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Avraham Tr Amith

age ~95

from Baltimore, MD

Also known as:
  • Avraham By Amith
  • Auraham Amith
  • Aurana Amith
  • M Amith
Phone and address:
5602 Enderly Rd, Baltimore, MD 21212
(410)4335582

Avraham Amith Phones & Addresses

  • 5602 Enderly Rd, Baltimore, MD 21212 • (410)4335582
  • Roanoke, VA
  • Arlington, VA
  • 5602 Enderly Rd, Baltimore, MD 21212 • (410)3407603

Work

  • Position:
    Retired

Education

  • Degree:
    Associate degree or higher

Emails

Us Patents

  • Transmission Method To Determine And Control The Temperature Of Wafers Or Thin Layers With Special Application To Semiconductors

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  • US Patent:
    51700417, Dec 8, 1992
  • Filed:
    Sep 20, 1990
  • Appl. No.:
    7/585655
  • Inventors:
    Avraham Amith - Roanoke VA
    Charles Naselli - Roanoke VA
    C. Scott Nevin - Albion IN
  • Assignee:
    ITT Corporation - New York NY
  • International Classification:
    H05B 102
  • US Classification:
    219497
  • Abstract:
    A method of accurately determining the temperature of a thin layer of bandgap material without requiring contact to the layer involves the use of optical radiation through the layer and the detection of optical absorption by the layer. The relationship between the temperature varying bandgap energy and the resulting optical absorption characteristics provides an indication of temperature independent of ambient temperature. Apparatus for performing high quality temperature detection and control is also provided.
  • Transmission Method To Determine And Control The Temperature Of Wafers Or Thin Layers With Special Application To Semiconductors

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  • US Patent:
    48909335, Jan 2, 1990
  • Filed:
    Feb 17, 1988
  • Appl. No.:
    7/157196
  • Inventors:
    Avraham Amith - Roanoke VA
    Charles Naselli - Roanoke VA
    C. Scott Nevin - Albion IN
  • Assignee:
    ITT Corporation - New York NY
  • International Classification:
    G01J 500
    G01K 1100
  • US Classification:
    374121
  • Abstract:
    A method of accurately determining the temperature of a thin layer of bandgap material without requiring contact to the layer involves the use of optical radiation through the layer and the detection of optical absorption by the layer. The relationship between the temperature varying bandgap energy and the resulting optical absorption characteristics provides an indication of temperature independent of ambient temperature. Apparatus for performing high quality temperature detection and control is also provided.
  • Reflectance Method To Determine And Control The Temperature Of Thin Layers Or Wafers And Their Surfaces With Special Application To Semiconductors

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  • US Patent:
    50981994, Mar 24, 1992
  • Filed:
    Aug 6, 1990
  • Appl. No.:
    7/563812
  • Inventors:
    Avraham Amith - Roanoke VA
  • Assignee:
    ITT Corporation - New York NY
  • International Classification:
    G01K 1100
    G01J 500
  • US Classification:
    374121
  • Abstract:
    A method of accurately determining the temperature of a thin layer of bandgap material without requiring contact to the layer involves the use of optical radiation reflected off the bandgap material and the detection of the reflected energy. The relationship between the temperature varying bandgap energy and the resulting reflection characteristics provides an indication of temperature, independent of ambient temperature.
  • Method Of Measuring The Temperature Of A Photocathode

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  • US Patent:
    47086777, Nov 24, 1987
  • Filed:
    Dec 27, 1985
  • Appl. No.:
    6/814148
  • Inventors:
    Richard E. Blank - Roanoke VA
    Albert F. Tien - Salem VA
    Avraham Amith - Roanoke VA
  • Assignee:
    ITT Electro Optical Products, a division of ITT Corporation - Roanoke VA
  • International Classification:
    H01J 9233
  • US Classification:
    445 3
  • Abstract:
    A method of determing the actual temperature of a layer of an infrared material, especially during heat cleaning, which includes measuring the thickness of the layer and the amount of radiation being emitted from it. An apparent temperature corresponding to a desired actual temperature is found from a curve of apparent temperature, which are derived from the radiation amount, versus thickness. The apparent temperature which corresponds to the desired actual temperature compensates for interference effects on the radiation measurement. A computer may be utilized to calculated the apparent temperature which corresponds to the desired actual temperature and to regulate and maintain the infrared material at the apparent temperature.
  • Method Of Making Photocathodes For Image Intensifier Tubes

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  • US Patent:
    52988317, Mar 29, 1994
  • Filed:
    Dec 31, 1985
  • Appl. No.:
    6/825115
  • Inventors:
    Avraham Amith - Roanoke VA
  • Assignee:
    ITT Corporation - New York NY
  • International Classification:
    H01J 3100
    H01J 3126
  • US Classification:
    313373
  • Abstract:
    A method is provided of making a photoemissive cathode including bonding an electron emissive layer to a glass faceplate at an elevated temperature and pressure to form a cathode structure and cooling the cathode structure at a rate which will maintain stress between the electron emissive layer and the faceplate at or below a predetermined level in order to avoid brush marks and crosshatchings during subsequent processing steps. The cathode is cooled from a bonding temperature to room temperature in approximately twenty minutes or less.
  • Technique For Precision Temperature Measurements Of A Semiconductor Layer Or Wafer, Based On Its Optical Properties At Selected Wavelengths

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  • US Patent:
    52586022, Nov 2, 1993
  • Filed:
    Mar 19, 1991
  • Appl. No.:
    7/671343
  • Inventors:
    Charles Naselli - Roanoke VA
    Larry E. Reed - Roanoke VA
    Avraham Amith - Roanoke VA
  • Assignee:
    ITT Corporation - New York NY
  • International Classification:
    H05B 102
  • US Classification:
    219497
  • Abstract:
    A method for sensitive and precise determination of the temperature of a thin layer or wafer of bandgap material, without requiring contact to the layer or to the wafer, is based on selection of optical wavelength or wavelengths and the measurements of transmittance through the sample at such wavelength(s). The relationship between the temperature variations of the absorption coefficient, whether determined by band-to-band absorption or a totally different mechanism, and the measured transmittance, provide an indication of the sample temperature, without regard to the ambient temperature. The method prescribes how to select the wavelength(s) based both on the intrinsic properties of the material and on the practical considerations of the measurement situation.
  • Apparatus And Method For Heat Cleaning Semiconductor Material

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  • US Patent:
    49489372, Aug 14, 1990
  • Filed:
    Dec 23, 1988
  • Appl. No.:
    7/289353
  • Inventors:
    Richard E. Blank - Roanoke VA
    James W. Harris - Roanoke VA
    Avraham Amith - Roanoke VA
  • Assignee:
    ITT Corporation - New York NY
  • International Classification:
    B23K 2600
  • US Classification:
    2191216
  • Abstract:
    An apparatus for heat cleaning a semiconductor material by producing a uniform thermal distribution in the area of the material being cleaned. In one arrangement a heater block is positioned between a lamp nad a photocathode. The semiconductor material layer of the photocathode is directed away from the lamp. The heater block absorbs the entire range of wavelengths radiated by the lamp but reradiates only long wavelengths to the photocathode. In another arrangement, a laser has its beam directed to a focusing and scanning system. The resultant beam is directed to a photocathode which is positioned with its semiconductive layer directed toward the beam.
  • Transmission Method To Determine And Control The Temperature Of Wafers Or Thin Layers With Special Application To Semiconductors

    view source
  • US Patent:
    51674521, Dec 1, 1992
  • Filed:
    Aug 28, 1989
  • Appl. No.:
    7/399729
  • Inventors:
    Avraham Amith - Roanoke VA
    Charles Naselli - Roanoke VA
    C. Scott Nevin - Albion IN
  • Assignee:
    ITT Corporation - New York NY
  • International Classification:
    G01J 500
    G01K 1100
  • US Classification:
    374121
  • Abstract:
    A method of accurately determining the temperature of a thin layer of bandgap material without requiring contact to the layer involves the use of optical radiation through the layer and the detection of optical absorption by the layer. The relationship between the temperature varying bandgap energy and the resulting optical absorption characteristics provides an indication of temperature independent of ambient temperature. Apparatus for performing high quality temperature detection and control is also provided.

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  • Category:
    People & Blogs
  • Uploaded:
    30 Nov, 2009
  • Duration:
    3m 42s

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