Daniel C Cho

US Patent:

20200361797, Nov 19, 2020

Filed:

May 11, 2020

Appl. No.:

16/871611

Inventors:

- King of Prussia PA, US
Daniel J. Cho - Philadelphia PA, US

Assignee:

ONVECTOR LLC - King of Prussia PA

International Classification:

C02F 1/48

Abstract:

A water treatment system includes a water inlet that intakes water to be treated, a high voltage (HV) electrode having a porous metal surface area in a range of between 0.1 cmand 5 cmin fluid communication with the water, such that the water flows through the porous metal surface area of the HV electrode, a ground electrode disposed across a gap from the HV electrode, in fluid communication with the water, a high voltage power supply electrically connected to the HV electrode for generating spark plasma or pulsed electric fields having a rise time equal to or less than 60 nanoseconds (ns) and an amplitude greater than or equal to 30 kV/cm across the gap, thereby producing treated water, and a water outlet that discharges the treated water.

US Patent:

20200171409, Jun 4, 2020

Filed:

Nov 27, 2019

Appl. No.:

16/698360

Inventors:

- King of Prussia PA, US
Daniel J. Cho - Philadelphia PA, US

Assignee:

ONVECTOR LLC - King of Prussia PA

International Classification:

B01D 15/20
C02F 1/28
B01J 20/34
B01J 20/20

Abstract:

A water treatment system includes an adsorption column including granular activated carbon (GAC) that adsorbs contaminants from untreated water onto the GAC, thereby producing treated water, a first electrode disposed at a proximal side of the adsorption column, with a gap between the first electrode and the GAC, a second electrode disposed at a distal side of the adsorption column, a drain outlet in fluid communication with the adsorption column for draining water out of the adsorption column, a gas inlet in fluid communication with the adsorption column for injecting a displacement gas into the adsorption column, a high voltage power supply electrically connected to one of the first electrode and the second electrode for generating a plasma discharge within the GAC, thereby regenerating the GAC within the adsorption column, and a gas outlet in fluid communication with the adsorption column for venting waste gas produced by the plasma discharge.

US Patent:

20190241447, Aug 8, 2019

Filed:

Jan 28, 2019

Appl. No.:

16/258734

Inventors:

- King of Prussia PA, US
Daniel J. Cho - Philadelphia PA, US
HyoungSup Kim - Brookhaven PA, US

International Classification:

C02F 1/46
C02F 1/32
C02F 1/72
H01J 37/32

Abstract:

A system for generating a plasma discharge in liquid utilizes first and second electrodes spaced apart in an interior space of a vessel holding the liquid. A channel can be defined in certain embodiments at least partially by at least one of the first and second electrodes, and an inlet in fluid communication with the interior space is configured to generate a vortical fluid flow in the vessel. A method for generating a plasma discharge in liquid is also provided.

US Patent:

20160152494, Jun 2, 2016

Filed:

Nov 30, 2015

Appl. No.:

14/954495

Inventors:

Young I. Cho - Cherry Hill NJ, US
Alexander Fridman - Philadelphia PA, US
Daniel J. Cho - Wayne PA, US
Alexander Rabinovich - Cherry Hill NJ, US

Assignee:

Drexel University - Philadelphia PA

International Classification:

C02F 1/48

Abstract:

A treatment system for treating water, such as produced water that is produced during hydraulic fracturing. The system employs a combination of a plasma spark discharge and an RF oscillating electric field. The plasma spark discharge and the RF oscillating electric field may be employed simultaneously or in an overlapping manner within a chamber to treat the water. The treatment system is able to kill microorganisms as well as reduce or eliminate fouling due to, for example, bicarbonates. In some embodiments, grids are employed to further enhance the heat produced by the RF oscillating electric field.

US Patent:

20160137529, May 19, 2016

Filed:

Nov 4, 2015

Appl. No.:

14/932148

Inventors:

Young I. Cho - Cherry Hill NJ, US
Daniel J. Cho - Wayne PA, US
Alexander Fridman - Philadelphia PA, US
Hyoungsup Kim - Lansdowne PA, US

Assignee:

DREXEL UNIVERSITY - Philadelphia PA

International Classification:

C02F 1/32
H01J 37/32

Abstract:

A plasma spark discharge reactor for treating water. The plasma spark discharge reactor comprises a HV electrode with a head and ground electrode that surrounds at least a portion of the HV electrode. A passage for gas may pass through the reactor to a location proximate to the head to provide controlled formation of gas bubbles in order to facilitate the plasma spark discharge in a liquid environment.

US Patent:

20140124357, May 8, 2014

Filed:

Nov 5, 2013

Appl. No.:

14/071990

Inventors:

- PHILADELPHIA PA, US
ALEXANDER FRIDMAN - PHILADELPHIA PA, US
ALEXANDER RABINOVICH - CHERRY HILL NJ, US
DANIEL J. CHO - WAYNE PA, US

Assignee:

DREXEL UNIVERSITY - PHILADELPHIA PA

International Classification:

C02F 1/30
C02F 1/04

US Classification:

203 10, 204164

Abstract:

The present invention consists of a method of pre-treatment of adulterated water for distillation, including adulterated water produced during hydraulic fracturing (“fracking”) of shale rock during natural gas drilling. In particular, the invention is directed to a method of treating adulterated water, said adulterated water having an initial level of bicarbonate ion in a range of about 250 ppm to about 5000 ppm and an initial level of calcium ion in a range of about 500 ppm to about 50,000 ppm, said method comprising contacting the adulterated water with a non-thermal arc discharge plasma to produce plasma treated water having a level of bicarbonate ion of less than about 100 ppm. Optionally, the plasma treated water may be further distilled.