Alan J West

US Patent:

8496799, Jul 30, 2013

Filed:

Sep 10, 2008

Appl. No.:

12/208287

Inventors:

Robert J. Von Gutfeld - New York NY, US
Alan C. West - Tenafly NJ, US

Assignee:

The Trustees of Columbia University in the City of New York - New York NY

International Classification:

C25D 5/08
C23C 18/16
B05D 1/02

US Classification:

205 80, 4274211

Abstract:

Systems and methods for in-situ annealing of metal layers as they are being plated on a substrate by action of a chemical solution are provided. The in-situ annealing, in conjunction with controlled slow growth rates, allows control of the structure of the plated metal layers. The systems and methods are used for maskless plating of the substrates.

US Patent:

8529738, Sep 10, 2013

Filed:

Jun 22, 2007

Appl. No.:

11/767461

Inventors:

Robert J. Von Gutfeld - New York NY, US
Alan C. West - Tenafly NJ, US

Assignee:

The Trustees of Columbia University in the City of New York - New York NY

International Classification:

C25D 5/34

US Classification:

2042751, 204242, 205205, 205660

Abstract:

Systems and methods for plating and/or etching of hard-to-plate metals are provided. The systems and methods are designed to overcome the deleterious effect of superficial coating or oxide layers that interfere with the plating or etching of certain metal substrates. The systems and methods involve in situ removal of coating materials from the surfaces of the metal substrates while the substrates are either submerged in plating or etching solutions, or are positioned in a proximate enclosure just prior to submersion in the plating or etching solutions. Further, the substrates can be in contact with a suitable patterning mask to obtain patterned oxide-free regions for plating or etching. This in situ removal of coating layers may be achieved by pulse heating or photoablation of the substrate and the inhibiting coating layers. Electrical energy or laser light energy may be used for this purpose. Additionally or alternatively, the coating materials may be removed by mechanical means.

US Patent:

20080245674, Oct 9, 2008

Filed:

Feb 29, 2008

Appl. No.:

12/040378

Inventors:

Robert J. von Gutfeld - New York NY, US
Alan C. West - Tenafly NJ, US

International Classification:

B05D 5/04

US Classification:

205640

Abstract:

Systems and methods for etching topographic features in non-crystalline or metallic substrates are provided. A protective material is placed and patterned on a surface of the substrate to define exposed and protected regions of the substrate for etching in a liquid etchant having etching rates that are thermally activated. A nonuniform temperature profile is imposed on the substrate so that the temperatures and hence the etching rates at surfaces in the exposed regions are higher than those in the protected regions. Arrangements for imposing the nonuniform temperature profile include heating designated portions of the substrate with light radiation. Alternatively, the non-uniform temperature profile is developed as etching progresses by passing current pulses through the substrate in a manner that causes geometrically non-uniform heating of the substrate.

US Patent:

20110042201, Feb 24, 2011

Filed:

Oct 4, 2010

Appl. No.:

12/897379

Inventors:

Robert J. Von Gutfeld - New York NY, US
Alan C. West - Tenafly NJ, US

Assignee:

The Trustees Of Columbia University In The City Of New York - New York NY

International Classification:

C25D 17/00
C25D 5/00
C25F 7/00

US Classification:

204200, 204227, 204198, 204203

Abstract:

The disclosed subject matter provides systems and methods for etching and/or metal plating of substrate materials. An exemplary method in accordance with the disclosed subject matter for metal-plating or etching a substrate includes submerging portions of the substrate in a first bath of chemical solution, performing in-situ laser ablation of the substrate to achieve an immersion plated pattern with a first cation, plating-up the immersion plated pattern with the first cation in the first bath, and plating-up the immersion plated pattern with a second cation in a second bath. The same or another exemplary method can utilize a reel-to-reel system. The plating-up can begin after patterning by immersion plating is complete. Further, a single plating pattern can be used to define a pattern and the same bath can be used to plate the immersion pattern, thereby achieving a uniform thickness of the pattern.

US Patent:

20110104396, May 5, 2011

Filed:

Nov 5, 2010

Appl. No.:

12/940703

Inventors:

Robert J. Von Gutfeld - New York NY, US
Alan C. West - Tenafly NJ, US

Assignee:

THE TRUSTEES OF COLUMBIA UNIVERSITY IN THE CITY OF NEW YORK - New York NY

International Classification:

C25D 17/00
C25D 5/34
C25D 5/10
C25D 5/44
C25D 5/38
C25D 5/36
B05D 3/06
B05C 1/06
B23K 26/00

US Classification:

427554, 205205, 118620, 21912168, 21912169

Abstract:

Method of ablating the surface of a substrate including providing a dry substrate and an electrolyte source, ablating the surface of the dry substrate to at least partially remove a native oxide layer, and immersing the ablated dry substrate in the electrolyte source, in which the dry substrate is ablated prior to being introduced into the electrolyte source. Also provided is a method of ablating the surface of a substrate that includes providing a dry substrate and an electrolyte, depositing a portion of the electrolyte on the substrate at a thickness of less than 10 microns and ablating the surface of the substrate with the electrolyte applied thereon. System for use in the ablation of the surface of a substrate are also provided.

US Patent:

20130052689, Feb 28, 2013

Filed:

Oct 12, 2012

Appl. No.:

13/650824

Inventors:

Scott Banta - New York NY, US
Kartik Chandran - New York NY, US
Alan West - Tenafly NJ, US

International Classification:

C12P 7/16
C12P 19/00
C12P 13/04
C12P 7/04
C12M 1/42

US Classification:

435 72, 435157, 435160, 4352891, 435106

Abstract:

Methods and systems for producing a biofuel using genetically modified ammonia-oxidizing bacteria (AOB) are disclosed. In some embodiments, the methods include the following: providing an AOB that have been genetically modified to include a particular metabolic pathway to enable them to generate a particular biofuel or chemical; feeding a first source of ammonia to the AOB; feeding carbon dioxide to the AOB; and producing at least the biofuel or chemical, nitrite, and an AOB biomass. In some embodiments, the methods and systems include the following: a bioreactor including AOB that have been genetically modified to include a particular metabolic pathway to enable them to generate a particular biofuel; a first source of ammonia; a source of carbon dioxide; and a electrochemical reactor that is configured to electrochemically reduce nitrite produced in the bioreactor to a second source of ammonia.

US Patent:

20220176096, Jun 9, 2022

Filed:

Feb 18, 2022

Appl. No.:

17/675440

Inventors:

- NEW YORK NY, US
Anil K. LALWANI - New York NY, US
Jeffrey W. KYSAR - New York NY, US
Alan WEST - New York NY, US

International Classification:

A61M 37/00
C25D 1/02

Abstract:

The disclosed subject matter relates to a system and method for delivery of therapeutic agents across membranes such as to the inner ear. The system includes a plurality of microneedles that can be delivered to the round window membrane by a delivery device, e.g. catheter, and is capable of controlled penetration of the round window membrane to create temporary and self-closing perforations.