- Wilmington MA, US Nathan Stoddard - Chalfont PA, US Jesse S. Appel - South Hamilton MA, US Peter Kellerman - Essex MA, US Parthiv Daggolu - Danvers MA, US Alexander Martinez - Woburn MA, US Saeed Pirooz - Lexington MA, US Brandon Williard - Essex MA, US Charles Bowen - Hampton NH, US Brian McMullen - Taunton MA, US David Morrell - Wakefield MA, US Dawei SUN - Lynnfield MA, US
International Classification:
C30B 15/06 C30B 29/06 C30B 29/64
Abstract:
A ribbon is formed such that the ribbon floats on a melt using a cold initializer facing an exposed surface of the melt. The ribbon is single crystal silicon. The ribbon is pulled from the silicon melt at a low angle off the melt surface. The ribbon is formed at a same rate as the pulling. The ribbon is separated from the melt at a wall of the crucible where a stable meniscus forms. The ribbon has a thickness between a first surface and an opposite second surface from 50 μm to 5 mm. The ribbon includes a first region extending a first depth from the first surface. The first region has a reduced oxygen concentration relative to a bulk of the ribbon.
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