Bernard A Lautee

US Patent:

7190441, Mar 13, 2007

Filed:

Dec 22, 2004

Appl. No.:

11/021555

Inventors:

James T. McWhirter - San Jose CA, US
Hidong Kwak - San Jose CA, US
Haixing Zou - Sunnyvale CA, US
Dan Georgesco - San Jose CA, US
Bernard Lautee - San Jose CA, US
Jennming James Chen - Campbell CA, US
Gary R. Janik - Palo Alto CA, US
Patrick M. Maxton - San Jose CA, US

Assignee:

KLA-Tencor Technologies Corp. - Milpitas CA

International Classification:

G01N 1/00

US Classification:

356 36

Abstract:

Methods and systems for preparing a sample for thin film analysis are provided. One system includes an energy beam source configured to generate an energy beam. The system also includes an energy beam delivery subsystem configured to direct the energy beam to a sample and to modify the energy beam such that the energy beam has a substantially flat-top profile on the sample. The energy beam removes a portion of a contaminant layer on the sample to expose an analysis area of a thin film on the sample. One method includes generating an energy beam and modifying the energy beam such that the energy beam has a substantially flat-top profile. The method also includes directing the energy beam to a sample. The energy beam removes a portion of a contaminant layer on the sample to expose an analysis area of a thin film on the sample.