Filed:

Feb 13, 2017

Appl. No.:

15/430725

Inventors:

- Arlington VA, US
Woo K. Lee - Vienna VA, US
Paul E. Sheehan - Springfield VA, US
Adrian Podpirka - Philadelphia PA, US

International Classification:

G01Q 80/00
G03F 7/00

Abstract:

The present invention provides a method for creating patterns, with features down to the nanometer scale, in phase change materials using a heated probe. The heated probe contacts the phase change material thereby inducing a local phase change, resulting in a dramatic contrast in property—including electrical resistance, optical reflectance, and volume—relative to the uncontacted regions of the phase change material. The phase change material can be converted back to its original phase (i.e. the patterns can be erased) by appropriate thermal cycling.