Daniel James Rader

US Patent:

61562122, Dec 5, 2000

Filed:

Feb 3, 1999

Appl. No.:

9/244259

Inventors:

Daniel J. Rader - Lafayette CA
John R. Torczynski - Albuquerque NM

Assignee:

Sandia Corporation - Livermore CA

International Classification:

B01D 2126
G01N 100

US Classification:

210788

Abstract:

An opposed-flow virtual cyclone for aerosol collation which can accurately collect, classify, and concentrate (enrich) particles in a specific size range. The opposed-flow virtual cyclone is a variation on the virtual cyclone and has its inherent advantages (no-impact particle separation in a simple geometry), while providing a more robust design for concentrating particles in a flow-through type system. The opposed-flow virtual cyclone consists of two geometrically similar virtual cyclones arranged such that their inlet jets are inwardly directed and symmetrically opposed relative to a plane of symmetry located between the two inlet slits. A top plate bounds both jets on the "top" side of the inlets, while the other or lower wall curves "down" and away from each inlet jet. Each inlet jet will follow the adjacent lower wall as it turns away, and that particles will be transferred away from the wall and towards the symmetry plane by centrifugal action. After turning, the two jets merge smoothly along the symmetry line and flow parallel to it through the throat.

US Patent:

6072157, Jun 6, 2000

Filed:

Dec 11, 1998

Appl. No.:

9/210348

Inventors:

Leonard Elliott Klebanoff - San Ramon CA
Daniel John Rader - Lafayette CA

Assignee:

EUV LLC - Santa Clara CA

International Classification:

B25J 1506
B66C 102
H01L 2168

US Classification:

219228

Abstract:

A thermophoretic vacuum wand that is particularly suited for transporting articles in a cleanroom environment so that potential particle contaminants in the air do not become adhered to the surface of the article is described. The wand includes a housing having a platen with a front surface with suction port(s) through the platen; a vacuum source for applying a negative pressure to the suction port(s); and heating device for the object. Heating the article when it is held by the vacuum wand affords thermophoretic protection that effectively prevents particles in the air from depositing onto the article.

US Patent:

62325787, May 15, 2001

Filed:

Mar 23, 2000

Appl. No.:

9/533600

Inventors:

Leonard Elliott Klebanoff - San Ramon CA
Daniel John Rader - Lafayette CA

Assignee:

BUV LLC - Santa Clara CA

International Classification:

B25J 1506
B66C 102
H01L 2168

US Classification:

219228

Abstract:

A thermophoretic vacuum wand that is particularly suited for transporting articles in a cleanroom environment so that potential particle contaminants in the air do not become adhered to the surface of the article is described. The wand includes a housing having a platen with a front surface with suction port(s) through the platen; a vacuum source for applying a negative pressure to the suction port(s); and heating device for the object. Heating the article when it is held by the vacuum wand affords thermophoretic protection that effectively prevents particles in the air from depositing onto the article.

US Patent:

62534645, Jul 3, 2001

Filed:

Aug 18, 2000

Appl. No.:

9/642222

Inventors:

Leonard E. Klebanoff - San Ramon CA
Daniel J. Rader - Lafayette CA

Assignee:

Euv LLC - Santa Clara CA

International Classification:

F26B 504

US Classification:

34403

Abstract:

A system that employs thermophoresis to protect lithographic surfaces from particle deposition and operates in an environment where the pressure is substantially constant and can be sub-atmospheric. The system (thermophoretic pellicle) comprises an enclosure that surrounds a lithographic component whose surface is being protected from particle deposition. The enclosure is provided with means for introducing a flow of gas into the chamber and at least one aperture that provides for access to the lithographic surface for the entry and exit of a beam of radiation, for example, and further controls gas flow into a surrounding low pressure environment such that a higher pressure is maintained within the enclosure and over the surface being protected. The lithographic component can be heated or, alternatively the walls of the enclosure can be cooled to establish a temperature gradient between the surface of the lithographic component and the walls of the enclosure, thereby enabling the thermophoretic force that resists particle deposition.

US Patent:

61530441, Nov 28, 2000

Filed:

Apr 30, 1998

Appl. No.:

9/071359

Inventors:

Leonard E. Klebanoff - San Ramon CA
Daniel J. Rader - Lafayette CA

Assignee:

EUV LLC - Santa Clara CA

International Classification:

C23F 102
C23C 1600

US Classification:

156345

Abstract:

A system that employs thermophoresis to protect lithographic surfaces from particle deposition and operates in an environment where the pressure is substantially constant and can be sub-atmospheric. The system (thermophoretic pellicle) comprises an enclosure that surrounds a lithographic component whose surface is being protected from particle deposition. The enclosure is provided with means for introducing a flow of gas into the chamber and at least one aperture that provides for access to the lithographic surface for the entry and exit of a beam of radiation, for example, and further controls gas flow into a surrounding low pressure environment such that a higher pressure is maintained within the enclosure and over the surface being protected. The lithographic component can be heated or, alternatively the walls of the enclosure can be cooled to establish a temperature gradient between the surface of the lithographic component and the walls of the enclosure, thereby enabling the thermophoretic force that resists particle deposition.