A process for reclaiming ammonia from waste streams comprises reacting at least one waste stream with an excess of hydroxide to produce ammonia and water. The ammonia is removed from the reaction vessel and purified.
Justin R. Lydon - Battle Ground WA Brian L. Tansy - Vancouver WA
Assignee:
SEH America, Inc. - Vancouver WA
International Classification:
G01N 23223 G01N 2164 H01L 2166
US Classification:
438 14
Abstract:
A method of controllably adding at least one contaminant to a surface of a silicon wafer. The method includes providing a solution containing a known concentration of one or more contaminants and having a known pH. The solution is applied to a surface of a silicon wafer and allowed to remain there for a predetermined period of time so that the one or more contaminants adsorb to the wafer surface. The solution is then removed while leaving the adsorbed one or more contaminants on the surface.
24218 northeast 142Nd Ave, Battle Ground, WA 98604
Industry:
Semiconductors
Work:
Seh America
Chemist
Education:
University of California, Berkeley 1985 - 1987
Master of Science, Masters, Chemistry
University of Portland 1981 - 1985
Bachelors, Bachelor of Science, Chemistry