Brian E Mack

US Patent:

6496648, Dec 17, 2002

Filed:

Aug 19, 1999

Appl. No.:

09/378200

Inventors:

Brian J. Mack - Phoenix AZ
John K. Shriver - Gilbert AZ
Charles L. Vaughan - Tempe AZ

Assignee:

Prodeo Technologies, Inc. - Tempe AZ

International Classification:

A21B 200

US Classification:

392416, 392418, 219390, 219405, 219411, 2504922, 118724, 118 501

Abstract:

An apparatus for rapid thermal processing is described and includes a cylindrical lamp array structure ( ) surrounding a cylindrical process tube ( ). The cylindrical process tube ( ) has a lengthwise central axis ( ). The cylindrical lamp array structure ( ) includes heat sources or lamps ( ). The lamps ( ) are positioned with respect to the cylindrical process tube ( ) so that the sides of the lamps ( ) focus light energy in the direction of the lengthwise central axis ( ). Substrates ( ) are oriented within the cylindrical process tube ( ) so that the major surfaces ( ) of the substrates ( ) are substantially normal to the lengthwise central axis ( ). In an alternative embodiment, a magnetic field source ( ) is included for processing storage devices such as non-volatile memory devices.

US Patent:

6741804, May 25, 2004

Filed:

Nov 8, 2002

Appl. No.:

10/289469

Inventors:

Brian J. Mack - Phoenix AZ
John K. Shriver - Gilbert AZ
Charles L. Vaughan - Tempe AZ

Assignee:

Innovent Systems, Inc. - Phoenix AZ

International Classification:

F26B 1900

US Classification:

392416, 392418, 219390, 219405, 219411, 438795, 438797, 118724, 118725, 118 501

Abstract:

An apparatus for rapid thermal processing is described and includes a cylindrical lamp array structure ( ) surrounding a cylindrical process tube ( ). The cylindrical process tube ( ) has a lengthwise central axis ( ). The cylindrical lamp array structure ( ) includes heat sources or lamps ( ). The lamps ( ) are positioned with respect to the cylindrical process tube ( ) so that the sides of the lamps ( ) focus light energy in the direction of the lengthwise central axis ( ). Substrates ( ) are oriented within the cylindrical process tube ( ) so that the major surfaces ( ) of the substrates ( ) are substantially normal to the lengthwise central axis ( ). In an alternative embodiment, a magnetic field source ( ) is included for processing storage devices such as non-volatile memory devices.