Cheuk Ming Lee

US Patent:

20210149308, May 20, 2021

Filed:

Jan 25, 2021

Appl. No.:

17/157634

Inventors:

- Santa Clara CA, US
Preston FUNG - Daly City CA, US
Sean SCREWS - San Jose CA, US
Cheuk Ming LEE - Castro Valley CA, US
Jae Myung YOO - San Jose CA, US

International Classification:

G03F 7/20

Abstract:

The present disclosure generally relates to a method and apparatus for loading, processing, and unloading substrates. A processing system comprises a load/unload system coupled to a photolithography system. The load/unload system comprises a first set of tracks having a first height and a first width, and a second set of tracks having a second height and a second width different than the first height and first width. An unprocessed substrate is transferred from a lift pin loader to a chuck along the first set of tracks on a first tray while a processed substrate is transferred from the chuck to the lift pin loader along the second set of tracks on a second tray. While a first tray remains with a substrate on the chuck during processing, the load/unload system is configured to unload a processed substrate and load an unprocessed substrate on a second tray.

US Patent:

20200011652, Jan 9, 2020

Filed:

Jul 3, 2018

Appl. No.:

16/026982

Inventors:

- Santa Clara CA, US
Cheuk Ming LEE - Castro Valley CA, US
Jae Myung YOO - San Jose CA, US
Glen Alan GOMES - San Jose CA, US
David Michael CORRIVEAU - Sacramento CA, US
Thang Duc NGUYEN - Milpitas CA, US

International Classification:

G01B 9/02
G03F 7/20

Abstract:

Processing systems and methods used in the manufacturing of flat panel displays (FPDs) are provided herein. In one embodiment, a processing system features a motion stage movably disposed on a base surface, one or more X-position interferometers, and a plurality of Y-position interferometers. The X-position interferometers include an X-position mirror fixedly coupled to the motion stage and an X-axis stationary module fixedly coupled a non-moving surface of processing system. Each of the plurality of Y-position interferometers include one of a first or second Y-position mirror fixedly coupled to the motion stage in orthogonal relationship to the one or more X-position mirrors and one of a first or a second Y-axis stationary module fixedly coupled to a non-moving surface of the processing system. Here, each of the Y-axis stationary modules is positioned to direct coherent radiation towards a respective Y-position mirror when the Y-position interferometer thereof is in an active arrangement.