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Christopher T Knapp

age ~37

from Denver, CO

Also known as:
  • Christophe Knapp

Christopher Knapp Phones & Addresses

  • Denver, CO
  • 7496 Modock Rd, Victor, NY 14564 • (585)9240648
  • Rochester, NY
  • Geneseo, NY

Us Patents

  • Developer Compositions And Processes

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  • US Patent:
    6335136, Jan 1, 2002
  • Filed:
    Feb 6, 2001
  • Appl. No.:
    09/777967
  • Inventors:
    David H. Pan - Rochester NY
    Christopher M. Knapp - Fairport NY
  • Assignee:
    Xerox Corporation - Stamford CT
  • International Classification:
    G03G 9135
  • US Classification:
    4301088, 399251
  • Abstract:
    A liquid developer containing a liquid, colorant, and a wax charge acceptance additive. When free of colorant, the developer is considered colorless or slightly colored.
  • Developer Compositions And Processes

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  • US Patent:
    6346357, Feb 12, 2002
  • Filed:
    Feb 6, 2001
  • Appl. No.:
    09/777598
  • Inventors:
    David H. Pan - Rochester NY
    Weizhong Zhao - Webster NY
    Christopher M. Knapp - Fairport NY
  • Assignee:
    Xerox Corporation - Stamford CT
  • International Classification:
    G03G 9135
  • US Classification:
    430115
  • Abstract:
    A liquid developer comprised of a nonpolar liquid, thermoplastic resin, optional colorant, and an alumina charge acceptance additive.
  • Developer Compositions And Processes

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  • US Patent:
    6348292, Feb 19, 2002
  • Filed:
    Feb 6, 2001
  • Appl. No.:
    09/777605
  • Inventors:
    David H. Pan - Rochester NY
    Christopher M. Knapp - Fairport NY
    Weizhong Zhao - Webster NY
    Thomas W. Smith - Penfield NY
  • Assignee:
    Xerox Corporation - Stamford CT
  • International Classification:
    G03G 9135
  • US Classification:
    430115, 399251
  • Abstract:
    A liquid developer comprised of a nonpolar liquid, resin, optional colorant, and an alkaline earth charge acceptance additive.
  • Developer Compositions And Processes

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  • US Patent:
    6372402, Apr 16, 2002
  • Filed:
    Feb 6, 2001
  • Appl. No.:
    09/777469
  • Inventors:
    David H. Pan - Rochester NY
    Christopher M. Knapp - Fairport NY
  • Assignee:
    Xerox Corporation - Stamford CT
  • International Classification:
    G03G 9135
  • US Classification:
    430115, 430114
  • Abstract:
    A liquid developer contains, for example, a nonpolar liquid, thermoplastic resin, optional colorant, and an inorganic filler.
  • Developer Compositions And Processes

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  • US Patent:
    20020136977, Sep 26, 2002
  • Filed:
    Feb 6, 2001
  • Appl. No.:
    09/777423
  • Inventors:
    David Pan - Rochester NY, US
    Christopher Knapp - Fairport NY, US
    Weizhong Zhao - Webster NY, US
  • Assignee:
    Xerox Corporation
  • International Classification:
    G03G009/135
  • US Classification:
    430/115000
  • Abstract:
    A liquid developer comprised of a nonpolar liquid, thermoplastic resin, colorant, and a silica charge acceptance additive.
  • Developer Compositions And Processes

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  • US Patent:
    61803081, Jan 30, 2001
  • Filed:
    Jan 27, 2000
  • Appl. No.:
    9/492707
  • Inventors:
    David H. Pan - Rochester NY
    Weizhong Zhao - Webster NY
    John W. Spiewak - Webster NY
    Christopher M. Knapp - Fairport NY
  • Assignee:
    Xerox Corporation - Stamford CT
  • International Classification:
    G03G 9135
  • US Classification:
    430115
  • Abstract:
    A liquid developer comprised of a nonpolar liquid, resin, colorant, and a charge acceptance component comprised of an aluminum complex of the formulas, or mixtures thereof ##STR1## wherein R. sub. 1 is selected from the group consisting of hydrogen and alkyl, and n represents the number of R. sub. 1 substituents.
  • Developer Compositions And Processes

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  • US Patent:
    62180665, Apr 17, 2001
  • Filed:
    Jan 27, 2000
  • Appl. No.:
    9/492706
  • Inventors:
    Weizhong Zhao - Webster NY
    David H. Pan - Rochester NY
    John W. Spiewak - Webster NY
    Christopher M. Knapp - Fairport NY
  • Assignee:
    Xerox Corporation - Stamford CT
  • International Classification:
    G03G 9135
  • US Classification:
    430115
  • Abstract:
    A liquid developer comprised of a nonpolar liquid, resin, colorant, and a cyclodextrin charge acceptance component.
  • Imaging Apparatuses And Processes Thereof Containing A Marking Material With A Charge Acceptance Additive Of An Aluminum Complex

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  • US Patent:
    62123475, Apr 3, 2001
  • Filed:
    Jan 27, 2000
  • Appl. No.:
    9/492429
  • Inventors:
    Weizhong Zhao - Webster NY
    David H. Pan - Rochester NY
    John W. Spiewak - Webster NY
    Christopher M. Knapp - Fairport NY
  • Assignee:
    Xerox Corporation - Stamford CT
  • International Classification:
    G03G 1510
    G03G 1516
  • US Classification:
    399237
  • Abstract:
    An imaging apparatus containing an imaging member with an electrostatic latent image formed thereon, the imaging member containing a surface capable of supporting marking material; an imaging device for generating the electrostatic latent image on the imaging member wherein the electrostatic latent image includes image areas defined by a first charge voltage and nonimage areas defined by a second charge voltage distinguishable from the first charge voltage; a marking material supply apparatus for depositing marking material on the surface of the imaging member to form a marking material layer thereon adjacent the electrostatic latent image on the imaging member; a charging source for selectively delivering charges to the marking material layer in an imagewise manner responsive to the electrostatic latent image on the imaging member to form a secondary latent image in the marking material layer containing image and nonimage areas corresponding to the electrostatic latent image on the imaging member; and a separator member for selectively separating portions of the marking material layer in accordance with the secondary latent image in the marking material layer to create a developed image corresponding to the electrostatic latent image formed on the imaging member, and wherein the marking material is comprised of developer containing an optional liquid, resin, colorant, and a charge acceptance additive of an aluminum complex of the formulas, or mixtures thereof ##STR1## wherein R. sub. 1 is selected from the group consisting of hydrogen and alkyl, and n represents the number of R. sub. 1 groups, and wherein the charge acceptance additive captures and retains negative ions or positive ions.

Resumes

Christopher Knapp Photo 1

Application Engineer

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Location:
1578 Hwy #155, Saint Germain, WI
Industry:
Industrial Automation
Work:
Paper Converting Machine Company
Electrical Controls Engineer

Dematic Jun 2013 - Jun 2016
Electrical Controls Engineer

Dematic Apr 2013 - Jun 2013
Engineering Controls Intern

Enhanced Automation Feb 2013 - Apr 2013
Engineering Controls Intern

Rockwell Automation May 2012 - Jan 2013
Quality Assurance Intern
Education:
University of Wisconsin - Milwaukee 2008 - 2013
Bachelors, Bachelor of Science, Electrical Engineering
Waukesha South High School
Skills:
Rslogix
Rslinx
Automation
Power Electronics
Ac Drives
Halt
Microsoft Excel
Microsoft Word
Powerpoint
C++
Unity
Autocad Electrical
Demo3D
Vfd's
Autocad
Engineering
Plc
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Christopher Knapp

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Location:
4340 south Monaco St, Denver, CO 80237
Industry:
Financial Services
Work:
Squaretwo Financial Jan 2015 - Aug 2016
Supervisor, Affidavits and Trial Testimony

Relin, Goldstein & Crane Llp Mar 2014 - Nov 2014
Paralegal

Direct2Market Sales Solutions Aug 2012 - Aug 2013
Scheduling Coordinator

Screenvision 2011 - 2012
Local Process Coordinator
Education:
Suny Geneseo 2006 - 2011
Bachelors, Bachelor of Science, Business Administration, Management, Business Administration and Management
Victor Senior High School
Skills:
Salesforce.com
Reed Elsevier
Sales Operations Finance Technology
Foxpro
Proficient In All Microsoft Office Suite Applications
Google Chrome
Target Status Interface
Leadership
Microsoft Excel
Microsoft Word
Communication
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Christopher Knapp

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Christopher Knapp

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Christopher Knapp Photo 5

Quality Control Engineer At Xerox

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Location:
United States
Industry:
Computer Software
Name / Title
Company / Classification
Phones & Addresses
Christopher Knapp
KNAPP TYME LLC
Christopher Knapp
Principal
Christopher W Knapp
Business Services at Non-Commercial Site
12166 Crabapple St, Westminster, CO 80020

Isbn (Books And Publications)

The Kings of Judah and Israel

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Author
Christopher Knapp

ISBN #
0872134628

Myspace

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Christopher Knapp

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Locality:
Daytona Beach, Florida
Gender:
Male
Birthday:
1943
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Christopher Knapp

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Locality:
TUCSON, ARIZONA
Gender:
Male
Birthday:
1942
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Christopher Knapp

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Locality:
CAPE CORAL, Florida
Gender:
Male
Birthday:
1947
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Christopher Knapp

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Locality:
Ft.Irwin, California
Gender:
Male
Birthday:
1941
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Christopher Knapp

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Locality:
YPSILANTI, Michigan
Gender:
Male
Birthday:
1942
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Christopher Knapp

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Locality:
The City of Howard, Michigan
Gender:
Male
Birthday:
1939
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Christopher Knapp

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Locality:
Ft. Myers, FL &
Gender:
Male
Birthday:
1940

Youtube

Christopher Knapp found guilty in murder of D...

  • Duration:
    18s

Christopher Knapp avoids death penalty

  • Duration:
    47s

Houston Transformation Conference Panel 3: M...

The Leading with Landscape II: The Houston Transformation conference e...

  • Duration:
    14m 1s

1/16/2022 - Give the Finger of God - Christop...

Total Freedom New York Sunday Teaching.

  • Duration:
    1h 10m 46s

I-Team Exclusive: Reid says UFOs not necessar...

Has the U.S. government been hiding pieces from crashed UFOs? A new re...

  • Duration:
    5m 17s

Facebook

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Christopher Knapp

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Christopher Knapp

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Christopher Knapp

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Christopher Knapp

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Christopher Knapp

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Christopher Knapp

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Christopher Knapp

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Christopher Knapp

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Plaxo

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Christopher B Knapp

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Boston

Classmates

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Christopher Knapp

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Schools:
Waterloo Middle School Elkridge MD 1973-1975, Golden West Middle School Fairfield CA 1993-1997
Community:
Marjorie Egloff
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Christopher Knapp

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Schools:
Walnut Street Middle School Delanco NJ 1974-1977
Community:
Fred Streater, Joseph Hays, John Fleming
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Christopher Knapp

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Schools:
Eagle Rock High School Los Angeles CA 1961-1965
Community:
Shirley Wisdom, Marilyn Meredith
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Christopher Knapp

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Schools:
Laurel High School Laurel IN 1986-1989
Community:
Roberta Thompson, Rickey Mackey, Merinda Garner, Rhonda Maxie, Lewis Murray
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Christopher Knapp

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Schools:
Immaculate Heart High School Tucson AZ 1996-2000
Community:
Mariam Ephraim, Mary Anderson, John Kemper
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Christopher Knapp

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Schools:
Toledo Christian High School Toledo OH 1970-1973
Community:
Paul Barney, Sarajane Martinez, Dusty Booth, Shahab Ahmed
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Christopher Knapp

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Schools:
Saint Joseph School Kalamazoo MI 1976-1985
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Christopher Knapp

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Schools:
Saint Kevin School St. Ann MO 1970-1974, DeSmet Jesuit High School St. Louis MO 1974-1978
Community:
Jack Schwartz, Dennis Obrien, Stephen Wieschhaus, Gerry Bennett, Tom Moore, Jake Wilson, Mike Leary, Tom Gaus, Rick Forshaw, Trace Shaughnessy, Jack Cusamano

Googleplus

Christopher Knapp Photo 30

Christopher Knapp

Lived:
Tulsa, Oklahoma
Sherman, Texas
Philadelphia, PA
Denver, CO
Education:
Union High School, Tulsa Oklahoma, Northeastern State University, Saint Ignatius
Relationship:
Single
Tagline:
I'm Liking Google+
Bragging Rights:
Hit a Hole in one, par 4
Christopher Knapp Photo 31

Christopher Knapp

Education:
Carnegie Mellon University, Purdue University - Chemical Engineering
Christopher Knapp Photo 32

Christopher Knapp

Work:
Harmon's Audio Visual - Audio Visual Specialist
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Christopher Knapp

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Christopher Knapp

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Christopher Knapp

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Christopher Knapp

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Christopher Knapp


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