Dale R Tyczka

US Patent:

7056119, Jun 6, 2006

Filed:

Nov 27, 2002

Appl. No.:

10/304952

Inventors:

Alvin B. Cabato - Plymouth Meeting PA, US
David Warner - Devon PA, US
Dale R. Tyczka - Skippack PA, US

Assignee:

LSA, Inc. - Arlington VA

International Classification:

G09B 9/00
G09B 9/08
G09B 19/16

US Classification:

434 38, 434 69, 345 7, 348586, 356145

Abstract:

A periscopic optical training system for displaying simulation and real images includes a microprocessor for generating at least one simulation image, at least one display for displaying the simulation image, at least one periscopic device each with a viewing window for receiving the simulation and real images, and a controller for controlling the simulation and real images to be received by the periscopic device interchangeably or simultaneously.

US Patent:

7119911, Oct 10, 2006

Filed:

Mar 7, 2003

Appl. No.:

10/382585

Inventors:

Dale R. Tyczka - Collegeville PA, US
Alvin B. Cabato - Plymouth Meeting PA, US
Daniel Stern - Berwyn PA, US

Assignee:

LSA, Inc. - Arlington VA

International Classification:

G01B 11/24

US Classification:

356603, 356605

Abstract:

A Moiré deflectometer includes at least three non-mechanical, transparent, spatial light modulators for demonstrating two sets of patterns on two parallel planes on two of the modulators thereby creating a Moiré fringe pattern and a method for using the same. More particularly, each of the spatial light modulators may be a liquid crystal display, an electrochromic device, a micromirror array, a microlouvre array, an electro-optic device, or a holographic device.

US Patent:

7129008, Oct 31, 2006

Filed:

Jun 12, 2003

Appl. No.:

10/460334

Inventors:

Ryszard Burzynski - Kenmore NY, US
Deepak N. Kumar - Sunnyvale CA, US
Saswati Ghosal - King of Prussia PA, US
Dale R. Tyczka - Collegeville PA, US

Assignee:

Laser Photonics Technology Inc. - W. Amherst NY

International Classification:

G03H 1/04

US Classification:

430 1, 480 2, 359 3

Abstract:

New photosensitive acrylic material compositions for fabrication of holographic recording materials (HRMs) are provided. These compositions are comprised of polymerizable acrylic monomers and light absorbing dyes, and when polymerized they are thermally stable, light sensitive, hard and inert to common chemicals. Methods of fabricating HRMs with symmetric concentration distribution of the dye are also provided.

US Patent:

20020068225, Jun 6, 2002

Filed:

Nov 16, 2001

Appl. No.:

09/993973

Inventors:

Ryszard Burzynski - Kenmore NY, US
Deepak Kumar - Tonawanda NY, US
Saswati Ghosal - Amherst NY, US
Dale Tyczka - Lansdale PA, US

International Classification:

G03H001/02
G03C001/73
C08F002/46

US Classification:

430/001000, 430/002000, 430/281100, 522/048000

Abstract:

New photosensitive acrylic material compositions for fabrication of holographic recording materials (HRMs) are provided. These compositions are comprised of polymerizable acrylic monomers and light absorbing dyes, and when polymerized they are thermally stable, light sensitive, hard and inert to common chemicals. Methods of fabricating HRMs with symmetric concentration distribution of the dye are also provided.

US Patent:

6344297, Feb 5, 2002

Filed:

Oct 12, 1999

Appl. No.:

09/415984

Inventors:

Ryszard Burzynski - Kenmore NY
Deepak N. Kumar - Tonawanda NY
Saswati Ghosal - Amherst NY
Dale R. Tyczka - Lansdale PA

Assignee:

Laser Photonics Technology Inc. - W. Amherst NY

International Classification:

G03H 104

US Classification:

430 2, 430 1, 359 3

Abstract:

New photosensitive acrylic material compositions for fabrication of holographic recording materials (HRMs) are provided. These compositions are comprised of polymerizable acrylic monomers and light absorbing dyes, and when polymerized they are thermally stable, light sensitive, hard and inert to common chemicals. Methods of fabricating HRMs with symmetric concentration distribution of the dye are also provided.