SALVATION ARMNY CORP New York, NY Sep 2010 to Sep 2012 Clothing SorterHPMSC RAMON VELEZ HEALTH CENTER Bronx, NY Feb 2010 to Sep 2010 ClericalSTARBUCKS CORP New York, NY Aug 2004 to Feb 2007 Shift ManagerHALE & HEARTY New York, NY Sep 2003 to Aug 2004 Cashier
Education:
ASA COLLEGE New York, NY Feb 2012 to Sep 2013 Associate's
Name / Title
Company / Classification
Phones & Addresses
Alice White President
New Jersey Nanotech Consortium Commercial Physical and Biological Research
Christopher Richard Doerr - Middletown NJ, US David S Levy - Freehold NJ, US Timothy O. Murphy - Fairport NJ, US Alice Elizabeth White - Summit NJ, US
Assignee:
Lucent Technologies Inc. - Murray Hill NJ
International Classification:
H04J 14/02
US Classification:
398 83, 398 45, 398 82
Abstract:
An integrated reconfigurable planar lightwave add-drop (RPLAD) multiplexer for use in a WDM optical communication system is arranged such that each drop port can receive any wavelength channel and each add port can transmit on any wavelength channel. Drop port reconfigurability is achieved by integrating a cross-connect functionality into the RPLAD, illustratively using optical 1×2 switches to perform “space” switching. The switches are controlled from a remotely located node controller. Add port reconfigurability is achieved by having tunable lasers and a wavelength independent optical power combiner, which may be a star coupler that is integrated with the other above-mentioned elements. The RPLAD has a modular architecture, so that when RPLAD's are connected by dual unidirectional transmission rings for the purpose of redundancy and failure protection, an RPLAD that fails can be removed and the remaining module can be reconfigured so as to re-route incoming traffic backwards around the still operating optical communication ring.
The present invention comprises an athletic undergarment having trunk and leg portions woven from a sheer, resiliently elastic material and foot portions knit from heavy compressible yarn. The leg portions are permanently secured to the interior of the foot portions in a manner which both maximizes the area of contact between the yarn and the wearer's feet and reduces the tendency of the foot portions to unravel following periods of prolonged usage. The resilient elasticity of the sheer trunk and leg portions furnish muscle support and circulatory stimulation for the wearer's legs, while the knit foot portions prevent relative slippage and excessive perspiration build-up between the foot portions, leg portions and the wearer's shoes.
Method Of Reducing Critical Current Density Of Oxide Superconductors By Radiation Damage
Kenneth T. Short - New Providence NJ Alice E. White - New Providence NJ
Assignee:
AT&T Bell Laboratories - Murray Hill NJ
International Classification:
B05D 512 B05D 306
US Classification:
505 1
Abstract:
The critical current density J. sub. c of a superconductive oxide film can be tailored, without substantial change in the critical temperature T. sub. c (R. dbd. 0), by introduction of radiation damage into the superconductor. Exemplarily, this is done by exposure to energetic (e. g. , 1 MeV) ions. The ability to tailor J. sub. c permits optimization of SQUIDS and other thin film devices, and makes it possible to produce superconductive interconnects that comprise "fuses" or current limiters.
Method Of Making An Article Comprising A Buried Sio.sub.2 Layer
Kenneth T. Short - New Providence NJ Alice E. White - New Providence NJ
Assignee:
American Telephone and Telegraph Company, AT&T Bell Laboratories - Murray Hill NJ
International Classification:
H01L 21265 H01L 2120
US Classification:
437 24
Abstract:
We have discovered that high quality subcritical SIMOX silicon-on-insulator wafers can be produced by a method that comprises a randomizing implant followed by an appropriate heat treatment. In a preferred embodiment, the inventive method comprises, in succession, a subcritical oxygen implant (nominal wafer temperature 1200. degree. C. ) anneal, a randomizing implant (. about. 5. times. 10. sup. 14 Si/cm. sup. 2, nominal wafer temperature
Semiconductor Device Comprising A Silicide Layer, And Method Of Making The Device
Sarah A. Audet - Bridgewater NJ Conor S. Rafferty - Basking Ridge NJ Kenneth T. Short - New Providence NJ Alice E. White - New Providence NJ
Assignee:
AT&T Bell Laboratories - Murray Hill NJ
International Classification:
H01L 2144
US Classification:
437200
Abstract:
Disclosed is a method of making a Si-based semiconductor device comprising a contact region that comprises a thin (exemplarily less than 50 nm), substantially uniform silicide layer. The silicide preferably is CoSi. sub. 2 or TiSi. sub. 2. The method comprises implantation of the appropriate metal ions into a Si body, the dose and the body temperature selected such that substantially complete amorphization of the implant volume results. Subsequently, the Si body is subjected to an annealing treatment that results in recrystallization of the implant volume and formation of the silicide layer. The layer extends to the surface of the body and contains essentially all of the implanted metal ions. The invention can advantageously be used in conjunction with extremely shallow junctions, such as will be of interest in short (e. g. ,
Method Of Making A Heteroepitaxial Structure By Mesotaxy Induced By Buried Implantation
Robert C. Dynes - Summit NJ Kenneth T. Short - New Providence NJ Alice E. White - New Providence NJ
Assignee:
American Telephone and Telegraph Company, AT&T Bell Laboratories - Murray Hill NJ
International Classification:
H01L 21265 H01L 2128
US Classification:
437 26
Abstract:
Disclosed is a technique, termed "mesotaxy", for producing a heteroepitaxial structure comprising a layer of single crystal second material embedded in, and epitaxial with, a single crystal first material matrix. Mesotaxy comprises implantation of at least one chemical species (e. g. , Co, Ni, Cr, Y or Mg) into a single crystal body (typically a semiconductor, e. g. , Si or Ge) such that a buried layer rich in the implanted species is formed, and heat treating the implanted body such that a buried stoichiometric compound layer (e. g. , CoSi. sub. 2) is formed. Exemplarily, 3. multidot. 10. sup. 17 /cm. sup. 2 200 keV Co ions are implanted into (100) Si nominally at 350. degree. C. , followed by a heat treatment that consists of 1 hour at 600. degree. C. and 30 minutes at 1000. degree. C. The resulting buried CoSi. sub.
The present invention comprises an athletic undergarment having trunk and leg portions woven from a sheer, resiliently elastic material and foot portions knit from heavy compressible yarn. The leg portions are permanently secured to the interior of the foot portions by stitching in a manner which maximizes the area of contact between the yarn and the wearer's feet. The resilient elasticity of the sheer trunk and leg portions furnish muscle support and circulatory stimulation for the wearer's legs, while the knit foot portions prevent relative slippage and excessive perspiration build-up between the foot portions and the wearer's shoes.
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