Brian Andrew Mack

US Patent:

59068612, May 25, 1999

Filed:

Jul 20, 1993

Appl. No.:

8/094794

Inventors:

Brian Mack - Poway CA
Warren Mc Arthur - Solana Beach CA

Assignee:

Raytheon Company - Lexington MA

International Classification:

C23C 1600

US Classification:

4272553

Abstract:

A borophosphosilicate glass is deposited on a substrate (50) by heating the substrate (50), and contacting the substrate with a mixture of the gases tetramethylcyclotetrasiloxane, trimethylborate, trimethylphosphite, and oxygen, without the presence of a carrier gas. The first three of the gases are produced from liquid sources by controlled vaporization and flow. The gases react at the heated substrate (50) to deposit the glass upon the substrate. In a reactor (52) for depositing the glass, the tetramethylcyclotetrasiloxane and trimethylborate are introduced at a gas inlet location (79), and the trimethylphosphite and oxygen are heated and introduced at another gas inlet location (90). The tetramethylcyclotetrasiloxane and trimethylborate mixture flows toward the location where the trimethylphosphite and oxygen are introduced, and whereat the gases are mixed. This gaseous mixture flows past the heated substrate (50) to deposit the glass thereon.