Andrew Jacob Krebs

US Patent:

20060210917, Sep 21, 2006

Filed:

Mar 18, 2005

Appl. No.:

11/084445

Inventors:

Kevin Ray - Fort Collins CO, US
Eugene Sheriff - Carr CO, US
Joanne Ray - Fort Collins CO, US
James Mulligan - Fort Collins CO, US
Eric Clark - Loveland CO, US
Andrew Krebs - Greeley CO, US

International Classification:

G03C 1/76

US Classification:

430270100

Abstract:

Imageable elements that contain copolymers soluble in alkaline solutions are disclosed and methods for forming imaging using the imageable elements are disclosed. The alkali soluble copolymers comprise about 3 to about 50 mol % of one or more of the monomers of the formula: CH═CH(R)—C(O)—X—Y—R; in which: Ris H or CH; Ris succinimide or phthalimide; X is O or NH; and Y is —(CH)—, in which n is an integer from 2 to 12. The imageable elements are useful as lithographic printing plate precursors.

US Patent:

7144661, Dec 5, 2006

Filed:

Nov 1, 2005

Appl. No.:

11/263879

Inventors:

Kevin B. Ray - Fort Collins CO, US
Eugene L. Sheriff - Carr CO, US
Joanne Ray - Fort Collins CO, US
Andrew Krebs - Greeley CO, US

Assignee:

Eastman Kodak Company - Rochester NY

International Classification:

G03F 7/038
G03F 7/11
G03F 7/14

US Classification:

430 15, 4302711, 430302, 430964

Abstract:

Positive-working imageable elements comprise a radiation absorbing compound and inner and outer layers on a substrate having a hydrophilic surface. The inner layer comprises a polymer that is removable using an alkaline developer and in which from about 1 to about 50 mol % of its recurring units are derived from one or more of the ethylenically unsaturated polymerizable monomers represented by the following Structure (I):CH═C(R)C(═O)NR(CRR)OH   (I)wherein R, R, R, and Rare independently hydrogen, lower alkyl, or phenyl, and n is 1 to 20. The imageable elements having improved resistance to development and printing chemicals and solvents.