Daniel J Rader

US Patent:

6386015, May 14, 2002

Filed:

Dec 21, 1999

Appl. No.:

09/469718

Inventors:

Daniel J. Rader - Albuquerque NM
John R. Torczynski - Albuquerque NM
Karl Wally - Lafayette CA
John E. Brockmann - Albuquerque NM

Assignee:

Sandia Corporation - Livermore

International Classification:

G01N 100

US Classification:

73 3105, 73 2333, 73 2801, 73 2804, 73 2805, 73 3102, 73 3107

Abstract:

An aerosol lab-on-a-chip (ALOC) integrates one or more of a variety of aerosol collection, classification, concentration (enrichment), and characterization processes onto a single substrate or layered stack of such substrates. By taking advantage of modern micro-machining capabilities, an entire suite of discrete laboratory aerosol handling and characterization techniques can be combined in a single portable device that can provide a wealth of data on the aerosol being sampled. The ALOC offers parallel characterization techniques and close proximity of the various characterization modules helps ensure that the same aerosol is available to all devices (dramatically reducing sampling and transport errors). Micro-machine fabrication of the ALOC significantly reduces unit costs relative to existing technology, and enables the fabrication of small, portable ALOC devices, as well as the potential for rugged design to allow operation in harsh environments. Miniaturization also offers the potential of working with smaller particle sizes and lower pressure drops (leading to reduction of power consumption).

US Patent:

6492067, Dec 10, 2002

Filed:

Dec 3, 1999

Appl. No.:

09/454674

Inventors:

Leonard E. Klebanoff - Dublin CA
Daniel J. Rader - Albuquerque NM
Scott D. Hector - Oakland CA
Khanh B. Nguyen - Sunnyvale CA
Richard H. Stulen - Livermore CA

Assignee:

EUV LLC - Santa Clara CA

International Classification:

G03F 900

US Classification:

430 5, 428 14

Abstract:

A removable pellicle for a lithographic mask that provides active and robust particle protection, and which utilizes a traditional pellicle and two deployments of thermophoretic protection to keep particles off the mask. The removable pellicle is removably attached via a retaining structure to the mask substrate by magnetic attraction with either contacting or non-contacting magnetic capture mechanisms. The pellicle retaining structural is composed of an anchor piece secured to the mask substrate and a frame member containing a pellicle. The anchor piece and the frame member are in removable contact or non-contact by the magnetic capture or latching mechanism. In one embodiment, the frame member is retained in a floating (non-contact) relation to the anchor piece by magnetic levitation. The frame member and the anchor piece are provided with thermophoretic fins which are interdigitated to prevent particles from reaching the patterned area of the mask. Also, the anchor piece and mask are maintained at a higher temperature than the frame member and pellicle which also prevents particles from reaching the patterned mask area by thermophoresis.

US Patent:

6664550, Dec 16, 2003

Filed:

Apr 30, 2002

Appl. No.:

10/137983

Inventors:

Daniel J. Rader - Albuquerque NM
John R. Torczynski - Albuquerque NM
Karl Wally - Lafayette CA
John E. Brockmann - Albuquerque NM

Assignee:

Sandia National Laboratories - Livermore CA

International Classification:

G01N 2164

US Classification:

2504612, 2504591

Abstract:

An aerosol lab-on-a-chip (ALOC) integrates one or more of a variety of particle collection, classification, concentration (enrichment), an characterization processes onto a single substrate or layered stack of such substrates. By mounting a UV laser diode laser light source on the substrate, or substrates tack, so that it is located down-stream of the sample inlet port and at right angle the sample particle stream, the UV light source can illuminate individual particles in the stream to induce a fluorescence response in those particles having a fluorescent signature such as biological particles, some of said particles. An illuminated particle having a fluorescent signal above a threshold signal would trigger a sorter module that would separate that particle from the particle stream.

US Patent:

6888297, May 3, 2005

Filed:

Dec 19, 2002

Appl. No.:

10/325997

Inventors:

Leonard E. Klebanoff - San Clemente CA, US
William T. Silfvast - St. Helena CA, US
Daniel J. Rader - Albuquerque NM, US

Assignee:

EUV LLC - Santa Clara CA

International Classification:

H01J061/04
G21G004/00

US Classification:

313356, 313618, 313631, 313632, 313634, 250504 R, 2504931, 378119

Abstract:

Method and apparatus for mitigating the transport of debris generated and dispersed from electric discharge sources by thermophoretic and electrostatic deposition. A member is positioned adjacent the front electrode of an electric discharge source and used to establish a temperature difference between it and the front electrode. By flowing a gas between the member and the front electrode a temperature gradient is established that can be used for thermophoretic deposition of particulate debris on either the member or front electrode depending upon the direction of the thermal gradient. Establishing an electric field between the member and front electrode can aid in particle deposition by electrostatic deposition.

US Patent:

6989629, Jan 24, 2006

Filed:

Jan 21, 2005

Appl. No.:

11/040627

Inventors:

Leonard E. Klebanoff - San Clemente CA, US
Daniel J. Rader - Albuquerque NM, US
William T. Silfvast - Helena CA, US

Assignee:

EUV LLC - Santa Clara CA

International Classification:

H01J 9/00
H01J 61/04

US Classification:

313356, 313618, 313631, 313634, 250504 R, 2504931

Abstract:

Method and apparatus for mitigating the transport of debris generated and dispersed from electric discharge sources by thermophoretic and electrostatic deposition. A member is positioned adjacent the front electrode of an electric discharge source and used to establish a temperature difference between it and the front electrode. By flowing a gas between the member and the front electrode a temperature gradient is established that can be used for thermophoretic deposition of particulate debris on either the member or front electrode depending upon the direction of the thermal gradient. Establishing an electric field between the member and front electrode can aid in particle deposition by electrostatic deposition.

US Patent:

7473301, Jan 6, 2009

Filed:

Sep 17, 2002

Appl. No.:

10/245218

Inventors:

Leonard Elliott Klebanoff - Dublin CA, US
Daniel John Rader - Albuquerque NM, US
Christopher Walton - Berkeley CA, US
James Folta - Livermore CA, US

Assignee:

EUV LLC - Santa Clara CA

International Classification:

B01D 45/08

US Classification:

95285, 55465, 55524, 55DIG 14

Abstract:

An efficient device for capturing fast moving particles has an adhesive particle shield that includes (i) a mounting panel and (ii) a film that is attached to the mounting panel wherein the outer surface of the film has an adhesive coating disposed thereon to capture particles contacting the outer surface. The shield can be employed to maintain a substantially particle free environment such as in photolithographic systems having critical surfaces, such as wafers, masks, and optics and in the tools used to make these components, that are sensitive to particle contamination. The shield can be portable to be positioned in hard-to-reach areas of a photolithography machine. The adhesive particle shield can incorporate cooling means to attract particles via the thermophoresis effect.

US Patent:

61562122, Dec 5, 2000

Filed:

Feb 3, 1999

Appl. No.:

9/244259

Inventors:

Daniel J. Rader - Lafayette CA
John R. Torczynski - Albuquerque NM

Assignee:

Sandia Corporation - Livermore CA

International Classification:

B01D 2126
G01N 100

US Classification:

210788

Abstract:

An opposed-flow virtual cyclone for aerosol collation which can accurately collect, classify, and concentrate (enrich) particles in a specific size range. The opposed-flow virtual cyclone is a variation on the virtual cyclone and has its inherent advantages (no-impact particle separation in a simple geometry), while providing a more robust design for concentrating particles in a flow-through type system. The opposed-flow virtual cyclone consists of two geometrically similar virtual cyclones arranged such that their inlet jets are inwardly directed and symmetrically opposed relative to a plane of symmetry located between the two inlet slits. A top plate bounds both jets on the "top" side of the inlets, while the other or lower wall curves "down" and away from each inlet jet. Each inlet jet will follow the adjacent lower wall as it turns away, and that particles will be transferred away from the wall and towards the symmetry plane by centrifugal action. After turning, the two jets merge smoothly along the symmetry line and flow parallel to it through the throat.

US Patent:

55229336, Jun 4, 1996

Filed:

May 19, 1994

Appl. No.:

8/246049

Inventors:

Anthony S. Geller - Albuquerque NM
Daniel J. Rader - Albuquerque NM

International Classification:

C23C 1600

US Classification:

118723E

Abstract:

Method and apparatus for reducing particulate contamination in microchip processing are disclosed. The method and apparatus comprise means to reduce particle velocity toward the wafer before the particles can be deposited on the wafer surface. A reactor using electric fields to reduce particle velocity and prevent particulate contamination is disclosed. A reactor using a porous showerhead to reduce particle velocities and prevent particulate contamination is disclosed.