Benjamin Walker Murray

US Patent:

20180130199, May 10, 2018

Filed:

Nov 6, 2017

Appl. No.:

15/804980

Inventors:

- Milpitas CA, US
Eugene Shifrin - Sunnyvale CA, US
Ashok Mathew - Fremont CA, US
Chetana Bhaskar - San Jose CA, US
Lisheng Gao - Saratoga CA, US
Santosh Bhattacharyya - San Jose CA, US
Hucheng Lee - Cupertino CA, US
Benjamin Murray - Portland OR, US

International Classification:

G06T 7/00
G01N 21/95

Abstract:

Systems and methods for detecting defects on a reticle are provided. One system includes computer subsystem(s) that include one or more image processing components that acquire images generated by an inspection subsystem for a wafer, a main user interface component that provides information generated for the wafer and the reticle to a user and receives instructions from the user, and an interface component that provides an interface between the one or more image processing components and the main user interface. Unlike currently used systems, the one or more image processing components are configured for performing repeater defect detection by applying a repeater defect detection algorithm to the images acquired by the one or more image processing components, and the repeater defect detection algorithm is configured to detect defects on the wafer using a hot threshold and to identify the defects that are repeater defects.