Christopher J Roach

US Patent:

7163596, Jan 16, 2007

Filed:

May 2, 2003

Appl. No.:

10/428284

Inventors:

Alan Frederick Carroll - Raleigh NC, US
Christopher John Roach - Apex NC, US

Assignee:

E. I. du Pont Nemours and Company - Wilmington DE

International Classification:

B32B 37/00

US Classification:

156155, 1563082, 1563096

Abstract:

This invention is directed to a process for the fabrication of features on a silicon wafer utilizing fibers or ribbons comprising organic polymer and inorganic material.

US Patent:

7201814, Apr 10, 2007

Filed:

Jan 23, 2002

Appl. No.:

10/466128

Inventors:

Christopher J. Roach - Apex NC, US

Assignee:

E. I. du Pont de Nemours and Company - Wilmington DE

International Classification:

B32B 37/00
B32B 37/04
H01J 9/02

US Classification:

156 67, 156 8911, 156 8923, 1563082

Abstract:

This invention is directed to a process for the fabrication of features on a display panel utilizing fibers or ribbons comprising organic polymer and inorganic material, the inorganic material containing phosphoe, conductrice metals or dielectric particles.

US Patent:

7282106, Oct 16, 2007

Filed:

Oct 18, 2004

Appl. No.:

10/968626

Inventors:

Alan Frederick Carroll - Raleigh NC, US
Christopher John Roach - Apex NC, US

Assignee:

E. I. du Pont de Nemours and Company - Wilmington DE

International Classification:

B32B 37/00

US Classification:

156155, 156166, 156176, 1563082, 1563096

Abstract:

This invention is directed to a process for the fabrication of features on a silicon wafer utilizing ribbons comprising organic polymer and inorganic material.

US Patent:

7491442, Feb 17, 2009

Filed:

Oct 18, 2004

Appl. No.:

10/967801

Inventors:

Alan Frederick Carroll - Raleigh NC, US
Christopher John Roach - Apex NC, US

Assignee:

E. I. du Pont de Nemours and Company - Wilmington DE

International Classification:

B32B 19/00
H01L 31/00
H01B 1/02
H01B 1/04

US Classification:

428357, 136256, 252512, 25251933

Abstract:

This invention is directed to a process for the fabrication of features on a silicon wafer utilizing ribbons comprising organic polymer and inorganic material.

US Patent:

7645564, Jan 12, 2010

Filed:

Mar 3, 2006

Appl. No.:

11/367558

Inventors:

Haixin Yang - Chapel Hill NC, US
Pedro A. Jimenez - URB. Tierralta 1, Guaynabo PR, US
Cherng Y. Wang - Mount Laurel NJ, US
Christopher John Roach - Apex NC, US
John Graeme Pepin - Raleigh NC, US
Michael F. Barker - Raleigh NC, US
Vincent Wen-Yuan Yeh - Taipei, TW

International Classification:

G03C 1/00

US Classification:

4302811, 4302701, 4302881

Abstract:

The invention is directed to a process and more particularly, to utilizing polymer solutions to make thick film compositions. In one embodiment the process is directed to the formation of photoimageable thick film compositions for use in photo-patterning methods to make photoimageable electrodes in flat panel display applications, including plasma display panels (PDP). Polymer solutions are obtained by directly polymerizing desired monomers in a desired solvent to form a desired polymer, rather than by dissolving a pre-made polymer in a desired solvent. Other ingredients are added to the polymer solution to directly form thick film pastes, including photoimageable thick film pastes.

US Patent:

7691288, Apr 6, 2010

Filed:

Jun 23, 2009

Appl. No.:

12/489634

Inventors:

Carl B. Wang - Raleigh NC, US
Christopher John Roach - Apex NC, US
Fong-Pei Chang - Taoyuan, TW

Assignee:

E.I. du Pont de Nemours and Company - Wilmington DE

International Classification:

H01J 1/56
H01J 35/20
H01J 7/18
C03C 8/02
C03C 8/16

US Classification:

2521811, 2521816, 2521817, 252194, 501 14, 501 15, 501 16, 501 17, 501 21, 501 32, 501 77

Abstract:

The invention is directed to a process for making screen-printable getter composition comprising: (a) glass frit; and (b) pre-hydrated desiccant material; dispersed in (c) organic medium. The present invention further relates to a getter composition utilizing low-softening temperature glasses comprising, based on weight %, 1-50% SiO, 0-80% BO, 0-90% BiO, 0-90% PbO, 0-90% PO, 0-60% LiO, 0-30% AlO, 0-10% KO, 0-10% NaO, and 0-30% MO where M is selected from Ba, Sr, Ca, Zn, Cu, Mg and mixtures thereof. The glasses described herein may contain several other oxide constituents that can substitute glass network-forming elements or modify glass structure. The desiccant material is pre-hydrated to reach its saturation level of moisture absorption. The process of pre-hydration can be done by exposing the desiccant in a normal temperature/humidity environment of for example, 25 C. and 50-60% RH.

US Patent:

7943060, May 17, 2011

Filed:

Jan 29, 2010

Appl. No.:

12/696198

Inventors:

Carl B. Wang - Raleigh NC, US
Christopher John Roach - Apex NC, US
Fong-Pei Chang - Taoyuan, TW

Assignee:

E.I. du Pont de Nemours and Company - Wilmington DE

International Classification:

H01J 1/56
H01J 35/20
H01J 7/18
C03C 8/02
C03C 8/16

US Classification:

2521811, 2521816, 2521817, 252194, 501 14, 501 15, 501 16, 501 17, 501 21, 501 32, 501 77

Abstract:

The invention is directed to a process for making screen-printable getter composition comprising: (a) glass frit; and (b) pre-hydrated desiccant material; dispersed in (c) organic medium. The desiccant material is pre-hydrated to reach its saturation level of moisture absorption. The process of pre-hydration can be done by exposing the desiccant in a normal temperature/humidity environment of for example, 25 C. and 50-60% RH. For 24 to 48 hours or up to the time when weight gain (due to moisture absorption) stops increasing. An accelerated hydration process in a chamber with higher than normal humidity level (i. e. 50% Relative Humidity) is also applicable to shorten the time of exposure to fully hydrate the desiccant material.

US Patent:

20050051207, Mar 10, 2005

Filed:

Oct 18, 2004

Appl. No.:

10/968625

Inventors:

Alan Carroll - Raleigh NC, US
Christopher Roach - Apex NC, US

International Classification:

H01L031/00

US Classification:

136256000, 438098000

Abstract:

This invention is directed to a process for the fabrication of features on a silicon wafer utilizing fibers comprising organic polymer and inorganic material.