Anthony D Vaughan

US Patent:

20220319887, Oct 6, 2022

Filed:

Jun 21, 2022

Appl. No.:

17/845816

Inventors:

- Santa Clara CA, US
Anthony D. Vaughan - Ben Lomond CA, US

International Classification:

H01L 21/67
G01D 5/24
H01L 21/687
B25J 13/08
B25J 9/16

Abstract:

Embodiments disclosed herein include a method of determining the position of a sensor wafer relative to a pedestal. In an embodiment, the method comprises placing a sensor wafer onto the pedestal, wherein the sensor wafer comprises a first surface that is supported by the pedestal, a second surface opposite the first surface, and an edge surface connecting the first surface to the second surface, wherein a plurality of sensor regions are formed on the edge surface, and wherein the pedestal comprises a major surface and an annular wall surrounding the sensor wafer. In an embodiment, the method further comprises determining a gap distance between each of the plurality of sensor regions and the annular wall. In an embodiment, the method may further comprise determining a center-point offset of a center-point of the sensor wafer relative to a center point of the annular wall from the gap distances.

US Patent:

20200075370, Mar 5, 2020

Filed:

Aug 20, 2019

Appl. No.:

16/545824

Inventors:

- Santa Clara CA, US
Anthony D. Vaughan - Ben Lomond CA, US

International Classification:

H01L 21/67
G01D 5/24
B25J 9/16
B25J 13/08
H01L 21/687

Abstract:

Embodiments disclosed herein include a method of determining the position of a sensor wafer relative to a pedestal. In an embodiment, the method comprises placing a sensor wafer onto the pedestal, wherein the sensor wafer comprises a first surface that is supported by the pedestal, a second surface opposite the first surface, and an edge surface connecting the first surface to the second surface, wherein a plurality of sensor regions are formed on the edge surface, and wherein the pedestal comprises a major surface and an annular wall surrounding the sensor wafer. In an embodiment, the method further comprises determining a gap distance between each of the plurality of sensor regions and the annular wall. In an embodiment, the method may further comprise determining a center-point offset of a center-point of the sensor wafer relative to a center point of the annular wall from the gap distances.